SE9702182L - Förfarande för att anordna en begravd kondensator och en begravd kondensator anordnad enligt förfarandet - Google Patents
Förfarande för att anordna en begravd kondensator och en begravd kondensator anordnad enligt förfarandetInfo
- Publication number
- SE9702182L SE9702182L SE9702182A SE9702182A SE9702182L SE 9702182 L SE9702182 L SE 9702182L SE 9702182 A SE9702182 A SE 9702182A SE 9702182 A SE9702182 A SE 9702182A SE 9702182 L SE9702182 L SE 9702182L
- Authority
- SE
- Sweden
- Prior art keywords
- buried capacitor
- trench
- arranged according
- capacitor
- buried
- Prior art date
Links
- 239000003990 capacitor Substances 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 5
- 229910052751 metal Inorganic materials 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- 239000004020 conductor Substances 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 239000010937 tungsten Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/33—Thin- or thick-film capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors having potential barriers
- H01L29/94—Metal-insulator-semiconductors, e.g. MOS
- H01L29/945—Trench capacitors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9702182A SE510455C2 (sv) | 1997-06-06 | 1997-06-06 | Förfarande för att anordna en begravd kondensator och en begravd kondensator anordnad enligt förfarandet |
CNB988059134A CN1155029C (zh) | 1997-06-06 | 1998-06-04 | 埋置式电容器的装设方法和用这种方法装设的埋置式电容器 |
JP50226899A JP2002503395A (ja) | 1997-06-06 | 1998-06-04 | 埋め込み型キャパシタの配置方法および前記方法に従って配置された埋め込み型キャパシタ |
CA002292664A CA2292664A1 (en) | 1997-06-06 | 1998-06-04 | Method for arrangement of a buried capacitor, and a buried capacitor arranged according to said method |
KR1019997011498A KR20010013492A (ko) | 1997-06-06 | 1998-06-04 | 매설된 캐패시터를 배열하는 방법 및 이 방법에 따라배열된 매설된 캐패시터 |
PCT/SE1998/001063 WO1998056020A2 (en) | 1997-06-06 | 1998-06-04 | Method for arrangement of a buried capacitor, and a buried capacitor arranged according to said method |
AU80472/98A AU8047298A (en) | 1997-06-06 | 1998-06-04 | Method for arrangement of a buried capacitor, and a buried capacitor arranged according to said method |
EP98928754A EP1025570A2 (en) | 1997-06-06 | 1998-06-04 | Method for arrangement of a buried capacitor, and a buried capacitor arranged according to said method |
US09/090,218 US6140199A (en) | 1997-06-06 | 1998-06-04 | Method and arrangement of a buried capacitor, and a buried capacitor arranged according to said method |
TW087109300A TW385515B (en) | 1997-06-06 | 1998-06-11 | Method for arrangement of a buried capacitor and a buried capacitor arranged according to said method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9702182A SE510455C2 (sv) | 1997-06-06 | 1997-06-06 | Förfarande för att anordna en begravd kondensator och en begravd kondensator anordnad enligt förfarandet |
Publications (3)
Publication Number | Publication Date |
---|---|
SE9702182D0 SE9702182D0 (sv) | 1997-06-06 |
SE9702182L true SE9702182L (sv) | 1998-12-07 |
SE510455C2 SE510455C2 (sv) | 1999-05-25 |
Family
ID=20407294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9702182A SE510455C2 (sv) | 1997-06-06 | 1997-06-06 | Förfarande för att anordna en begravd kondensator och en begravd kondensator anordnad enligt förfarandet |
Country Status (10)
Country | Link |
---|---|
US (1) | US6140199A (sv) |
EP (1) | EP1025570A2 (sv) |
JP (1) | JP2002503395A (sv) |
KR (1) | KR20010013492A (sv) |
