SG11201401092QA - An illumination system - Google Patents

An illumination system

Info

Publication number
SG11201401092QA
SG11201401092QA SG11201401092QA SG11201401092QA SG11201401092QA SG 11201401092Q A SG11201401092Q A SG 11201401092QA SG 11201401092Q A SG11201401092Q A SG 11201401092QA SG 11201401092Q A SG11201401092Q A SG 11201401092QA SG 11201401092Q A SG11201401092Q A SG 11201401092QA
Authority
SG
Singapore
Prior art keywords
illumination system
illumination
Prior art date
Application number
SG11201401092QA
Other languages
English (en)
Inventor
Jeffrey Kaskey
Thomas Laidig
David Markle
Jang Fung Chen
Original Assignee
Pinebrook Imaging Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pinebrook Imaging Technology Ltd filed Critical Pinebrook Imaging Technology Ltd
Publication of SG11201401092QA publication Critical patent/SG11201401092QA/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B47/00—Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
    • H05B47/10—Controlling the light source
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B47/00—Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
    • H05B47/20—Responsive to malfunctions or to light source life; for protection
    • H05B47/21—Responsive to malfunctions or to light source life; for protection of two or more light sources connected in parallel
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B47/00—Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
    • H05B47/20—Responsive to malfunctions or to light source life; for protection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B47/00—Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
    • H05B47/20—Responsive to malfunctions or to light source life; for protection
    • H05B47/29—Circuits providing for substitution of the light source in case of its failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
SG11201401092QA 2011-09-30 2012-09-28 An illumination system SG11201401092QA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161541484P 2011-09-30 2011-09-30
US13/629,382 US20130207544A1 (en) 2011-09-30 2012-09-27 Illumination system
PCT/US2012/057941 WO2013049584A1 (en) 2011-09-30 2012-09-28 An illumination system

Publications (1)

Publication Number Publication Date
SG11201401092QA true SG11201401092QA (en) 2014-04-28

Family

ID=47996437

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401092QA SG11201401092QA (en) 2011-09-30 2012-09-28 An illumination system

Country Status (6)

Country Link
US (2) US20130207544A1 (ja)
JP (3) JP6268092B2 (ja)
KR (2) KR20160075579A (ja)
CN (2) CN103875311B (ja)
SG (1) SG11201401092QA (ja)
WO (1) WO2013049584A1 (ja)

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US10140394B2 (en) * 2014-09-25 2018-11-27 Applied Materials, Inc. Method for rejecting tuning disturbances to improve lamp failure prediction quality in thermal processes
US9927723B2 (en) 2015-03-24 2018-03-27 Applied Materials, Inc. Apparatus and methods for on-the-fly digital exposure image data modification
US11776989B2 (en) 2016-06-10 2023-10-03 Applied Materials, Inc. Methods of parallel transfer of micro-devices using treatment
CN109196424A (zh) 2016-06-10 2019-01-11 应用材料公司 微型装置的无掩模并行取放转印
US11756982B2 (en) 2016-06-10 2023-09-12 Applied Materials, Inc. Methods of parallel transfer of micro-devices using mask layer
US10032827B2 (en) 2016-06-29 2018-07-24 Applied Materials, Inc. Systems and methods for transfer of micro-devices
MX2020007262A (es) 2018-01-08 2020-12-10 Ubicquia Llc Modelado y manejo de falla de artefacto aereo de iluminacion.
CN109635345B (zh) * 2018-11-14 2023-04-07 重庆城市管理职业学院 一种基于云计算的照明设备预警方法
US11019276B1 (en) * 2019-11-14 2021-05-25 Hand Held Products, Inc. Apparatuses and methodologies for flicker control
JP2023148031A (ja) * 2022-03-30 2023-10-13 パナソニックＩｐマネジメント株式会社 メンテナンス方法

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JP4458229B2 (ja) * 2002-08-30 2010-04-28 日亜化学工業株式会社 露光用半導体レーザ光源装置
WO2004077533A1 (ja) * 2003-02-28 2004-09-10 Kabushiki Kaisha Hayashi Soken 露光装置
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JPWO2011096365A1 (ja) * 2010-02-05 2013-06-10 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
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Also Published As

Publication number Publication date
JP2019003202A (ja) 2019-01-10
CN106028581B (zh) 2019-10-25
US9907152B2 (en) 2018-02-27
CN106028581A (zh) 2016-10-12
KR20140080510A (ko) 2014-06-30
KR20160075579A (ko) 2016-06-29
JP6268092B2 (ja) 2018-01-24
JP2016180987A (ja) 2016-10-13
CN103875311B (zh) 2017-07-14
US20160219684A1 (en) 2016-07-28
US20130207544A1 (en) 2013-08-15
WO2013049584A1 (en) 2013-04-04
JP6419104B2 (ja) 2018-11-07
JP2014534613A (ja) 2014-12-18
CN103875311A (zh) 2014-06-18

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