SG10201606882XA - Wafer-level fabrication of optical devices, in particular of modules for computational cameras - Google Patents

Wafer-level fabrication of optical devices, in particular of modules for computational cameras

Info

Publication number
SG10201606882XA
SG10201606882XA SG10201606882XA SG10201606882XA SG10201606882XA SG 10201606882X A SG10201606882X A SG 10201606882XA SG 10201606882X A SG10201606882X A SG 10201606882XA SG 10201606882X A SG10201606882X A SG 10201606882XA SG 10201606882X A SG10201606882X A SG 10201606882XA
Authority
SG
Singapore
Prior art keywords
wafer
modules
optical devices
level fabrication
computational cameras
Prior art date
Application number
SG10201606882XA
Other languages
English (en)
Inventor
Hartmut Rudmann
Matthias Maluck
Alexander Bietsch
Peter Roentgen
Stephan Heimgartner
Original Assignee
Heptagon Micro Optics Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heptagon Micro Optics Pte Ltd filed Critical Heptagon Micro Optics Pte Ltd
Publication of SG10201606882XA publication Critical patent/SG10201606882XA/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/001Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
    • G02B13/0085Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras employing wafer level optics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/361Removing material for deburring or mechanical trimming
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/42Photometry, e.g. photographic exposure meter using electric radiation detectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011Manufacture or treatment of image sensors covered by group H10F39/12
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/804Containers or encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/806Optical elements or arrangements associated with the image sensors
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49718Repairing
    • Y10T29/49748Repairing by shaping, e.g., bending, extruding, turning, etc.
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00Cutting
    • Y10T83/04Processes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lens Barrels (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Camera Bodies And Camera Details Or Accessories (AREA)
  • Studio Devices (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Couplings Of Light Guides (AREA)
SG10201606882XA 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices, in particular of modules for computational cameras SG10201606882XA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201161527355P 2011-08-25 2011-08-25

Publications (1)

Publication Number Publication Date
SG10201606882XA true SG10201606882XA (en) 2016-10-28

Family

ID=46969906

Family Applications (4)

Application Number Title Priority Date Filing Date
SG10201606882XA SG10201606882XA (en) 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices, in particular of modules for computational cameras
SG10201606884TA SG10201606884TA (en) 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices with front focal length correction
SG2014008726A SG2014008726A (en) 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices with front focal length correction
SG2014008718A SG2014008718A (en) 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices. in particular of modules for computational cameras

Family Applications After (3)

Application Number Title Priority Date Filing Date
SG10201606884TA SG10201606884TA (en) 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices with front focal length correction
SG2014008726A SG2014008726A (en) 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices with front focal length correction
SG2014008718A SG2014008718A (en) 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices. in particular of modules for computational cameras

Country Status (8)

