JP5938428B2 - 半導体ウェハ、および半導体ウェハの作製のためのプロセス - Google Patents
半導体ウェハ、および半導体ウェハの作製のためのプロセス Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 24
- 239000004065 semiconductor Substances 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000000758 substrate Substances 0.000 claims description 43
- 239000013078 crystal Substances 0.000 claims description 37
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- 229910044991 metal oxide Inorganic materials 0.000 claims description 25
- 150000004706 metal oxides Chemical class 0.000 claims description 25
- 238000000151 deposition Methods 0.000 claims description 22
- 150000004767 nitrides Chemical class 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 15
- 239000010703 silicon Substances 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 238000004544 sputter deposition Methods 0.000 claims description 5
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 claims description 4
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 194
- CUOITRGULIVMPC-UHFFFAOYSA-N azanylidynescandium Chemical compound [Sc]#N CUOITRGULIVMPC-UHFFFAOYSA-N 0.000 description 75
- 235000012431 wafers Nutrition 0.000 description 34
- 230000008021 deposition Effects 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 238000001451 molecular beam epitaxy Methods 0.000 description 13
- 230000007547 defect Effects 0.000 description 11
- 229910052706 scandium Inorganic materials 0.000 description 10
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 229910052733 gallium Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical group [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 238000005121 nitriding Methods 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 238000004549 pulsed laser deposition Methods 0.000 description 3
- 235000002639 sodium chloride Nutrition 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000004581 coalescence Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000407 epitaxy Methods 0.000 description 2
- 238000000171 gas-source molecular beam epitaxy Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- JRVCPDVOFCWKAG-UHFFFAOYSA-N Amosulalol hydrochloride Chemical group Cl.COC1=CC=CC=C1OCCNCC(O)C1=CC=C(C)C(S(N)(=O)=O)=C1 JRVCPDVOFCWKAG-UHFFFAOYSA-N 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910017855 NH 4 F Inorganic materials 0.000 description 1
- 208000012868 Overgrowth Diseases 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000010436 fluorite Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- DALUDRGQOYMVLD-UHFFFAOYSA-N iron manganese Chemical group [Mn].[Fe] DALUDRGQOYMVLD-UHFFFAOYSA-N 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- HYXGAEYDKFCVMU-UHFFFAOYSA-N scandium oxide Chemical compound O=[Sc]O[Sc]=O HYXGAEYDKFCVMU-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
- H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/02433—Crystal orientation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02488—Insulating materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02494—Structure
- H01L21/02496—Layer structure
- H01L21/02502—Layer structure consisting of two layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02516—Crystal orientation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/0254—Nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02609—Crystal orientation
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Recrystallisation Techniques (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
−本質的にシリコンからなり、(111)表面配向を有する単結晶基板ウェハと、
−(111)表面配向を有するSc2O3の単結晶層と、
−(111)表面配向を有するScNの単結晶層と、
−(0001)表面配向を有するAlzGa1−zN、なお0≦z≦−1、の単結晶層とを備える。
a)基板ウェハを設けるステップと、
c)Sc2O3の層をエピタキシャルに堆積するステップと、
d)ScNの層を作製するステップと、
f)AlzGa1−zNの層をエピタキシャルに堆積するステップとを備える。
