SG10201407094SA - Plasma ion implantation process for patterned disc media applications - Google Patents

Plasma ion implantation process for patterned disc media applications

Info

Publication number
SG10201407094SA
SG10201407094SA SG10201407094SA SG10201407094SA SG10201407094SA SG 10201407094S A SG10201407094S A SG 10201407094SA SG 10201407094S A SG10201407094S A SG 10201407094SA SG 10201407094S A SG10201407094S A SG 10201407094SA SG 10201407094S A SG10201407094S A SG 10201407094SA
Authority
SG
Singapore
Prior art keywords
ion implantation
magnetically susceptible
implantation process
plasma ion
disc media
Prior art date
Application number
SG10201407094SA
Other languages
English (en)
Inventor
Martin A Hilkene
Matthew D Scotney-Castle
Roman Gouk
Steven Verhaverbeke
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG10201407094SA publication Critical patent/SG10201407094SA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32412—Plasma immersion ion implantation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
SG10201407094SA 2009-11-04 2010-11-03 Plasma ion implantation process for patterned disc media applications SG10201407094SA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25802709P 2009-11-04 2009-11-04

Publications (1)

Publication Number Publication Date
SG10201407094SA true SG10201407094SA (en) 2014-12-30

Family

ID=43925729

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201407094SA SG10201407094SA (en) 2009-11-04 2010-11-03 Plasma ion implantation process for patterned disc media applications

Country Status (5)

Country Link
US (1) US20110104393A1 (zh)
CN (1) CN102598131B (zh)
SG (1) SG10201407094SA (zh)
TW (1) TWI564941B (zh)
WO (1) WO2011056815A2 (zh)

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Also Published As

Publication number Publication date
TW201125025A (en) 2011-07-16
US20110104393A1 (en) 2011-05-05
CN102598131A (zh) 2012-07-18
TWI564941B (zh) 2017-01-01
WO2011056815A3 (en) 2011-07-21
CN102598131B (zh) 2016-04-13
WO2011056815A2 (en) 2011-05-12

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