SG103376A1 - Lithographic apparatus, device manufacturing method, and method of manufacturing and optical element - Google Patents
Lithographic apparatus, device manufacturing method, and method of manufacturing and optical elementInfo
- Publication number
- SG103376A1 SG103376A1 SG200207373A SG200207373A SG103376A1 SG 103376 A1 SG103376 A1 SG 103376A1 SG 200207373 A SG200207373 A SG 200207373A SG 200207373 A SG200207373 A SG 200207373A SG 103376 A1 SG103376 A1 SG 103376A1
- Authority
- SG
- Singapore
- Prior art keywords
- manufacturing
- optical element
- lithographic apparatus
- device manufacturing
- lithographic
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01310155 | 2001-12-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG103376A1 true SG103376A1 (en) | 2004-04-29 |
Family
ID=8182514
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200207373A SG103376A1 (en) | 2001-12-04 | 2002-12-02 | Lithographic apparatus, device manufacturing method, and method of manufacturing and optical element |
Country Status (6)
Country | Link |
---|---|
US (2) | US6747730B2 (ja) |
JP (1) | JP3588095B2 (ja) |
KR (1) | KR100588126B1 (ja) |
CN (1) | CN1282039C (ja) |
SG (1) | SG103376A1 (ja) |
TW (1) | TWI260469B (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7428037B2 (en) * | 2002-07-24 | 2008-09-23 | Carl Zeiss Smt Ag | Optical component that includes a material having a thermal longitudinal expansion with a zero crossing |
KR101052386B1 (ko) * | 2003-09-27 | 2011-07-28 | 칼 짜이스 에스엠테 게엠베하 | 영점 교차 온도 근처에서 열팽창 계수의 온도에 따라, 상이한 기울기 부호를 갖는 재료로 구성된 미러들을 구비한 초단파 자외선 투영 광학계 |
JP4537087B2 (ja) * | 2004-02-12 | 2010-09-01 | キヤノン株式会社 | 露光装置、デバイスの製造方法 |
US7295284B2 (en) * | 2004-02-27 | 2007-11-13 | Canon Kk | Optical system, exposure apparatus using the same and device manufacturing method |
JP5620638B2 (ja) * | 2005-07-19 | 2014-11-05 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学結像装置 |
DE102008002403A1 (de) * | 2008-06-12 | 2009-12-17 | Carl Zeiss Smt Ag | Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung |
EP2221669A3 (en) * | 2009-02-19 | 2011-02-09 | ASML Netherlands B.V. | A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method |
DE102010030913A1 (de) * | 2010-07-05 | 2011-10-13 | Carl Zeiss Smt Gmbh | Erzeugen eines Substrats für einen EUV-Spiegel mit einer Soll-Oberflächenform bei einer Betriebstemperatur |
JP5096530B2 (ja) * | 2010-07-26 | 2012-12-12 | カール・ツァイス・エスエムティー・ゲーエムベーハー | ゼロ転移温度周辺の熱膨張係数に応じて温度の上昇に対する傾きの符号が異なる材料で構成されたミラーを備えたeuv投影レンズ |
DE102010044969A1 (de) * | 2010-09-10 | 2012-03-15 | Carl Zeiss Smt Gmbh | Verfahren zum Betreiben einer Projektionsbelichtungsanlage sowie Steuervorrichtung |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4924701A (en) * | 1988-09-06 | 1990-05-15 | Panex Corporation | Pressure measurement system |
DE3917832A1 (de) * | 1989-06-01 | 1990-12-13 | Bosch Gmbh Robert | Sensor zur bestimmung der winkelgeschwindigkeit |
US5265143A (en) * | 1993-01-05 | 1993-11-23 | At&T Bell Laboratories | X-ray optical element including a multilayer coating |
US6132676A (en) * | 1997-06-30 | 2000-10-17 | Massachusetts Institute Of Technology | Minimal thermal expansion, high thermal conductivity metal-ceramic matrix composite |
US6563565B2 (en) * | 1997-08-27 | 2003-05-13 | Nikon Corporation | Apparatus and method for projection exposure |
US6011646A (en) * | 1998-02-20 | 2000-01-04 | The Regents Of The Unviersity Of California | Method to adjust multilayer film stress induced deformation of optics |
AU2549899A (en) * | 1998-03-02 | 1999-09-20 | Nikon Corporation | Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device |
US6159643A (en) * | 1999-03-01 | 2000-12-12 | Advanced Micro Devices, Inc. | Extreme ultraviolet lithography reflective mask |
AU5932500A (en) * | 1999-07-22 | 2001-02-13 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
WO2001007969A1 (fr) | 1999-07-23 | 2001-02-01 | Fujitsu Limited | Dispositif de formation d'images et machine a developper |
DE10040998A1 (de) * | 2000-08-22 | 2002-03-14 | Zeiss Carl | Projektionsbelichtungsanlage |
US20020064655A1 (en) * | 2000-09-08 | 2002-05-30 | Louis Morin | Brass plated carbon fiber reinforced rubber |
DE10134387A1 (de) * | 2001-07-14 | 2003-01-23 | Zeiss Carl | Optisches System mit mehreren optischen Elementen |
-
2002
- 2002-12-02 TW TW091134936A patent/TWI260469B/zh not_active IP Right Cessation
- 2002-12-02 JP JP2002382893A patent/JP3588095B2/ja not_active Expired - Fee Related
- 2002-12-02 SG SG200207373A patent/SG103376A1/en unknown
- 2002-12-02 KR KR1020020075855A patent/KR100588126B1/ko not_active IP Right Cessation
- 2002-12-02 CN CNB021455910A patent/CN1282039C/zh not_active Expired - Fee Related
- 2002-12-02 US US10/307,485 patent/US6747730B2/en not_active Expired - Lifetime
-
2004
- 2004-02-25 US US10/785,046 patent/US7391502B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR100588126B1 (ko) | 2006-06-09 |
US20030123037A1 (en) | 2003-07-03 |
JP2003188097A (ja) | 2003-07-04 |
US6747730B2 (en) | 2004-06-08 |
KR20030076190A (ko) | 2003-09-26 |
JP3588095B2 (ja) | 2004-11-10 |
CN1282039C (zh) | 2006-10-25 |
TW200410049A (en) | 2004-06-16 |
US20040165173A1 (en) | 2004-08-26 |
US7391502B2 (en) | 2008-06-24 |
TWI260469B (en) | 2006-08-21 |
CN1448795A (zh) | 2003-10-15 |
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