第1のステップa)(図1を参照)で、単結晶基板ウェハ1が設けられ、これは本質的に単結晶シリコンからなり、好ましくはこれは90%〜100%のシリコン、より好ましくは98%〜100%のシリコンからなる。基板ウェハ1はシリコン技術分野で一般的に公知の通常のドーパントまたは不純物を備えることがある。基板ウェハ1はSi(111)の結晶表面配向を有する。基板ウェハ1の直径は100mm〜450mmであり得る。300mm以下の直径が好ましい。基板ウェハの表面は好ましくは研磨される。
Claims (15)
- 半導体ウェハであって、所与の順序で、
−本質的にシリコンからなり、(111)表面配向を有する単結晶基板ウェハ(1)と、
−(111)表面配向を有するSc2O3の単結晶層(3)と、
−(111)表面配向を有するScNの単結晶層(4)と、
−(0001)表面配向を有するAlzGa1−zN、なお0≦z≦1、の単結晶層(6)とを備える、半導体ウェハ。 - 前記基板ウェハ(1)とSc2O3の前記層(3)との間に単結晶金属酸化物層(2)をさらに備える、請求項1に記載の半導体ウェハ。
- 前記金属酸化物層(2)は、立方晶系Ia−3結晶構造と(Me1wMe21−w)2O3、なお0≦w≦1、の組成とを有し、Me1は第1の金属であり、Me2は第2の金属であり、前記金属酸化物層(2)は前記基板ウェハ(1)とSc2O3の前記層(3)との間に位置し、Me1、Me2、およびwは、前記金属酸化物層(2)の格子定数が前記基板ウェハ(1)の格子定数以下でありかつSc2O3の前記層(3)の格子定数以上であるように選択される、請求項2に記載の半導体ウェハ。
- Sc2O3の前記層(3)は2〜500nmの厚みを有する、請求項1から請求項3のいずれか1項に記載の半導体ウェハ。
- ScNの前記層(4)は2〜500nmの厚みを有する、請求項1から請求項4のいずれか1項に記載の半導体ウェハ。
- (AlxGa1−x)ySc1−yN、なお0≦x≦1かつ0<y<1、の組成を有する単結晶金属窒化物層(5)をさらに備え、前記金属窒化物層(5)はScNの前記層(4)とAlzGa1−zNの前記層(6)との間に位置する、請求項1から請求項5のいずれか1項に記載の半導体ウェハ。
- z=0である、請求項1から請求項6のいずれか1項に記載の半導体ウェハ。
- 請求項1に記載の半導体ウェハの作製のためのプロセスであって、所与の順序で、
a)前記基板ウェハ(1)を設けるステップと、
c)Sc2O3の前記層(3)をエピタキシャルに堆積するステップと、
d)ScNの前記層(4)を作製するステップと、
f)AlzGa1−zNの前記層(6)をエピタキシャルに堆積するステップとを備える、プロセス。 - ステップa)の後であってステップc)の前の付加的なステップb)で単結晶金属酸化物層(2)がエピタキシャルに堆積される、請求項8に記載のプロセス。
- ステップc)は、CVD、MBE、PLD、またはスパッタリング技術によって行なわれる、請求項8または請求項9に記載のプロセス。
- ステップd)で、ScNの前記層(4)は、200〜1200℃の温度で窒素源を備える雰囲気にSc2O3の前記層(3)の表面を露出することによって前記層(3)の表面をScNに変換することによって作製される、請求項8から請求項10のいずれか1項に記載のプロセス。
- ステップd)で、ScNの前記層(4)は、Sc2O3の前記層(3)の表面上にScの層を堆積し、その後200〜1200℃の温度で窒素源を備える雰囲気にScの前記層の表面を露出し、こうしてScの前記層をScNの前記層(4)に変換することによって作製される、請求項8から請求項10のいずれか1項に記載のプロセス。
- ステップd)で、ScNの前記層(4)は、Sc2O3の前記層(3)の表面上にScNの前記層(4)をエピタキシャルに堆積することによって作製される、請求項8から請求項10のいずれか1項に記載のプロセス。
- ステップd)の後であってステップf)の前の付加的なステップe)で、(AlxGa1−x)ySc1−yN、なお0≦x≦1かつ0<y<1、の組成を有する単結晶金属窒化物層(5)がエピタキシャルに堆積される、請求項8から請求項13のいずれか1項に記載のプロセス。
- ステップf)はMOCVDまたはMBEによって行なわれる、請求項8から請求項14のいずれか1項に記載のプロセス。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20130158844 EP2779213B1 (en) | 2013-03-12 | 2013-03-12 | Semiconductor wafer with a layer of AlzGa1-zN and process for producing it |
EP13158844.4 | 2013-03-12 |
Publications (2)
Publication Number | Publication Date |
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JP2014209576A JP2014209576A (ja) | 2014-11-06 |
JP5938428B2 true JP5938428B2 (ja) | 2016-06-22 |
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Country Status (8)
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US (1) | US9147726B2 (ja) |
EP (1) | EP2779213B1 (ja) |
JP (1) | JP5938428B2 (ja) |
KR (1) | KR101556054B1 (ja) |
CN (1) | CN104051232B (ja) |
MY (1) | MY185237A (ja) |
SG (1) | SG10201400531YA (ja) |
TW (1) | TWI524552B (ja) |
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WO2018004666A1 (en) * | 2016-07-01 | 2018-01-04 | Intel Corporation | Techniques for monolithic co-integration of polycrystalline thin-film bulk acoustic resonator devices and monocrystalline iii-n semiconductor transistor devices |
US10283597B2 (en) * | 2016-11-10 | 2019-05-07 | The United States Of America, As Represented By The Secretary Of The Navy | Scandium-containing III-N etch-stop layers for selective etching of III-nitrides and related materials |
EP3352199B1 (en) * | 2017-01-23 | 2021-07-14 | IMEC vzw | Iii-n based substrate for power electronic devices and method for manufacturing same |
US11557716B2 (en) * | 2018-02-20 | 2023-01-17 | Akoustis, Inc. | Method and structure of single crystal electronic devices with enhanced strain interface regions by impurity introduction |
US11054673B2 (en) | 2018-05-11 | 2021-07-06 | Raytheon Bbn Technologies Corp. | Photonic devices |
US11262604B2 (en) | 2018-05-11 | 2022-03-01 | Raytheon Bbn Technologies Corp. | Photonic devices |
CN110491771A (zh) * | 2019-07-11 | 2019-11-22 | 华南理工大学 | 金属氧化物薄膜晶体管及其制备方法和钝化层的制备方法 |
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