SG102028A1 - Reactor for generating moisture - Google Patents

Reactor for generating moisture

Info

Publication number
SG102028A1
SG102028A1 SG200200439A SG200200439A SG102028A1 SG 102028 A1 SG102028 A1 SG 102028A1 SG 200200439 A SG200200439 A SG 200200439A SG 200200439 A SG200200439 A SG 200200439A SG 102028 A1 SG102028 A1 SG 102028A1
Authority
SG
Singapore
Prior art keywords
reactor
generating moisture
moisture
generating
Prior art date
Application number
SG200200439A
Other languages
English (en)
Inventor
Katsunori Komehana
Yukio Minami
Koji Kawada
Akihiro Morimoto
Nobukazu Ikeda
Osamu Nakamura
Teruo Honiden
Toru Hirai
Original Assignee
Fujikin Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikin Kk filed Critical Fujikin Kk
Publication of SG102028A1 publication Critical patent/SG102028A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B5/00—Water
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/007—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor in the presence of catalytically active bodies, e.g. porous plates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Hydrogen, Water And Hydrids (AREA)
SG200200439A 2001-03-23 2002-02-01 Reactor for generating moisture SG102028A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001084507A JP2002274812A (ja) 2001-03-23 2001-03-23 水分発生用反応炉

Publications (1)

Publication Number Publication Date
SG102028A1 true SG102028A1 (en) 2004-02-27

Family

ID=18940166

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200200439A SG102028A1 (en) 2001-03-23 2002-02-01 Reactor for generating moisture

Country Status (9)

Country Link
US (1) US20020136676A1 (de)
EP (1) EP1243551B1 (de)
JP (1) JP2002274812A (de)
KR (1) KR20020075202A (de)
CN (1) CN1376632A (de)
DE (1) DE60200524T2 (de)
IL (1) IL148236A0 (de)
SG (1) SG102028A1 (de)
TW (1) TW520346B (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100387731B1 (ko) * 1999-08-06 2003-06-18 가부시키가이샤 후지킨 수분발생 공급장치 및 수분발생용 반응로
ES2952997T3 (es) * 2018-06-22 2023-11-07 Molecular Plasma Group Sa Método y aparato mejorados para la deposición de revestimiento por chorro de plasma a presión atmosférica sobre un sustrato
JP7360100B2 (ja) 2018-09-25 2023-10-12 株式会社フジキン 濃度測定装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0878443A1 (de) * 1996-01-29 1998-11-18 FUJIKIN Inc. Verfahren zur feuchtigkeitserzeugung, reaktor zur feuchtigkeitserzeugung, verfahren zum kontrollieren der temperatur eines reaktors zur feuchtigkeitserzeugung und verfahren zur herstellung einer mit platin beschichteten katalysatorschicht
EP0922667A1 (de) * 1997-06-17 1999-06-16 FUJIKIN Inc. Verfahren zur erzeugung von wasser für die halbleiterherstellung
EP0987217A1 (de) * 1997-04-28 2000-03-22 Fujikin Incorporated Reaktor zur Herstellung von Feuchtigkeit
WO2001010774A1 (fr) * 1999-08-06 2001-02-15 Fujikin Incorporated Dispositif de generation/distribution d'humidite et reacteur generateur d'humidite

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3644810B2 (ja) * 1997-12-10 2005-05-11 株式会社フジキン 少流量の水分供給方法
JP3639440B2 (ja) * 1998-09-02 2005-04-20 忠弘 大見 水分発生用反応炉
JP3679636B2 (ja) * 1998-12-04 2005-08-03 株式会社フジキン 水分発生用反応炉
JP3686761B2 (ja) * 1998-12-04 2005-08-24 株式会社フジキン 水分発生用反応炉
EP1238942A4 (de) * 2000-06-05 2005-07-06 Fujikin Kk Feuchtigkeitserzeugender reaktor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0878443A1 (de) * 1996-01-29 1998-11-18 FUJIKIN Inc. Verfahren zur feuchtigkeitserzeugung, reaktor zur feuchtigkeitserzeugung, verfahren zum kontrollieren der temperatur eines reaktors zur feuchtigkeitserzeugung und verfahren zur herstellung einer mit platin beschichteten katalysatorschicht
EP0987217A1 (de) * 1997-04-28 2000-03-22 Fujikin Incorporated Reaktor zur Herstellung von Feuchtigkeit
EP0922667A1 (de) * 1997-06-17 1999-06-16 FUJIKIN Inc. Verfahren zur erzeugung von wasser für die halbleiterherstellung
WO2001010774A1 (fr) * 1999-08-06 2001-02-15 Fujikin Incorporated Dispositif de generation/distribution d'humidite et reacteur generateur d'humidite
EP1138631A1 (de) * 1999-08-06 2001-10-04 Fujikin Incorporated Feuchtigkeitsgenerierende/liefernde vorrichtung und feuchtigkeitserzeugender reaktor

Also Published As

Publication number Publication date
TW520346B (en) 2003-02-11
KR20020075202A (ko) 2002-10-04
JP2002274812A (ja) 2002-09-25
DE60200524D1 (de) 2004-07-01
IL148236A0 (en) 2002-09-12
EP1243551A2 (de) 2002-09-25
US20020136676A1 (en) 2002-09-26
CN1376632A (zh) 2002-10-30
EP1243551B1 (de) 2004-05-26
DE60200524T2 (de) 2005-06-23
EP1243551A3 (de) 2003-07-02

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