SG10201802884SA - Imprint apparatus and method of manufacturing article - Google Patents

Imprint apparatus and method of manufacturing article

Info

Publication number
SG10201802884SA
SG10201802884SA SG10201802884SA SG10201802884SA SG10201802884SA SG 10201802884S A SG10201802884S A SG 10201802884SA SG 10201802884S A SG10201802884S A SG 10201802884SA SG 10201802884S A SG10201802884S A SG 10201802884SA SG 10201802884S A SG10201802884S A SG 10201802884SA
Authority
SG
Singapore
Prior art keywords
mirror elements
imprint apparatus
imprint
manufacturing article
substrate
Prior art date
Application number
SG10201802884SA
Other languages
English (en)
Inventor
Yoshida Kenji
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG10201802884SA publication Critical patent/SG10201802884SA/en

Links

Landscapes

  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG10201802884SA 2017-04-17 2018-04-05 Imprint apparatus and method of manufacturing article SG10201802884SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017081437 2017-04-17
JP2018017577A JP6606567B2 (ja) 2017-04-17 2018-02-02 インプリント装置及び物品の製造方法

Publications (1)

Publication Number Publication Date
SG10201802884SA true SG10201802884SA (en) 2018-11-29

Family

ID=64277007

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201802884SA SG10201802884SA (en) 2017-04-17 2018-04-05 Imprint apparatus and method of manufacturing article

Country Status (3)

Country Link
JP (1) JP6606567B2 (enrdf_load_stackoverflow)
SG (1) SG10201802884SA (enrdf_load_stackoverflow)
TW (1) TWI720301B (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7204464B2 (ja) * 2018-12-12 2023-01-16 キヤノン株式会社 インプリント方法、インプリント装置および物品製造方法
JP7194010B2 (ja) * 2018-12-20 2022-12-21 キヤノン株式会社 インプリント装置および物品製造方法
JP7179655B2 (ja) * 2019-03-14 2022-11-29 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP7337670B2 (ja) * 2019-11-15 2023-09-04 キヤノン株式会社 インプリント装置、インプリント方法、および、物品の製造方法
JP7407579B2 (ja) * 2019-12-04 2024-01-04 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
US11366384B2 (en) * 2019-12-18 2022-06-21 Canon Kabushiki Kaisha Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template
JP7431659B2 (ja) * 2020-05-01 2024-02-15 キヤノン株式会社 インプリント方法、インプリント装置および物品製造方法
JP2023068882A (ja) * 2021-11-04 2023-05-18 キヤノン株式会社 インプリント装置
JP2024043963A (ja) * 2022-09-20 2024-04-02 キオクシア株式会社 パターン形成方法、半導体装置の製造方法、及びインプリント装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4827513B2 (ja) * 2005-12-09 2011-11-30 キヤノン株式会社 加工方法
US7978308B2 (en) * 2006-05-15 2011-07-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8345242B2 (en) * 2008-10-28 2013-01-01 Molecular Imprints, Inc. Optical system for use in stage control
JP6045363B2 (ja) * 2012-01-27 2016-12-14 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6418773B2 (ja) * 2013-05-14 2018-11-07 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP6362399B2 (ja) * 2013-05-30 2018-07-25 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP6306830B2 (ja) * 2013-06-26 2018-04-04 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6294680B2 (ja) * 2014-01-24 2018-03-14 キヤノン株式会社 インプリント装置、および物品の製造方法
KR102166879B1 (ko) * 2014-03-10 2020-10-16 어플라이드 머티어리얼스, 인코포레이티드 다중 하전-입자 빔 리소그래피를 위한 픽셀 블렌딩
JP6282298B2 (ja) * 2015-06-10 2018-02-21 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法

Also Published As

Publication number Publication date
JP2018182300A (ja) 2018-11-15
TWI720301B (zh) 2021-03-01
TW201838790A (zh) 2018-11-01
JP6606567B2 (ja) 2019-11-13

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