SG106163A1 - Method and apparatus for a pellicle frame with porous filtering inserts and heightened bonding surfaces - Google Patents

Method and apparatus for a pellicle frame with porous filtering inserts and heightened bonding surfaces

Info

Publication number
SG106163A1
SG106163A1 SG200307223A SG200307223A SG106163A1 SG 106163 A1 SG106163 A1 SG 106163A1 SG 200307223 A SG200307223 A SG 200307223A SG 200307223 A SG200307223 A SG 200307223A SG 106163 A1 SG106163 A1 SG 106163A1
Authority
SG
Singapore
Prior art keywords
opening
frame
optical
heightened
opposing surface
Prior art date
Application number
SG200307223A
Other languages
English (en)
Inventor
Laganza Joseph
Ivaldi Jorge
Luo Florence
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/314,419 external-priority patent/US6847434B2/en
Priority claimed from US10/464,840 external-priority patent/US6822731B1/en
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG106163A1 publication Critical patent/SG106163A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
SG200307223A 2002-12-09 2003-12-08 Method and apparatus for a pellicle frame with porous filtering inserts and heightened bonding surfaces SG106163A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/314,419 US6847434B2 (en) 2000-02-10 2002-12-09 Method and apparatus for a pellicle frame with porous filtering inserts
US10/464,840 US6822731B1 (en) 2003-06-18 2003-06-18 Method and apparatus for a pellicle frame with heightened bonding surfaces

Publications (1)

Publication Number Publication Date
SG106163A1 true SG106163A1 (en) 2004-09-30

Family

ID=32328826

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200307223A SG106163A1 (en) 2002-12-09 2003-12-08 Method and apparatus for a pellicle frame with porous filtering inserts and heightened bonding surfaces

Country Status (5)

Country Link
EP (2) EP1720070A3 (fr)
JP (1) JP2004191986A (fr)
KR (1) KR100576189B1 (fr)
CN (1) CN1506764A (fr)
SG (1) SG106163A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184817A (ja) * 2004-12-28 2006-07-13 Fujitsu Ltd ペリクル及び転写基板
US20060246234A1 (en) * 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame
WO2008105531A1 (fr) * 2007-03-01 2008-09-04 Nikon Corporation Appareil de cadre de pellicule, masque, procédé d'exposition, appareil d'exposition et procédé de fabrication de dispositif
KR101442776B1 (ko) * 2008-04-15 2014-09-25 주성엔지니어링(주) 배기 컨덕턴스를 향상시킨 에지프레임과 이를 포함하는기판처리장치
JP5749680B2 (ja) * 2012-04-26 2015-07-15 信越化学工業株式会社 ペリクル
US9759997B2 (en) * 2015-12-17 2017-09-12 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle assembly and method for advanced lithography
CN110809736B (zh) * 2017-06-15 2023-10-24 Asml荷兰有限公司 表膜和表膜组件
KR20230019853A (ko) * 2020-06-08 2023-02-09 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클 프레임, 펠리클, 펠리클 부착 노광 원판, 노광 방법, 반도체의 제조 방법 및 액정 표시판의 제조 방법
KR20230039294A (ko) 2021-09-14 2023-03-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 그 제조방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04196117A (ja) * 1990-11-26 1992-07-15 Seiko Epson Corp 半導体製造装置
JPH05297572A (ja) * 1992-04-22 1993-11-12 Mitsubishi Electric Corp ペリクル膜付きレチクル及びその異物除去方法
EP0696760A1 (fr) * 1994-08-11 1996-02-14 Mitsui Petrochemical Industries, Ltd. Protection pour masques
WO2001059522A1 (fr) * 2000-02-10 2001-08-16 Asml Us, Inc. Procede et dispositif pour obtenir un reticule comportant un espace pellicule-reticule purge

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0619547B2 (ja) * 1984-07-05 1994-03-16 株式会社ニコン マスク保護装置
JPS638898Y2 (fr) * 1984-11-12 1988-03-16
JPH03166545A (ja) * 1989-11-27 1991-07-18 Hitachi Electron Eng Co Ltd Ｉｃレチクル保護用のペリクル枠
DE69227092T2 (de) * 1991-05-17 1999-05-20 Du Pont Photomasks Inc Druckentlastende membranabdeckung
JPH05232690A (ja) * 1991-08-23 1993-09-10 Oki Electric Ind Co Ltd フォトマスク用ペリクル
US5344677A (en) * 1992-08-27 1994-09-06 Hong Gilbert H Photochemically stable deep ultraviolet pellicles for excimer lasers
US6436586B1 (en) * 1999-04-21 2002-08-20 Shin-Etsu Chemical Co., Ltd. Pellicle with a filter and method for production thereof
US6614504B2 (en) * 2000-03-30 2003-09-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2002158153A (ja) * 2000-11-16 2002-05-31 Canon Inc 露光装置およびペリクル空間内ガス置換方法
JP4380910B2 (ja) * 2000-12-14 2009-12-09 信越化学工業株式会社 ペリクル
JP2002182373A (ja) * 2000-12-18 2002-06-26 Shin Etsu Chem Co Ltd ペリクル及びその製造方法及びフォトマスク
JP2003307832A (ja) * 2002-04-16 2003-10-31 Asahi Glass Co Ltd ペリクル及びペリクル装着フォトマスク

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04196117A (ja) * 1990-11-26 1992-07-15 Seiko Epson Corp 半導体製造装置
JPH05297572A (ja) * 1992-04-22 1993-11-12 Mitsubishi Electric Corp ペリクル膜付きレチクル及びその異物除去方法
EP0696760A1 (fr) * 1994-08-11 1996-02-14 Mitsui Petrochemical Industries, Ltd. Protection pour masques
WO2001059522A1 (fr) * 2000-02-10 2001-08-16 Asml Us, Inc. Procede et dispositif pour obtenir un reticule comportant un espace pellicule-reticule purge

Also Published As

Publication number Publication date
KR20040050856A (ko) 2004-06-17
CN1506764A (zh) 2004-06-23
EP1720070A3 (fr) 2006-11-22
EP1429186A2 (fr) 2004-06-16
KR100576189B1 (ko) 2006-05-03
EP1720070A2 (fr) 2006-11-08
JP2004191986A (ja) 2004-07-08
EP1429186A3 (fr) 2006-06-07

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