SG111184A1 - Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases - Google Patents
Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gasesInfo
- Publication number
- SG111184A1 SG111184A1 SG200402960A SG200402960A SG111184A1 SG 111184 A1 SG111184 A1 SG 111184A1 SG 200402960 A SG200402960 A SG 200402960A SG 200402960 A SG200402960 A SG 200402960A SG 111184 A1 SG111184 A1 SG 111184A1
- Authority
- SG
- Singapore
- Prior art keywords
- reagent
- containing chlorine
- chlorine trifluoride
- halogenated gases
- emissions containing
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
- B01D53/685—Halogens or halogen compounds by treating the gases with solids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
- B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
- B01J20/16—Alumino-silicates
- B01J20/18—Synthetic zeolitic molecular sieves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J29/00—Catalysts comprising molecular sieves
- B01J29/04—Catalysts comprising molecular sieves having base-exchange properties, e.g. crystalline zeolites
- B01J29/06—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof
- B01J29/70—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof of types characterised by their specific structure not provided for in groups B01J29/08 - B01J29/65
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- Organic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Treating Waste Gases (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Catalysts (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003154219A JP4564242B2 (en) | 2003-05-30 | 2003-05-30 | Treatment method, treatment agent and treatment apparatus for exhaust gas containing inorganic halogenated gas containing chlorine trifluoride |
Publications (1)
Publication Number | Publication Date |
---|---|
SG111184A1 true SG111184A1 (en) | 2005-05-30 |
Family
ID=34048944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200402960A SG111184A1 (en) | 2003-05-30 | 2004-05-21 | Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4564242B2 (en) |
KR (1) | KR101178179B1 (en) |
SG (1) | SG111184A1 (en) |
TW (1) | TWI361104B (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4553705B2 (en) * | 2004-12-02 | 2010-09-29 | 大陽日酸株式会社 | Abatement device and its management method |
EP2500093B1 (en) * | 2007-10-26 | 2020-06-10 | Asahi Kasei Kabushiki Kaisha | Use of a supported composite particle material, production process of said material and process for producing compounds using supported composite particle material as catalyst for chemical synthesis |
JP5471313B2 (en) * | 2008-12-11 | 2014-04-16 | セントラル硝子株式会社 | Methods for removing chlorine trifluoride |
JP5626849B2 (en) * | 2010-05-07 | 2014-11-19 | 学校法人 関西大学 | Method for decomposing fluorine gas with zeolite |
JP6252153B2 (en) * | 2013-12-12 | 2017-12-27 | 宇部興産株式会社 | Gas processing apparatus and gas processing cartridge |
JP2015112545A (en) * | 2013-12-12 | 2015-06-22 | 宇部興産株式会社 | Gas treatment device and gas treatment cartridge |
JP2015112544A (en) * | 2013-12-12 | 2015-06-22 | 宇部興産株式会社 | Gas treatment device and gas treatment cartridge |
JP2015112546A (en) * | 2013-12-12 | 2015-06-22 | 宇部興産株式会社 | Gas treatment device and gas treatment cartridge |
JP2016221428A (en) * | 2015-05-28 | 2016-12-28 | 宇部興産株式会社 | Gas processing device and gas processing cartridge |
JP7253132B2 (en) * | 2018-07-30 | 2023-04-06 | クラリアント触媒株式会社 | Halogen gas remover, method for producing same, and method for monitoring consumption of remover |
CN114538380B (en) * | 2021-01-29 | 2022-10-14 | 福建德尔科技股份有限公司 | Electronic-grade chlorine trifluoride purification system and temperature difference power control method thereof |
CN116902922B (en) * | 2023-09-13 | 2023-12-05 | 福建省巨颖高能新材料有限公司 | Device and method for preparing industrial grade chlorine pentafluoride |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0441236A1 (en) * | 1990-02-05 | 1991-08-14 | Ebara Corporation | Process for treating waste gases containing ClF3 |
JPH10290920A (en) * | 1997-04-22 | 1998-11-04 | Hitachi Ltd | Highly corrosion-resisting waste gas decomposition device and semiconductor manufacturing device |
JPH1170319A (en) * | 1997-06-20 | 1999-03-16 | Ebara Corp | Treatment of exhaust gas containing inorganic halogenated gas and treatment device |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03217217A (en) * | 1990-01-19 | 1991-09-25 | Central Glass Co Ltd | Treatment of waste gas containing chlorine trifluoride |
JPH0716583B2 (en) * | 1990-08-10 | 1995-03-01 | セントラル硝子株式会社 | Method for dry treatment of exhaust gas containing chlorine fluoride |
JPH10263367A (en) * | 1997-03-27 | 1998-10-06 | Aiwa Co Ltd | Deodorization device |
JP2000117053A (en) * | 1998-10-16 | 2000-04-25 | Tomoe Shokai:Kk | Chlorine trifluoride treating cylinder and treatment of gas to be treated containing chlorine trifluoride |
JP4913271B2 (en) * | 1999-07-07 | 2012-04-11 | ズードケミー触媒株式会社 | Halogen gas treatment agent |
JP3600073B2 (en) | 1999-07-14 | 2004-12-08 | セントラル硝子株式会社 | Improved microbial pesticide formulation |
-
2003
- 2003-05-30 JP JP2003154219A patent/JP4564242B2/en not_active Expired - Lifetime
-
2004
- 2004-05-14 TW TW093113633A patent/TWI361104B/en not_active IP Right Cessation
- 2004-05-21 SG SG200402960A patent/SG111184A1/en unknown
- 2004-05-28 KR KR1020040038115A patent/KR101178179B1/en active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0441236A1 (en) * | 1990-02-05 | 1991-08-14 | Ebara Corporation | Process for treating waste gases containing ClF3 |
JPH03229618A (en) * | 1990-02-05 | 1991-10-11 | Ebara Res Co Ltd | Treatment of exhaust gas containing clf3 |
JPH10290920A (en) * | 1997-04-22 | 1998-11-04 | Hitachi Ltd | Highly corrosion-resisting waste gas decomposition device and semiconductor manufacturing device |
JPH1170319A (en) * | 1997-06-20 | 1999-03-16 | Ebara Corp | Treatment of exhaust gas containing inorganic halogenated gas and treatment device |
Also Published As
Publication number | Publication date |
---|---|
JP2004351364A (en) | 2004-12-16 |
TWI361104B (en) | 2012-04-01 |
TW200503823A (en) | 2005-02-01 |
KR101178179B1 (en) | 2012-08-29 |
KR20040103406A (en) | 2004-12-08 |
JP4564242B2 (en) | 2010-10-20 |
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