SG10201604390VA - Microchamber laser processing systems and methods using localized process-gas atmosphere - Google Patents

Microchamber laser processing systems and methods using localized process-gas atmosphere

Info

Publication number
SG10201604390VA
SG10201604390VA SG10201604390VA SG10201604390VA SG10201604390VA SG 10201604390V A SG10201604390V A SG 10201604390VA SG 10201604390V A SG10201604390V A SG 10201604390VA SG 10201604390V A SG10201604390V A SG 10201604390VA SG 10201604390V A SG10201604390V A SG 10201604390VA
Authority
SG
Singapore
Prior art keywords
microchamber
methods
laser processing
gas atmosphere
processing systems
Prior art date
Application number
SG10201604390VA
Inventor
Mcwhirter James
Original Assignee
Ultratech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultratech Inc filed Critical Ultratech Inc
Publication of SG10201604390VA publication Critical patent/SG10201604390VA/en

Links

SG10201604390VA 2015-06-08 2016-05-31 Microchamber laser processing systems and methods using localized process-gas atmosphere SG10201604390VA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201562172701P 2015-06-08 2015-06-08

Publications (1)

Publication Number Publication Date
SG10201604390VA true SG10201604390VA (en) 2017-01-27

Family

ID=57614005

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201604390VA SG10201604390VA (en) 2015-06-08 2016-05-31 Microchamber laser processing systems and methods using localized process-gas atmosphere

Country Status (5)

Country Link
JP (1) JP2017005251A (en)
KR (1) KR20160144307A (en)
CN (1) CN106252257A (en)
SG (1) SG10201604390VA (en)
TW (1) TWI573180B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107419239A (en) * 2017-07-28 2017-12-01 京东方科技集团股份有限公司 For the shower nozzle of plated film, equipment and correlation method

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US4801352A (en) * 1986-12-30 1989-01-31 Image Micro Systems, Inc. Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation
JPH05218006A (en) * 1992-02-06 1993-08-27 Oki Electric Ind Co Ltd Formation of insulating film
KR100722592B1 (en) * 1999-12-22 2007-05-28 아익스트론 아게 Chemical vapor deposition reactor and process chamber for said reactor
JP2001244259A (en) * 2000-02-29 2001-09-07 Seiko Epson Corp Method of manufacturing insulating thin film
US6818857B1 (en) * 2000-11-28 2004-11-16 Heung Ki Cho Method and apparatus for welding
JP3859543B2 (en) * 2002-05-22 2006-12-20 レーザーフロントテクノロジーズ株式会社 Laser processing equipment
JP2005171272A (en) * 2003-12-08 2005-06-30 Sony Corp Laser cvd apparatus
EP1598140A1 (en) * 2004-05-19 2005-11-23 Synova S.A. Laser machining
US7807947B2 (en) * 2005-05-09 2010-10-05 3D Systems, Inc. Laser sintering process chamber gas curtain window cleansing in a laser sintering system
US7375791B2 (en) * 2005-06-30 2008-05-20 Asml Holding N.V. Laminar flow gas curtains for lithographic applications
WO2008103632A2 (en) * 2007-02-20 2008-08-28 Qualcomm Mems Technologies, Inc. Equipment and methods for etching of mems
EP2159304A1 (en) * 2008-08-27 2010-03-03 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Apparatus and method for atomic layer deposition
US20110303148A1 (en) * 2010-06-09 2011-12-15 Jun Xie Full-enclosure, controlled-flow mini-environment for thin film chambers
JP6022785B2 (en) * 2012-03-26 2016-11-09 株式会社日立国際電気 Semiconductor device manufacturing method, substrate processing apparatus, and program
JP2014053136A (en) * 2012-09-06 2014-03-20 Mitsubishi Electric Corp Atmospheric pressure plasma processing apparatus
US9029809B2 (en) * 2012-11-30 2015-05-12 Ultratech, Inc. Movable microchamber system with gas curtain
US8986562B2 (en) * 2013-08-07 2015-03-24 Ultratech, Inc. Methods of laser processing photoresist in a gaseous environment

Also Published As

Publication number Publication date
CN106252257A (en) 2016-12-21
JP2017005251A (en) 2017-01-05
KR20160144307A (en) 2016-12-16
TW201643944A (en) 2016-12-16
TWI573180B (en) 2017-03-01

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