Country Link
US (2) US20140307081A1 (https=)
EP (2) EP2748853B1 (https=)
JP (2) JP6282225B2 (https=)
KR (2) KR102056501B1 (https=)
CN (2) CN103890949B (https=)
SG (4) SG10201606882XA (https=)
TW (3) TWI620310B (https=)
WO (2) WO2013026174A2 (https=)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130122247A1 (en) * 2011-11-10 2013-05-16 Omnivision Technologies, Inc. Spacer Wafer For Wafer-Level Camera And Method For Manufacturing Same
US9595553B2 (en) 2012-11-02 2017-03-14 Heptagon Micro Optics Pte. Ltd. Optical modules including focal length adjustment and fabrication of the optical modules
CN105765722B (zh) 2013-11-22 2019-10-22 赫普塔冈微光有限公司 紧凑光电模块
WO2015119571A1 (en) * 2014-02-07 2015-08-13 Heptagon Micro Optics Pte. Ltd. Stacks of arrays of beam shaping elements including stacking, self-alignment and/or self-centering features
SG11201606706WA (en) 2014-02-18 2016-09-29 Heptagon Micro Optics Pte Ltd Optical modules including customizable spacers for focal length adjustment and/or reduction of tilt, and fabrication of the optical modules
WO2015191001A1 (en) 2014-06-10 2015-12-17 Heptagon Micro Optics Pte. Ltd. Optoelectronic modules including hybrid arrangements of beam shaping elements, and imaging devices incorporating the same
US9711552B2 (en) * 2014-08-19 2017-07-18 Heptagon Micro Optics Pte. Ltd. Optoelectronic modules having a silicon substrate, and fabrication methods for such modules
US9507143B2 (en) 2014-09-19 2016-11-29 Intel Corporation Compact illumination system
WO2016060615A1 (en) 2014-10-14 2016-04-21 Heptagon Micro Optics Pte. Ltd. Optical element stack assemblies
US20160307881A1 (en) * 2015-04-20 2016-10-20 Advanced Semiconductor Engineering, Inc. Optical sensor module and method for manufacturing the same
KR102329129B1 (ko) 2015-05-12 2021-11-19 삼성전자주식회사 샘플값 보상을 위한 영상 부호화 방법과 그 장치, 및 샘플값 보상을 위한 영상 복호화 방법과 그 장치
WO2016191142A2 (en) 2015-05-27 2016-12-01 Verily Life Sciences Llc Nanophotonic hyperspectral/lightfield superpixel imager
JP6619174B2 (ja) * 2015-07-31 2019-12-11 ソニーセミコンダクタソリューションズ株式会社 製造装置および方法
WO2017023211A1 (en) * 2015-08-06 2017-02-09 Heptagon Micro Optics Pte. Ltd. Optical modules including customizable spacers for focal length adjustment and/or reduction of tilt, and fabrication of the optical modules
DE102015215833A1 (de) 2015-08-19 2017-02-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Multiaperturabbildungsvorrichtung mit Optiksubstrat
EP3374815B1 (en) 2015-11-12 2022-09-28 Heptagon Micro Optics Pte. Ltd. Optical element stack assemblies
KR20170073910A (ko) 2015-12-21 2017-06-29 에스케이하이닉스 주식회사 라이트 필드 이미징 장치 및 그 제조방법
DE102016200285A1 (de) 2016-01-13 2017-07-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Multiaperturabbildungsvorrichtung, Abbildungssystem und Verfahren zum Erfassen eines Objektbereichs
CN108941932A (zh) * 2017-05-23 2018-12-07 东莞东阳光科研发有限公司 人工晶体制备方法
US10677964B2 (en) * 2017-10-23 2020-06-09 Omnivision Technologies, Inc. Lens wafer assembly and associated method for manufacturing a stepped spacer wafer
CN113366359B (zh) 2019-03-12 2022-11-15 奥林巴斯株式会社 内窥镜用摄像装置及内窥镜
WO2021153629A1 (ja) * 2020-01-30 2021-08-05 古河電気工業株式会社 光モジュールおよび光学装置
US11664399B2 (en) * 2021-02-01 2023-05-30 Visera Technologies Company Limited Solid-state image sensor

