SG10201807026VA - Method and systems to control optical transmissivity of a polish pad material - Google Patents

Method and systems to control optical transmissivity of a polish pad material

Info

Publication number
SG10201807026VA
SG10201807026VA SG10201807026VA SG10201807026VA SG10201807026VA SG 10201807026V A SG10201807026V A SG 10201807026VA SG 10201807026V A SG10201807026V A SG 10201807026VA SG 10201807026V A SG10201807026V A SG 10201807026VA SG 10201807026V A SG10201807026V A SG 10201807026VA
Authority
SG
Singapore
Prior art keywords
systems
polish pad
optical transmissivity
pad material
control optical
Prior art date
Application number
SG10201807026VA
Other languages
English (en)
Inventor
Thomas West
Peter Mckeever
Gary Quigley
Suli Holani
Pepito Galvez
Original Assignee
Thomas West Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomas West Inc filed Critical Thomas West Inc
Publication of SG10201807026VA publication Critical patent/SG10201807026VA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
SG10201807026VA 2014-02-20 2015-02-19 Method and systems to control optical transmissivity of a polish pad material SG10201807026VA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201461942457P 2014-02-20 2014-02-20

Publications (1)

Publication Number Publication Date
SG10201807026VA true SG10201807026VA (en) 2018-09-27

Family

ID=53878960

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201807026VA SG10201807026VA (en) 2014-02-20 2015-02-19 Method and systems to control optical transmissivity of a polish pad material
SG11201606734RA SG11201606734RA (en) 2014-02-20 2015-02-19 Method and systems to control optical transmissivity of a polish pad material

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201606734RA SG11201606734RA (en) 2014-02-20 2015-02-19 Method and systems to control optical transmissivity of a polish pad material

Country Status (4)

Country Link
KR (1) KR102362562B1 (ko)
SG (2) SG10201807026VA (ko)
TW (1) TWI647066B (ko)
WO (1) WO2015127077A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11090778B2 (en) 2012-04-02 2021-08-17 Thomas West, Inc. Methods and systems for centrifugal casting of polymer polish pads and polishing pads made by the methods

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10022842B2 (en) 2012-04-02 2018-07-17 Thomas West, Inc. Method and systems to control optical transmissivity of a polish pad material
US10722997B2 (en) 2012-04-02 2020-07-28 Thomas West, Inc. Multilayer polishing pads made by the methods for centrifugal casting of polymer polish pads
KR20210094024A (ko) * 2018-11-27 2021-07-28 쓰리엠 이노베이티브 프로퍼티즈 컴파니 폴리싱 패드 및 시스템과 이의 제조 및 사용 방법
US20220203495A1 (en) * 2020-12-29 2022-06-30 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Cmp polishing pad with window having transparency at low wavelengths and material useful in such window

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001277304A (ja) 2000-03-30 2001-10-09 Hitachi Chem Co Ltd 半導体ウエハ用研磨パッドの製造法
US6641471B1 (en) * 2000-09-19 2003-11-04 Rodel Holdings, Inc Polishing pad having an advantageous micro-texture and methods relating thereto
JP2003001565A (ja) 2001-06-21 2003-01-08 Pentax Corp 研磨砥石の製造方法
US6884156B2 (en) * 2003-06-17 2005-04-26 Cabot Microelectronics Corporation Multi-layer polishing pad material for CMP
GB2405215B (en) 2003-08-21 2005-09-28 Micron Technology Inc System and method for testing devices utilizing capacitively coupled signalling
US20050171224A1 (en) * 2004-02-03 2005-08-04 Kulp Mary J. Polyurethane polishing pad
US7275928B2 (en) * 2004-11-23 2007-10-02 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Apparatus for forming a striation reduced chemical mechanical polishing pad
KR100771562B1 (ko) 2006-04-27 2007-10-30 부산대학교 산학협력단 반도체 웨이퍼의 화학기계적 연마 패드의 제조장치 및제조방법
JP5318756B2 (ja) * 2008-02-04 2013-10-16 株式会社クラレ 研磨パッドの製造方法
KR20100041160A (ko) * 2008-10-13 2010-04-22 주식회사 동부하이텍 연마 패드 및 그의 제조 방법
KR101021783B1 (ko) * 2009-02-25 2011-03-17 엠.씨.케이 (주) 연마패드 제조장치 및 이를 이용한 연마패드 제조방법
US8697239B2 (en) * 2009-07-24 2014-04-15 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Multi-functional polishing pad
US8257545B2 (en) * 2010-09-29 2012-09-04 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with light stable polymeric endpoint detection window and method of polishing therewith
KR102100654B1 (ko) * 2012-04-02 2020-04-14 토마스 웨스트 인코포레이티드 폴리머 연마패드의 원심주조를 위한 방법 및 시스템 및 상기 방법으로 만들어진 연마패드
US9194045B2 (en) 2012-04-03 2015-11-24 Novellus Systems, Inc. Continuous plasma and RF bias to regulate damage in a substrate processing system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11090778B2 (en) 2012-04-02 2021-08-17 Thomas West, Inc. Methods and systems for centrifugal casting of polymer polish pads and polishing pads made by the methods

Also Published As

Publication number Publication date
KR20160124208A (ko) 2016-10-26
TW201534430A (zh) 2015-09-16
SG11201606734RA (en) 2016-09-29
WO2015127077A1 (en) 2015-08-27
TWI647066B (zh) 2019-01-11
KR102362562B1 (ko) 2022-02-14

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