SG10201804964TA - Target and process sensitivity analysis to requirements - Google Patents

Target and process sensitivity analysis to requirements

Info

Publication number
SG10201804964TA
SG10201804964TA SG10201804964TA SG10201804964TA SG10201804964TA SG 10201804964T A SG10201804964T A SG 10201804964TA SG 10201804964T A SG10201804964T A SG 10201804964TA SG 10201804964T A SG10201804964T A SG 10201804964TA SG 10201804964T A SG10201804964T A SG 10201804964TA
Authority
SG
Singapore
Prior art keywords
target
metrology
parameters
data
module
Prior art date
Application number
SG10201804964TA
Other languages
English (en)
Inventor
Michael E Adel
Nuriel Amir
Mark Ghinovker
Tal Shusterman
David Gready
Sergey Borodyansky
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of SG10201804964TA publication Critical patent/SG10201804964TA/en

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/20—Design optimisation, verification or simulation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
SG10201804964TA 2013-12-11 2014-12-10 Target and process sensitivity analysis to requirements SG10201804964TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201361914950P 2013-12-11 2013-12-11

Publications (1)

Publication Number Publication Date
SG10201804964TA true SG10201804964TA (en) 2018-07-30

Family

ID=53371817

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201804964TA SG10201804964TA (en) 2013-12-11 2014-12-10 Target and process sensitivity analysis to requirements

Country Status (7)

Country Link
US (1) US10726169B2 (enrdf_load_stackoverflow)
JP (1) JP6509225B2 (enrdf_load_stackoverflow)
KR (1) KR102265868B1 (enrdf_load_stackoverflow)
CN (1) CN105830069B (enrdf_load_stackoverflow)
SG (1) SG10201804964TA (enrdf_load_stackoverflow)
TW (1) TWI661324B (enrdf_load_stackoverflow)
WO (1) WO2015089231A1 (enrdf_load_stackoverflow)

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US10073357B2 (en) * 2014-02-21 2018-09-11 Asml Netherlands B.V. Measuring a process parameter for a manufacturing process involving lithography
CN107078074B (zh) * 2014-11-25 2021-05-25 科磊股份有限公司 分析及利用景观
US9903711B2 (en) * 2015-04-06 2018-02-27 KLA—Tencor Corporation Feed forward of metrology data in a metrology system
US10962886B2 (en) * 2015-12-31 2021-03-30 Asml Netherlands B.V. Selection of measurement locations for patterning processes
KR20180115299A (ko) * 2016-02-22 2018-10-22 에이에스엠엘 네델란즈 비.브이. 계측 데이터에 대한 기여도들의 분리
WO2018041550A1 (en) * 2016-09-01 2018-03-08 Asml Netherlands B.V. Automatic selection of metrology target measurement recipes
CN109195769B (zh) * 2016-10-18 2021-09-10 莱芬豪舍有限责任两合公司机器制造厂 一种监测生产过程的方法
US10527952B2 (en) * 2016-10-25 2020-01-07 Kla-Tencor Corporation Fault discrimination and calibration of scatterometry overlay targets
JP6798263B2 (ja) * 2016-11-14 2020-12-09 富士通株式会社 シミュレーション支援装置、シミュレーション支援方法、およびシミュレーション支援プログラム
CN110249268B (zh) 2017-02-02 2021-08-24 Asml荷兰有限公司 量测方法和设备以及关联的计算机产品
US10699969B2 (en) * 2017-08-30 2020-06-30 Kla-Tencor Corporation Quick adjustment of metrology measurement parameters according to process variation
WO2019045780A1 (en) * 2017-08-30 2019-03-07 Kla-Tencor Corporation QUICK SETTING OF METROLOGY MEASUREMENT PARAMETERS BASED ON PROCESS VARIATION
EP3624068A1 (en) * 2018-09-14 2020-03-18 Covestro Deutschland AG Method for improving prediction relating to the production of a polymer-ic produc
DE102018128254A1 (de) * 2018-11-12 2020-05-14 Endress+Hauser SE+Co. KG Verfahren zur Verbesserung derMessperformance eines zu konfigurierenden Feldgeräts der Automatisierungstechnik
CN109933854B (zh) * 2019-02-15 2023-07-07 中国北方车辆研究所 一种基于情境需求的移动机器人设计方法
US20200356711A1 (en) * 2019-05-10 2020-11-12 Coventor, Inc. System and method for process window optimization in a virtual semiconductor device fabrication environment
US11727159B2 (en) * 2019-05-15 2023-08-15 Lawrence Livermore National Security, Llc Mission-driven design methodology for optical systems
DE102019207059A1 (de) * 2019-05-15 2020-11-19 Siemens Aktiengesellschaft Verfahren zur Validierung von Systemparametern eines Energiesystems, Verfahren zum Betrieb eines Energiesystems sowie Energiemanagementsystem für ein Energiesystem
US11360397B2 (en) * 2019-09-17 2022-06-14 Kla Corporation System and method for application of harmonic detectivity as a quality indicator for imaging-based overlay measurements
CN110991101B (zh) * 2019-11-15 2022-08-02 湖南城市学院 一种压缩式压电加速度计结构优化设计方法
CN111160489A (zh) * 2020-01-02 2020-05-15 中冶赛迪重庆信息技术有限公司 基于大数据的多维对标分析服务器、系统、方法及电子终端
US11686576B2 (en) 2020-06-04 2023-06-27 Kla Corporation Metrology target for one-dimensional measurement of periodic misregistration
CN111863652B (zh) * 2020-07-31 2024-05-03 华天科技（西安）有限公司 一种弹坑超敏感产品生产参数优化方法
CN116529673A (zh) 2020-11-27 2023-08-01 Asml荷兰有限公司 量测方法及相关量测和光刻装置

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JPH06332976A (ja) * 1993-05-25 1994-12-02 Mitsubishi Electric Corp モデルパラメータ抽出装置
US6411373B1 (en) * 1999-10-08 2002-06-25 Instrumentation Metrics, Inc. Fiber optic illumination and detection patterns, shapes, and locations for use in spectroscopic analysis
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US7925486B2 (en) * 2006-03-14 2011-04-12 Kla-Tencor Technologies Corp. Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout
US8214771B2 (en) * 2009-01-08 2012-07-03 Kla-Tencor Corporation Scatterometry metrology target design optimization
EP2694983B1 (en) * 2011-04-06 2020-06-03 KLA-Tencor Corporation Method and system for providing a quality metric for improved process control
US10255385B2 (en) * 2012-03-28 2019-04-09 Kla-Tencor Corporation Model optimization approach based on spectral sensitivity
KR102246286B1 (ko) * 2013-12-30 2021-04-30 에이에스엠엘 네델란즈 비.브이. 메트롤로지 타겟의 디자인을 위한 방법 및 장치

Also Published As

Publication number Publication date
KR20160096118A (ko) 2016-08-12
TW201535137A (zh) 2015-09-16
US20160042105A1 (en) 2016-02-11
KR102265868B1 (ko) 2021-06-16
US10726169B2 (en) 2020-07-28
CN105830069A (zh) 2016-08-03
CN105830069B (zh) 2021-04-20
JP6509225B2 (ja) 2019-05-08
TWI661324B (zh) 2019-06-01
WO2015089231A1 (en) 2015-06-18
JP2017508273A (ja) 2017-03-23

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