SE9704607D0 - A method and apparatus for magnetically enhanced sputtering - Google Patents

A method and apparatus for magnetically enhanced sputtering

Info

Publication number
SE9704607D0
SE9704607D0 SE9704607A SE9704607A SE9704607D0 SE 9704607 D0 SE9704607 D0 SE 9704607D0 SE 9704607 A SE9704607 A SE 9704607A SE 9704607 A SE9704607 A SE 9704607A SE 9704607 D0 SE9704607 D0 SE 9704607D0
Authority
SE
Sweden
Prior art keywords
power
pulses
sputtering
regions
target
Prior art date
Application number
SE9704607A
Other languages
English (en)
Swedish (sv)
Inventor
Vladimir Kouznetsom
Original Assignee
Chemfilt R & D Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=20409338&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SE9704607(D0) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Chemfilt R & D Ab filed Critical Chemfilt R & D Ab
Priority to SE9704607A priority Critical patent/SE9704607D0/xx
Publication of SE9704607D0 publication Critical patent/SE9704607D0/xx
Priority to AU64291/98A priority patent/AU6429198A/en
Priority to CA002284181A priority patent/CA2284181A1/en
Priority to PCT/SE1998/000442 priority patent/WO1998040532A1/en
Priority to EP98909932.0A priority patent/EP1038045B1/en
Priority to US09/393,294 priority patent/US6296742B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
    • H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
    • H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback
    • H03K3/57—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback the switching device being a semiconductor device

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SE9704607A 1997-03-11 1997-12-09 A method and apparatus for magnetically enhanced sputtering SE9704607D0 (sv)

Priority Applications (6)

Application Number Priority Date Filing Date Title
SE9704607A SE9704607D0 (sv) 1997-12-09 1997-12-09 A method and apparatus for magnetically enhanced sputtering
AU64291/98A AU6429198A (en) 1997-12-09 1998-03-11 A method and apparatus for magnetically enhanced sputtering
CA002284181A CA2284181A1 (en) 1997-03-11 1998-03-11 A method and apparatus for magnetically enhanced sputtering
PCT/SE1998/000442 WO1998040532A1 (en) 1997-03-11 1998-03-11 A method and apparatus for magnetically enhanced sputtering
EP98909932.0A EP1038045B1 (en) 1997-12-09 1998-03-11 A method for magnetically enhanced sputtering
US09/393,294 US6296742B1 (en) 1997-03-11 1999-09-10 Method and apparatus for magnetically enhanced sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9704607A SE9704607D0 (sv) 1997-12-09 1997-12-09 A method and apparatus for magnetically enhanced sputtering

Publications (1)

Publication Number Publication Date
SE9704607D0 true SE9704607D0 (sv) 1997-12-09

Family

ID=20409338

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9704607A SE9704607D0 (sv) 1997-03-11 1997-12-09 A method and apparatus for magnetically enhanced sputtering

Country Status (5)

Country Link
US (1) US6296742B1 (xx)
EP (1) EP1038045B1 (xx)
AU (1) AU6429198A (xx)
SE (1) SE9704607D0 (xx)
WO (1) WO1998040532A1 (xx)

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Also Published As

Publication number Publication date
WO1998040532A1 (en) 1998-09-17
EP1038045B1 (en) 2013-11-13
US6296742B1 (en) 2001-10-02
EP1038045A1 (en) 2000-09-27
AU6429198A (en) 1998-09-29

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