SE8600228L - Sett att transportera alster vid en tillverknings- och/eller efterbehandlingsprocess - Google Patents

Sett att transportera alster vid en tillverknings- och/eller efterbehandlingsprocess

Info

Publication number
SE8600228L
SE8600228L SE8600228A SE8600228A SE8600228L SE 8600228 L SE8600228 L SE 8600228L SE 8600228 A SE8600228 A SE 8600228A SE 8600228 A SE8600228 A SE 8600228A SE 8600228 L SE8600228 L SE 8600228L
Authority
SE
Sweden
Prior art keywords
magazine
products
equipment
vacuum
manufacturing
Prior art date
Application number
SE8600228A
Other languages
Unknown language ( )
English (en)
Other versions
SE8600228D0 (sv
SE456570B (sv
Inventor
J Nordlander
Original Assignee
Applied Vacuum Scandinavia Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Vacuum Scandinavia Ab filed Critical Applied Vacuum Scandinavia Ab
Priority to SE8600228A priority Critical patent/SE456570B/sv
Publication of SE8600228D0 publication Critical patent/SE8600228D0/sv
Priority to JP50078487A priority patent/JPS63502176A/ja
Priority to EP19870900912 priority patent/EP0283477A1/en
Priority to PCT/SE1987/000022 priority patent/WO1987004414A1/en
Publication of SE8600228L publication Critical patent/SE8600228L/sv
Publication of SE456570B publication Critical patent/SE456570B/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Packaging For Recording Disks (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Specific Conveyance Elements (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
SE8600228A 1986-01-20 1986-01-20 Sett att transportera alster vid en tillverknings- och/eller efterbehandlingsprocess SE456570B (sv)

Priority Applications (4)

Application Number Priority Date Filing Date Title
SE8600228A SE456570B (sv) 1986-01-20 1986-01-20 Sett att transportera alster vid en tillverknings- och/eller efterbehandlingsprocess
JP50078487A JPS63502176A (ja) 1986-01-20 1987-01-20 製造工程における生成物の移送方法
EP19870900912 EP0283477A1 (en) 1986-01-20 1987-01-20 Method of transporting products in a manufacturing process
PCT/SE1987/000022 WO1987004414A1 (en) 1986-01-20 1987-01-20 Method of transporting products in a manufacturing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8600228A SE456570B (sv) 1986-01-20 1986-01-20 Sett att transportera alster vid en tillverknings- och/eller efterbehandlingsprocess

Publications (3)

Publication Number Publication Date
SE8600228D0 SE8600228D0 (sv) 1986-01-20
SE8600228L true SE8600228L (sv) 1987-07-21
SE456570B SE456570B (sv) 1988-10-17

Family

ID=20363148

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8600228A SE456570B (sv) 1986-01-20 1986-01-20 Sett att transportera alster vid en tillverknings- och/eller efterbehandlingsprocess

Country Status (4)

Country Link
EP (1) EP0283477A1 (sv)
JP (1) JPS63502176A (sv)
SE (1) SE456570B (sv)
WO (1) WO1987004414A1 (sv)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6103055A (en) * 1986-04-18 2000-08-15 Applied Materials, Inc. System for processing substrates
EP0246453A3 (en) * 1986-04-18 1989-09-06 General Signal Corporation Novel multiple-processing and contamination-free plasma etching system
US5308431A (en) * 1986-04-18 1994-05-03 General Signal Corporation System providing multiple processing of substrates
US4733631B1 (en) * 1986-09-30 1993-03-09 Apparatus for coating substrate devices
DE3827343A1 (de) * 1988-08-12 1990-02-15 Leybold Ag Vorrichtung nach dem karussel-prinzip zum beschichten von substraten
FR2621023B1 (fr) * 1987-09-24 1992-03-20 Stein Heurtey Installation automatique de traitement thermochimique rapide
US5156521A (en) * 1987-10-15 1992-10-20 Epsilon Technology, Inc. Method for loading a substrate into a GVD apparatus
US5435682A (en) * 1987-10-15 1995-07-25 Advanced Semiconductor Materials America, Inc. Chemical vapor desposition system
US5092728A (en) * 1987-10-15 1992-03-03 Epsilon Technology, Inc. Substrate loading apparatus for a CVD process
EP0322205A3 (en) * 1987-12-23 1990-09-12 Texas Instruments Incorporated Automated photolithographic work cell
US5076205A (en) * 1989-01-06 1991-12-31 General Signal Corporation Modular vapor processor system
FR2644567A1 (fr) * 1989-03-17 1990-09-21 Etudes Const Mecaniques Dispositif pour l'execution de traitements thermiques enchaines en continu sous vide
US5174827A (en) * 1989-07-26 1992-12-29 Consorzio Ce.Te.V Centro Tecnologie Del Vuoto Double chamber vacuum apparatus for thin layer deposition
US5713711A (en) * 1995-01-17 1998-02-03 Bye/Oasis Multiple interface door for wafer storage and handling container
US5882171A (en) 1996-10-01 1999-03-16 Balzers Aktiengesellschaft Transport and transfer apparatus
NL1027638C2 (nl) * 2004-12-01 2006-06-02 Ecim Technologies Bv Informatiedrager en werkwijze en inrichting voor de vervaardiging daarvan.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4311427A (en) * 1979-12-21 1982-01-19 Varian Associates, Inc. Wafer transfer system
US4293249A (en) * 1980-03-03 1981-10-06 Texas Instruments Incorporated Material handling system and method for manufacturing line
GB2150098B (en) * 1983-11-24 1986-10-08 Dyna Pert Precima Limited Machine for placing electronic components on a substrate
NL8400658A (nl) * 1984-03-01 1985-10-01 Bok Edward Verbeterde installatie voor vacuum processing van substraten.
US4544317A (en) * 1984-04-16 1985-10-01 International Business Machines Corporation Vacuum-to-vacuum entry system apparatus

Also Published As

Publication number Publication date
EP0283477A1 (en) 1988-09-28
SE8600228D0 (sv) 1986-01-20
SE456570B (sv) 1988-10-17
JPS63502176A (ja) 1988-08-25
WO1987004414A1 (en) 1987-07-30

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