SG101927A1 - Compact helical resonator coil for ion implanter linear accelerator - Google Patents

Compact helical resonator coil for ion implanter linear accelerator

Info

Publication number
SG101927A1
SG101927A1 SG9906132A SG1999006132A SG101927A1 SG 101927 A1 SG101927 A1 SG 101927A1 SG 9906132 A SG9906132 A SG 9906132A SG 1999006132 A SG1999006132 A SG 1999006132A SG 101927 A1 SG101927 A1 SG 101927A1
Authority
SG
Singapore
Prior art keywords
linear accelerator
ion implanter
resonator coil
helical resonator
compact helical
Prior art date
Application number
SG9906132A
Other languages
English (en)
Inventor
Frank Divergilio William
Saadatmand Kourosh
Michael Quinn Stephen
Original Assignee
Axcelis Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Axcelis Tech Inc filed Critical Axcelis Tech Inc
Publication of SG101927A1 publication Critical patent/SG101927A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F5/00Coils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/14Vacuum chambers
    • H05H7/18Cavities; Resonators

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Power Engineering (AREA)
  • Particle Accelerators (AREA)
  • Physical Vapour Deposition (AREA)
SG9906132A 1998-12-23 1999-12-14 Compact helical resonator coil for ion implanter linear accelerator SG101927A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/219,686 US6208095B1 (en) 1998-12-23 1998-12-23 Compact helical resonator coil for ion implanter linear accelerator

Publications (1)

Publication Number Publication Date
SG101927A1 true SG101927A1 (en) 2004-02-27

Family

ID=22820329

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9906132A SG101927A1 (en) 1998-12-23 1999-12-14 Compact helical resonator coil for ion implanter linear accelerator

Country Status (6)

Country Link
US (1) US6208095B1 (ja)
EP (1) EP1014763A3 (ja)
JP (1) JP2000228299A (ja)
KR (1) KR100466701B1 (ja)
SG (1) SG101927A1 (ja)
TW (1) TW441226B (ja)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI980911A (fi) * 1998-04-24 1999-10-25 Nokia Networks Oy Resonaattorirakenne
US6423976B1 (en) * 1999-05-28 2002-07-23 Applied Materials, Inc. Ion implanter and a method of implanting ions
US6320334B1 (en) 2000-03-27 2001-11-20 Applied Materials, Inc. Controller for a linear accelerator
US6608315B1 (en) * 2000-11-01 2003-08-19 Kourosh Saadatmand Mechanism for prevention of neutron radiation in ion implanter beamline
GB2380601A (en) * 2001-10-05 2003-04-09 Applied Materials Inc Radio frequency linear accelerator
US7183514B2 (en) * 2003-01-30 2007-02-27 Axcelis Technologies, Inc. Helix coupled remote plasma source
TWI287950B (en) * 2003-11-28 2007-10-01 Kobe Steel Ltd High-voltage generator and accelerator using same
KR100755069B1 (ko) * 2006-04-28 2007-09-06 주식회사 하이닉스반도체 불균일한 이온주입에너지를 갖도록 하는 이온주입장치 및방법
KR100755070B1 (ko) * 2006-04-28 2007-09-06 주식회사 하이닉스반도체 번들 빔을 이용한 불균일 이온주입장치 및 방법
US20090057573A1 (en) * 2007-08-29 2009-03-05 Varian Semiconductor Equipment Associates, Inc. Techniques for terminal insulation in an ion implanter
US8035080B2 (en) * 2009-10-30 2011-10-11 Axcelis Technologies, Inc. Method and system for increasing beam current above a maximum energy for a charge state
US10763071B2 (en) * 2018-06-01 2020-09-01 Varian Semiconductor Equipment Associates, Inc. Compact high energy ion implantation system
US11094504B2 (en) * 2020-01-06 2021-08-17 Applied Materials, Inc. Resonator coil having an asymmetrical profile
US11665810B2 (en) 2020-12-04 2023-05-30 Applied Materials, Inc. Modular linear accelerator assembly
US11856685B2 (en) * 2021-09-20 2023-12-26 Applied Materials, Inc. Stiffened RF LINAC coil inductor with internal support structure
US11895766B2 (en) * 2021-10-15 2024-02-06 Applied Materials, Inc. Linear accelerator assembly including flexible high-voltage connection
US11812539B2 (en) 2021-10-20 2023-11-07 Applied Materials, Inc. Resonator, linear accelerator configuration and ion implantation system having rotating exciter
US11985756B2 (en) * 2021-10-20 2024-05-14 Applied Materials, Inc. Linear accelerator coil including multiple fluid channels
US12096548B2 (en) * 2022-09-21 2024-09-17 Applied Materials, Inc. Drift tube electrode arrangement having direct current optics

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
US4700158A (en) * 1986-09-30 1987-10-13 Rca Corporation Helical resonator
JPH0693399B2 (ja) * 1988-10-17 1994-11-16 工業技術院長 インダクタンス可変式四重極粒子加速器及びこれに使用する高周波共振器
JPH02203839A (ja) * 1989-02-03 1990-08-13 Hitachi Ltd 核磁気共鳴を用いた検査装置
DE4121204A1 (de) * 1991-06-27 1993-01-14 Flohe Gmbh & Co Wassergekuehlte drossel fuer hochstromanlagen
US5344815A (en) 1991-08-16 1994-09-06 Gte Laboratories Incorporated Fabrication of high TC superconducting helical resonator coils
FI91116C (fi) 1992-04-21 1994-05-10 Lk Products Oy Helix-resonaattori
JPH0639276U (ja) * 1992-10-20 1994-05-24 株式会社小松製作所 プラズマ切断機用トーチ
FI92265C (fi) * 1992-11-23 1994-10-10 Lk Products Oy Radiotaajuussuodatin, jossa helix-resonaattorit on tuettu sisäpuolelle asetetulla eristelevyllä
US5497050A (en) * 1993-01-11 1996-03-05 Polytechnic University Active RF cavity including a plurality of solid state transistors
US5445153A (en) 1993-01-31 1995-08-29 Shimadzu Corporation Orthogonal RF coil for MRI apparatus
JPH0828279B2 (ja) * 1993-05-10 1996-03-21 株式会社日立製作所 外部共振型高周波四重極加速器
JPH07161495A (ja) * 1993-12-08 1995-06-23 Osaka Prefecture ラジカル源
JPH07192892A (ja) * 1993-12-24 1995-07-28 Komatsu Ltd プラズマトーチ
US5546743A (en) 1994-12-08 1996-08-20 Conner; Paul H. Electron propulsion unit
US5604352A (en) * 1995-04-25 1997-02-18 Raychem Corporation Apparatus comprising voltage multiplication components
US5825140A (en) * 1996-02-29 1998-10-20 Nissin Electric Co., Ltd. Radio-frequency type charged particle accelerator
JP3168903B2 (ja) * 1996-02-29 2001-05-21 日新電機株式会社 高周波加減速器、および、その使用方法
JP2932473B2 (ja) * 1996-03-27 1999-08-09 日新電機株式会社 高周波型荷電粒子加速装置
JP2835951B2 (ja) * 1996-07-26 1998-12-14 株式会社日立製作所 エネルギー可変型rfq加速装置およびイオン打込み装置

Also Published As

Publication number Publication date
JP2000228299A (ja) 2000-08-15
KR20000067835A (ko) 2000-11-25
TW441226B (en) 2001-06-16
EP1014763A3 (en) 2002-10-23
KR100466701B1 (ko) 2005-01-15
EP1014763A2 (en) 2000-06-28
US6208095B1 (en) 2001-03-27

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