SG10201400531YA - Semiconductor Wafer With A Layer Of AlzGa1-zN And Process For Producing It - Google Patents

Semiconductor Wafer With A Layer Of AlzGa1-zN And Process For Producing It

Info

Publication number
SG10201400531YA
SG10201400531YA SG10201400531YA SG10201400531YA SG10201400531YA SG 10201400531Y A SG10201400531Y A SG 10201400531YA SG 10201400531Y A SG10201400531Y A SG 10201400531YA SG 10201400531Y A SG10201400531Y A SG 10201400531YA SG 10201400531Y A SG10201400531Y A SG 10201400531YA
Authority
SG
Singapore
Prior art keywords
alzga1
producing
layer
semiconductor wafer
wafer
Prior art date
Application number
SG10201400531YA
Other languages
English (en)
Inventor
Sarad Bahadur Thapa Dr
Thomas Schröder Prof
Lidia Tarnawska Dr
Original Assignee
Siltronic Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siltronic Ag filed Critical Siltronic Ag
Publication of SG10201400531YA publication Critical patent/SG10201400531YA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/02433—Crystal orientation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02439—Materials
    • H01L21/02488—Insulating materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02494—Structure
    • H01L21/02496—Layer structure
    • H01L21/02502—Layer structure consisting of two layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02516—Crystal orientation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H01L21/0254—Nitrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02609—Crystal orientation

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Recrystallisation Techniques (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
SG10201400531YA 2013-03-12 2014-03-11 Semiconductor Wafer With A Layer Of AlzGa1-zN And Process For Producing It SG10201400531YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20130158844 EP2779213B1 (en) 2013-03-12 2013-03-12 Semiconductor wafer with a layer of AlzGa1-zN and process for producing it

Publications (1)

Publication Number Publication Date
SG10201400531YA true SG10201400531YA (en) 2014-10-30

Family

ID=47877882

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201400531YA SG10201400531YA (en) 2013-03-12 2014-03-11 Semiconductor Wafer With A Layer Of AlzGa1-zN And Process For Producing It

Country Status (8)

Country Link
US (1) US9147726B2 (ko)
EP (1) EP2779213B1 (ko)
JP (1) JP5938428B2 (ko)
KR (1) KR101556054B1 (ko)
CN (1) CN104051232B (ko)
MY (1) MY185237A (ko)
SG (1) SG10201400531YA (ko)
TW (1) TWI524552B (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108281378B (zh) * 2012-10-12 2022-06-24 住友电气工业株式会社 Iii族氮化物复合衬底、半导体器件及它们的制造方法
EP3051575A1 (en) 2015-01-30 2016-08-03 Siltronic AG Semiconductor wafer comprising a monocrystalline group-IIIA nitride layer
US10243105B2 (en) 2015-02-10 2019-03-26 iBeam Materials, Inc. Group-III nitride devices and systems on IBAD-textured substrates
WO2016130725A1 (en) 2015-02-10 2016-08-18 iBeam Materials, Inc. Epitaxial hexagonal materials on ibad-textured substrates
USRE49869E1 (en) 2015-02-10 2024-03-12 iBeam Materials, Inc. Group-III nitride devices and systems on IBAD-textured substrates
US10581398B2 (en) * 2016-03-11 2020-03-03 Akoustis, Inc. Method of manufacture for single crystal acoustic resonator devices using micro-vias
US10923345B2 (en) * 2016-03-23 2021-02-16 Iqe Plc Epitaxial metal oxide as buffer for epitaxial III-V layers
WO2018004666A1 (en) * 2016-07-01 2018-01-04 Intel Corporation Techniques for monolithic co-integration of polycrystalline thin-film bulk acoustic resonator devices and monocrystalline iii-n semiconductor transistor devices
EP3539155A4 (en) * 2016-11-10 2020-06-17 The Government of the United States of America, as represented by the Secretary of the Navy SCANDIUM-CONTAINING III-N ETCH STOP LAYERS FOR THE SELECTIVE ETCHING OF III-NITRIDES AND RELATED MATERIALS
CN108346694B (zh) * 2017-01-23 2020-10-02 Imec 非营利协会 用于电力电子器件的基于iii-n的基材及其制造方法
US11557716B2 (en) * 2018-02-20 2023-01-17 Akoustis, Inc. Method and structure of single crystal electronic devices with enhanced strain interface regions by impurity introduction
US11054673B2 (en) 2018-05-11 2021-07-06 Raytheon Bbn Technologies Corp. Photonic devices
US11262604B2 (en) * 2018-05-11 2022-03-01 Raytheon Bbn Technologies Corp. Photonic devices
CN110491771A (zh) * 2019-07-11 2019-11-22 华南理工大学 金属氧化物薄膜晶体管及其制备方法和钝化层的制备方法
CN112735944A (zh) * 2021-01-05 2021-04-30 西安电子科技大学 氮极性面GaN材料及其制作方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3813740B2 (ja) * 1997-07-11 2006-08-23 Ｔｄｋ株式会社 電子デバイス用基板
US7020374B2 (en) * 2003-02-03 2006-03-28 Freescale Semiconductor, Inc. Optical waveguide structure and method for fabricating the same
EP1975988B1 (en) * 2007-03-28 2015-02-25 Siltronic AG Multilayered semiconductor wafer and process for its production
JP4597259B2 (ja) * 2009-03-27 2010-12-15 Ｄｏｗａホールディングス株式会社 Ｉｉｉ族窒化物半導体成長用基板、ｉｉｉ族窒化物半導体エピタキシャル基板、ｉｉｉ族窒化物半導体素子およびｉｉｉ族窒化物半導体自立基板、ならびに、これらの製造方法
WO2012176411A1 (ja) * 2011-06-24 2012-12-27 住友化学株式会社 トランジスタ用半導体基板、トランジスタ及びトランジスタ用半導体基板の製造方法

Also Published As

Publication number Publication date
JP5938428B2 (ja) 2016-06-22
US20140264776A1 (en) 2014-09-18
EP2779213A1 (en) 2014-09-17
KR101556054B1 (ko) 2015-09-25
KR20140111971A (ko) 2014-09-22
MY185237A (en) 2021-04-30
JP2014209576A (ja) 2014-11-06
TW201436282A (zh) 2014-09-16
EP2779213B1 (en) 2015-05-06
US9147726B2 (en) 2015-09-29
CN104051232B (zh) 2017-04-12
CN104051232A (zh) 2014-09-17
TWI524552B (zh) 2016-03-01

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