SG107661A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG107661A1
SG107661A1 SG200303394A SG200303394A SG107661A1 SG 107661 A1 SG107661 A1 SG 107661A1 SG 200303394 A SG200303394 A SG 200303394A SG 200303394 A SG200303394 A SG 200303394A SG 107661 A1 SG107661 A1 SG 107661A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200303394A
Other languages
English (en)
Inventor
Petrus Matthijs Henric Vosters
Hernes Jacobs
Der Schoot Harmen Klaas Van
Peter Rutgers
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG107661A1 publication Critical patent/SG107661A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200303394A 2002-06-13 2003-06-11 Lithographic apparatus and device manufacturing method SG107661A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02254139 2002-06-13

Publications (1)

Publication Number Publication Date
SG107661A1 true SG107661A1 (en) 2004-12-29

Family

ID=31197951

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200303394A SG107661A1 (en) 2002-06-13 2003-06-11 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US6970230B2 (zh)
JP (1) JP3972202B2 (zh)
KR (1) KR100523823B1 (zh)
CN (1) CN1299169C (zh)
DE (1) DE60317407T2 (zh)
SG (1) SG107661A1 (zh)
TW (1) TWI223838B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7675201B2 (en) * 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support
CN111168995B (zh) * 2020-01-03 2022-09-02 深圳摩方新材科技有限公司 一种膜涂层多材料光固化3d打印设备及其使用方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3641973A (en) * 1970-11-25 1972-02-15 Air Reduction Vacuum coating apparatus
US4430571A (en) * 1981-04-16 1984-02-07 Control Data Corporation Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system
JPS5844719A (ja) 1981-09-11 1983-03-15 Nippon Telegr & Teleph Corp <Ntt> 電子ビ−ム露光装置
JPH05283509A (ja) 1992-03-31 1993-10-29 Nippon Seiko Kk ダスト吸引装置
TWI233535B (en) 1999-04-19 2005-06-01 Asml Netherlands Bv Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses
EP1052553A3 (en) 1999-04-19 2003-08-27 ASML Netherlands B.V. Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatus
JP2001085291A (ja) 1999-09-09 2001-03-30 Matsushita Electric Ind Co Ltd 電子ビーム露光装置
US6279490B1 (en) * 1999-10-08 2001-08-28 Etec Systems, Inc. Epicyclic stage
TW591342B (en) 2000-11-30 2004-06-11 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit manufacturing method using a lithographic projection apparatus

Also Published As

Publication number Publication date
JP2004040105A (ja) 2004-02-05
TWI223838B (en) 2004-11-11
CN1475864A (zh) 2004-02-18
US6970230B2 (en) 2005-11-29
KR20040026100A (ko) 2004-03-27
DE60317407T2 (de) 2008-09-18
TW200403718A (en) 2004-03-01
US20040061844A1 (en) 2004-04-01
JP3972202B2 (ja) 2007-09-05
DE60317407D1 (de) 2007-12-27
CN1299169C (zh) 2007-02-07
KR100523823B1 (ko) 2005-10-25

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