CN (1) | CN1155029C (sv) |
AU (1) | AU8047298A (sv) |
CA (1) | CA2292664A1 (sv) |
SE (1) | SE510455C2 (sv) |
TW (1) | TW385515B (sv) |
WO (1) | WO1998056020A2 (sv) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6339228B1 (en) * | 1999-10-27 | 2002-01-15 | International Business Machines Corporation | DRAM cell buried strap leakage measurement structure and method |
DE10158798A1 (de) * | 2001-11-30 | 2003-06-18 | Infineon Technologies Ag | Kondensator und Verfahren zum Herstellen eines Kondensators |
US6953980B2 (en) * | 2002-06-11 | 2005-10-11 | Semiconductor Components Industries, Llc | Semiconductor filter circuit and method |
US8143659B2 (en) * | 2008-04-14 | 2012-03-27 | Infineon Technologies Ag | Vertical trench capacitor, chip comprising the capacitor, and method for producing the capacitor |
CN103474479B (zh) * | 2012-06-08 | 2016-09-07 | 上海华虹宏力半导体制造有限公司 | 垂直mim电容及其制造方法 |
CN108288653B (zh) * | 2018-01-10 | 2020-01-21 | 嘉善品智联科技有限公司 | 一种具有参考电容的传感器件及其制造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6148956A (ja) * | 1984-08-16 | 1986-03-10 | Toshiba Corp | 半導体装置の製造方法 |
JPH01227468A (ja) * | 1988-03-08 | 1989-09-11 | Oki Electric Ind Co Ltd | 半導体記憶装置 |
JPH0216763A (ja) * | 1988-07-05 | 1990-01-19 | Toshiba Corp | 半導体装置の製造方法 |
WO1990011619A1 (en) * | 1989-03-23 | 1990-10-04 | Grumman Aerospace Corporation | Single trench mosfet-capacitor cell for analog signal processing |
US5013680A (en) * | 1990-07-18 | 1991-05-07 | Micron Technology, Inc. | Process for fabricating a DRAM array having feature widths that transcend the resolution limit of available photolithography |
US5213999A (en) * | 1990-09-04 | 1993-05-25 | Delco Electronics Corporation | Method of metal filled trench buried contacts |
KR960004443B1 (ko) * | 1992-03-19 | 1996-04-03 | 삼성전자주식회사 | 커패시터를 갖는 반도체 장치 및 그 제조방법 |
US5708559A (en) * | 1995-10-27 | 1998-01-13 | International Business Machines Corporation | Precision analog metal-metal capacitor |
US5937296A (en) * | 1996-12-20 | 1999-08-10 | Siemens Aktiengesellschaft | Memory cell that includes a vertical transistor and a trench capacitor |
-
1997
- 1997-06-06 SE SE9702182A patent/SE510455C2/sv not_active IP Right Cessation
-
1998
- 1998-06-04 JP JP50226899A patent/JP2002503395A/ja active Pending
- 1998-06-04 EP EP98928754A patent/EP1025570A2/en not_active Withdrawn
- 1998-06-04 CA CA002292664A patent/CA2292664A1/en not_active Abandoned
- 1998-06-04 KR KR1019997011498A patent/KR20010013492A/ko not_active Application Discontinuation
- 1998-06-04 AU AU80472/98A patent/AU8047298A/en not_active Abandoned
- 1998-06-04 WO PCT/SE1998/001063 patent/WO1998056020A2/en not_active Application Discontinuation
- 1998-06-04 US US09/090,218 patent/US6140199A/en not_active Expired - Fee Related
- 1998-06-04 CN CNB988059134A patent/CN1155029C/zh not_active Expired - Fee Related
- 1998-06-11 TW TW087109300A patent/TW385515B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO1998056020A2 (en) | 1998-12-10 |
SE9702182D0 (sv) | 1997-06-06 |
CA2292664A1 (en) | 1998-12-10 |
JP2002503395A (ja) | 2002-01-29 |
EP1025570A2 (en) | 2000-08-09 |
US6140199A (en) | 2000-10-31 |
AU8047298A (en) | 1998-12-21 |
WO1998056020A3 (en) | 1999-03-04 |
CN1259225A (zh) | 2000-07-05 |
CN1155029C (zh) | 2004-06-23 |
KR20010013492A (ko) | 2001-02-26 |
TW385515B (en) | 2000-03-21 |
SE510455C2 (sv) | 1999-05-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed | ||
NUG | Patent has lapsed |