SG11201606734RA - Method and systems to control optical transmissivity of a polish pad material - Google Patents

Method and systems to control optical transmissivity of a polish pad material

Info

Publication number
SG11201606734RA
SG11201606734RA SG11201606734RA SG11201606734RA SG11201606734RA SG 11201606734R A SG11201606734R A SG 11201606734RA SG 11201606734R A SG11201606734R A SG 11201606734RA SG 11201606734R A SG11201606734R A SG 11201606734RA SG 11201606734R A SG11201606734R A SG 11201606734RA
Authority
SG
Singapore
Prior art keywords
systems
pad material
control optical
optical transmissivity
polish pad
Prior art date
Application number
SG11201606734RA
Inventor
Thomas West
Peter Mckeever
Gary Quigley
Suli Holani
Pepito Galvez
Original Assignee
Thomas West Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomas West Inc filed Critical Thomas West Inc
Publication of SG11201606734RA publication Critical patent/SG11201606734RA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
SG11201606734RA 2014-02-20 2015-02-19 Method and systems to control optical transmissivity of a polish pad material SG11201606734RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201461942457P 2014-02-20 2014-02-20
PCT/US2015/016615 WO2015127077A1 (en) 2014-02-20 2015-02-19 Method and systems to control optical transmissivity of a polish pad material

Publications (1)

Publication Number Publication Date
SG11201606734RA true SG11201606734RA (en) 2016-09-29

Family

ID=53878960

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201606734RA SG11201606734RA (en) 2014-02-20 2015-02-19 Method and systems to control optical transmissivity of a polish pad material
SG10201807026VA SG10201807026VA (en) 2014-02-20 2015-02-19 Method and systems to control optical transmissivity of a polish pad material

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG10201807026VA SG10201807026VA (en) 2014-02-20 2015-02-19 Method and systems to control optical transmissivity of a polish pad material

Country Status (4)

Country Link
KR (1) KR102362562B1 (en)
SG (2) SG11201606734RA (en)
TW (1) TWI647066B (en)
WO (1) WO2015127077A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10722997B2 (en) 2012-04-02 2020-07-28 Thomas West, Inc. Multilayer polishing pads made by the methods for centrifugal casting of polymer polish pads
TWI671161B (en) 2012-04-02 2019-09-11 美商湯瑪士衛斯有限公司 Methods and systems for centrifugal casting of polymer polish pads and polishing pads made by the methods
US10022842B2 (en) 2012-04-02 2018-07-17 Thomas West, Inc. Method and systems to control optical transmissivity of a polish pad material
US20220023991A1 (en) * 2018-11-27 2022-01-27 3M Innovative Properties Company Polishing pads and systems and methods of making and using the same
US20220203495A1 (en) * 2020-12-29 2022-06-30 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Cmp polishing pad with window having transparency at low wavelengths and material useful in such window

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001277304A (en) * 2000-03-30 2001-10-09 Hitachi Chem Co Ltd Producing method for polishing pad for semiconductor wafer
US6641471B1 (en) * 2000-09-19 2003-11-04 Rodel Holdings, Inc Polishing pad having an advantageous micro-texture and methods relating thereto
JP2003001565A (en) * 2001-06-21 2003-01-08 Pentax Corp Manufacturing method of polishing grinding stone
US6884156B2 (en) * 2003-06-17 2005-04-26 Cabot Microelectronics Corporation Multi-layer polishing pad material for CMP
GB2405215B (en) * 2003-08-21 2005-09-28 Micron Technology Inc System and method for testing devices utilizing capacitively coupled signalling
US20050171224A1 (en) * 2004-02-03 2005-08-04 Kulp Mary J. Polyurethane polishing pad
US7275928B2 (en) * 2004-11-23 2007-10-02 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Apparatus for forming a striation reduced chemical mechanical polishing pad
KR100771562B1 (en) * 2006-04-27 2007-10-30 부산대학교 산학협력단 Manufacturing apparatus and method of chemical-mechanical polishing pad
JP5318756B2 (en) * 2008-02-04 2013-10-16 株式会社クラレ Polishing pad manufacturing method
KR20100041160A (en) * 2008-10-13 2010-04-22 주식회사 동부하이텍 Polishing pad and method of manufacturing the same
KR101021783B1 (en) * 2009-02-25 2011-03-17 엠.씨.케이 (주) Polishing pad manufacturing device and manufacturing process using it
US8697239B2 (en) * 2009-07-24 2014-04-15 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Multi-functional polishing pad
US8257545B2 (en) * 2010-09-29 2012-09-04 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with light stable polymeric endpoint detection window and method of polishing therewith
TWI671161B (en) * 2012-04-02 2019-09-11 美商湯瑪士衛斯有限公司 Methods and systems for centrifugal casting of polymer polish pads and polishing pads made by the methods
US9194045B2 (en) * 2012-04-03 2015-11-24 Novellus Systems, Inc. Continuous plasma and RF bias to regulate damage in a substrate processing system

Also Published As

Publication number Publication date
SG10201807026VA (en) 2018-09-27
TWI647066B (en) 2019-01-11
KR102362562B1 (en) 2022-02-14
TW201534430A (en) 2015-09-16
KR20160124208A (en) 2016-10-26
WO2015127077A1 (en) 2015-08-27

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