SG110202A1 - Method of treating wastewater containing flouride ion - Google Patents
Method of treating wastewater containing flouride ionInfo
- Publication number
- SG110202A1 SG110202A1 SG200405957A SG200405957A SG110202A1 SG 110202 A1 SG110202 A1 SG 110202A1 SG 200405957 A SG200405957 A SG 200405957A SG 200405957 A SG200405957 A SG 200405957A SG 110202 A1 SG110202 A1 SG 110202A1
- Authority
- SG
- Singapore
- Prior art keywords
- wastewater containing
- treating wastewater
- flouride
- ion
- flouride ion
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
- C02F1/583—Treatment of water, waste water, or sewage by removing specified dissolved compounds by removing fluoride or fluorine compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
- C02F1/54—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities using organic material
- C02F1/56—Macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Removal Of Specific Substances (AREA)
- Separation Of Suspended Particles By Flocculating Agents (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003323118A JP4232019B2 (ja) | 2003-09-16 | 2003-09-16 | フッ素含有排水の処理方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG110202A1 true SG110202A1 (en) | 2005-04-28 |
Family
ID=34454283
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200405957A SG110202A1 (en) | 2003-09-16 | 2004-09-13 | Method of treating wastewater containing flouride ion |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4232019B2 (ko) |
KR (1) | KR101082714B1 (ko) |
SG (1) | SG110202A1 (ko) |
TW (1) | TWI365172B (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6053260B2 (ja) * | 2011-07-07 | 2016-12-27 | 三菱瓦斯化学株式会社 | ホウ素及びフッ素含有排水の処理方法 |
JP6053261B2 (ja) * | 2011-07-07 | 2016-12-27 | 三菱瓦斯化学株式会社 | ホウ素含有排水の処理方法 |
JP6822732B2 (ja) * | 2017-03-23 | 2021-01-27 | 住友金属鉱山エンジニアリング株式会社 | フッ素含有排水の処理方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05185074A (ja) * | 1992-01-07 | 1993-07-27 | Sanyo Chem Ind Ltd | 多価金属含有水の処理剤および処理方法 |
CA2314149A1 (en) | 1997-12-15 | 1999-06-24 | Japan As Represented By Ministry Of International Trade And Industry, Di Rector-General, Agency Of Industrial Science And Technology | Method of removing harmful ions and removing agent used therefor |
JP3621963B2 (ja) | 1999-07-23 | 2005-02-23 | 独立行政法人産業技術総合研究所 | 有害性イオンを除去するための方法及びそれに用いる除去剤 |
JP3364833B2 (ja) * | 1999-10-12 | 2003-01-08 | 独立行政法人産業技術総合研究所 | フッ素イオンの除去方法 |
JP4077143B2 (ja) * | 2000-07-31 | 2008-04-16 | 日本特殊陶業株式会社 | クロメート排液の処理方法 |
JP2002059174A (ja) | 2000-08-23 | 2002-02-26 | National Institute Of Advanced Industrial & Technology | フッ素イオンの除去方法及び除去剤 |
JP4034218B2 (ja) * | 2002-03-25 | 2008-01-16 | 有限会社ウエステック | 排水処理方法 |
JP3949042B2 (ja) * | 2002-10-01 | 2007-07-25 | オルガノ株式会社 | フッ素またはリンの除去方法 |
-
2003
- 2003-09-16 JP JP2003323118A patent/JP4232019B2/ja not_active Expired - Lifetime
-
2004
- 2004-09-13 SG SG200405957A patent/SG110202A1/en unknown
- 2004-09-15 TW TW093127806A patent/TWI365172B/zh active
- 2004-09-16 KR KR1020040074103A patent/KR101082714B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2005087835A (ja) | 2005-04-07 |
TW200513442A (en) | 2005-04-16 |
KR101082714B1 (ko) | 2011-11-15 |
TWI365172B (en) | 2012-06-01 |
KR20050027966A (ko) | 2005-03-21 |
JP4232019B2 (ja) | 2009-03-04 |
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