SG10201604390VA - Microchamber laser processing systems and methods using localized process-gas atmosphere - Google Patents

Microchamber laser processing systems and methods using localized process-gas atmosphere

Info

Publication number
SG10201604390VA
SG10201604390VA SG10201604390VA SG10201604390VA SG10201604390VA SG 10201604390V A SG10201604390V A SG 10201604390VA SG 10201604390V A SG10201604390V A SG 10201604390VA SG 10201604390V A SG10201604390V A SG 10201604390VA SG 10201604390V A SG10201604390V A SG 10201604390VA
Authority
SG
Singapore
Prior art keywords
microchamber
methods
laser processing
gas atmosphere
processing systems
Prior art date
Application number
SG10201604390VA
Other languages
English (en)
Inventor
Mcwhirter James
Original Assignee
Ultratech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultratech Inc filed Critical Ultratech Inc
Publication of SG10201604390VA publication Critical patent/SG10201604390VA/en

Links

SG10201604390VA 2015-06-08 2016-05-31 Microchamber laser processing systems and methods using localized process-gas atmosphere SG10201604390VA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201562172701P 2015-06-08 2015-06-08

Publications (1)

Publication Number Publication Date
SG10201604390VA true SG10201604390VA (en) 2017-01-27

Family

ID=57614005

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201604390VA SG10201604390VA (en) 2015-06-08 2016-05-31 Microchamber laser processing systems and methods using localized process-gas atmosphere

Country Status (5)

Country Link
JP (1) JP2017005251A (ja)
KR (1) KR20160144307A (ja)
CN (1) CN106252257A (ja)
SG (1) SG10201604390VA (ja)
TW (1) TWI573180B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107419239A (zh) * 2017-07-28 2017-12-01 京东方科技集团股份有限公司 用于镀膜的喷头、设备和相应方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801352A (en) * 1986-12-30 1989-01-31 Image Micro Systems, Inc. Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation
JPH05218006A (ja) * 1992-02-06 1993-08-27 Oki Electric Ind Co Ltd 絶縁膜形成方法
KR100722592B1 (ko) * 1999-12-22 2007-05-28 아익스트론 아게 화학 기상 증착 반응기
JP2001244259A (ja) * 2000-02-29 2001-09-07 Seiko Epson Corp 絶縁体薄膜を製造する方法
US6818857B1 (en) * 2000-11-28 2004-11-16 Heung Ki Cho Method and apparatus for welding
JP3859543B2 (ja) * 2002-05-22 2006-12-20 レーザーフロントテクノロジーズ株式会社 レーザ加工装置
JP2005171272A (ja) * 2003-12-08 2005-06-30 Sony Corp レーザｃｖｄ装置
EP1598140A1 (de) * 2004-05-19 2005-11-23 Synova S.A. Laserbearbeitung eines Werkstücks
US7807947B2 (en) * 2005-05-09 2010-10-05 3D Systems, Inc. Laser sintering process chamber gas curtain window cleansing in a laser sintering system
US7375791B2 (en) * 2005-06-30 2008-05-20 Asml Holding N.V. Laminar flow gas curtains for lithographic applications
KR20090125087A (ko) * 2007-02-20 2009-12-03 퀄컴 엠이엠스 테크놀로지스, 인크. 마이크로전자기계 시스템〔ｍｅｍｓ〕의 에칭장치 및 에칭 방법
EP2159304A1 (en) * 2008-08-27 2010-03-03 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Apparatus and method for atomic layer deposition
US20110303148A1 (en) * 2010-06-09 2011-12-15 Jun Xie Full-enclosure, controlled-flow mini-environment for thin film chambers
JP6022785B2 (ja) * 2012-03-26 2016-11-09 株式会社日立国際電気 半導体装置の製造方法、基板処理装置、及びプログラム
JP2014053136A (ja) * 2012-09-06 2014-03-20 Mitsubishi Electric Corp 大気圧プラズマ処理装置
US9029809B2 (en) * 2012-11-30 2015-05-12 Ultratech, Inc. Movable microchamber system with gas curtain
US8986562B2 (en) * 2013-08-07 2015-03-24 Ultratech, Inc. Methods of laser processing photoresist in a gaseous environment

Also Published As

Publication number Publication date
KR20160144307A (ko) 2016-12-16
TW201643944A (zh) 2016-12-16
CN106252257A (zh) 2016-12-21
JP2017005251A (ja) 2017-01-05
TWI573180B (zh) 2017-03-01

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