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5232549A (en) * 1992-04-14 1993-08-03 Micron Technology, Inc. Spacers for field emission display fabricated via self-aligned high energy ablation
DE10058305A1 (de) * 2000-11-24 2002-06-06 Wacker Siltronic Halbleitermat Verfahren zur Oberflächenpolitur von Siliciumscheiben
ATE551624T1 (de) 2001-02-09 2012-04-15 Digitaloptics Corp East Kompensation und/oder variation von auf wafern produzierten linsen und daraus resultierenden strukturen
KR20070096020A (ko) * 2002-09-17 2007-10-01 앤터온 비.브이. 카메라 디바이스, 카메라 디바이스 제조 방법, 웨이퍼스케일 패키지 및 광학 어셈블리
DE102005002545A1 (de) 2005-01-19 2006-07-20 Airbus Deutschland Gmbh Energiepuffereinrichtung für ein Flugzeug
US8053705B2 (en) * 2005-09-07 2011-11-08 Purdue Research Foundation Laser assisted machining process with distributed lasers
JP2007110588A (ja) * 2005-10-17 2007-04-26 Funai Electric Co Ltd 複眼撮像装置
CN101009779B (zh) 2006-01-24 2010-06-16 采钰科技股份有限公司 高精密度成像控制的影像感应模块
US7721564B2 (en) 2006-11-21 2010-05-25 B/E Aerospace, Inc. Wild frequency avionic refrigeration system and controller therefor
US7692256B2 (en) * 2007-03-23 2010-04-06 Heptagon Oy Method of producing a wafer scale package
US7812869B2 (en) * 2007-05-11 2010-10-12 Aptina Imaging Corporation Configurable pixel array system and method
EP2220684A1 (en) * 2007-11-27 2010-08-25 Heptagon Oy Encapsulated lens stack
US20090159200A1 (en) * 2007-12-19 2009-06-25 Heptagon Oy Spacer element and method for manufacturing a spacer element
EP2223173B1 (en) 2007-12-19 2013-09-04 Heptagon Micro Optics Pte. Ltd. Camera device and manufacturing methods therefor
TWI478808B (zh) * 2007-12-19 2015-04-01 Heptagon Micro Optics Pte Ltd 製造光學元件的方法
US8319301B2 (en) * 2008-02-11 2012-11-27 Omnivision Technologies, Inc. Self-aligned filter for an image sensor
EP2265978A1 (en) * 2008-03-27 2010-12-29 Tessera North America, Inc. Optical device including at least one replicated surface and associated methods
WO2010074743A1 (en) * 2008-12-22 2010-07-01 Tessera North America, Inc. Focus compensation for thin cameras
CN102422627A (zh) 2009-03-18 2012-04-18 拜耳材料科技公司 晶片级光学系统
JP2011018974A (ja) * 2009-07-07 2011-01-27 Renesas Electronics Corp D/aコンバータ
US8193599B2 (en) * 2009-09-02 2012-06-05 Himax Semiconductor, Inc. Fabricating method and structure of a wafer level module
US8059341B2 (en) * 2009-09-23 2011-11-15 Visera Technologies Company Limited Lens assembly and method for forming the same
US8885257B2 (en) * 2009-10-20 2014-11-11 Flir Systems Trading Belgium Bvba Focus compensation for optical elements and applications thereof
US8848301B2 (en) * 2009-10-20 2014-09-30 Flir Systems Trading Belgium Bvba Focus compensation for optical elements and applications thereof
WO2011063347A2 (en) * 2009-11-20 2011-05-26 Pelican Imaging Corporation Capturing and processing of images using monolithic camera array with heterogeneous imagers
WO2011156928A2 (en) 2010-06-14 2011-12-22 Heptagon Oy Camera, and method of manufacturing a plurality of cameras

Also Published As

Publication number Publication date
KR102056501B1 (ko) 2019-12-16
JP6282225B2 (ja) 2018-02-21
US20140307081A1 (en) 2014-10-16
KR20140068984A (ko) 2014-06-09
EP2748854B1 (en) 2021-06-02
SG2014008718A (en) 2014-04-28
JP2014524597A (ja) 2014-09-22
US10444477B2 (en) 2019-10-15
SG2014008726A (en) 2014-04-28
KR20140054280A (ko) 2014-05-08
SG10201606884TA (en) 2016-10-28
WO2013026174A2 (en) 2013-02-28
CN103890948B (zh) 2017-12-01
CN103890949A (zh) 2014-06-25
EP2748854A1 (en) 2014-07-02
JP2014526067A (ja) 2014-10-02
EP2748853A2 (en) 2014-07-02
WO2013026175A1 (en) 2013-02-28
EP2748853B1 (en) 2023-10-11
TW201724487A (zh) 2017-07-01
JP6223975B2 (ja) 2017-11-01
CN103890948A (zh) 2014-06-25
WO2013026174A3 (en) 2013-04-11
CN103890949B (zh) 2017-10-03
TW201327790A (zh) 2013-07-01
TWI567956B (zh) 2017-01-21
TWI582969B (zh) 2017-05-11
US20140299587A1 (en) 2014-10-09
TWI620310B (zh) 2018-04-01
KR101966480B1 (ko) 2019-04-05
TW201316497A (zh) 2013-04-16

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