SE7706658L - PROCEDURE FOR DETECTING IMAGES WITH LASER RADIATION - Google Patents

PROCEDURE FOR DETECTING IMAGES WITH LASER RADIATION

Info

Publication number
SE7706658L
SE7706658L SE7706658A SE7706658A SE7706658L SE 7706658 L SE7706658 L SE 7706658L SE 7706658 A SE7706658 A SE 7706658A SE 7706658 A SE7706658 A SE 7706658A SE 7706658 L SE7706658 L SE 7706658L
Authority
SE
Sweden
Prior art keywords
laser radiation
diazonium compound
ultra
exposed
procedure
Prior art date
Application number
SE7706658A
Other languages
Unknown language ( )
Swedish (sv)
Inventor
R Faust
W Jeffers
S Liu
D A Seeley
Original Assignee
Hoechst Co American
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Co American filed Critical Hoechst Co American
Publication of SE7706658L publication Critical patent/SE7706658L/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Laser Beam Printer (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

A process for recording laser radiation is disclosed. A photosensitive material comprising a copying coating and a carrier is exposed to visible laser light having no ultra-violet component and is then developed. The process is characterised by the use of a negative working diazonium compound and a binder which together form the copying coating. The diazonium compound comprises more than 25 percent of the total coating weight. The relatively high concentration of diazonium compounds causes an increased photosensitivity when the material is exposed to laser light from which virtually all the ultra-violet in the range of sensitivity of the diazonium compound has boon excluded loading to increased exposure speeds or of shortened exposure times.
SE7706658A 1976-06-10 1977-06-08 PROCEDURE FOR DETECTING IMAGES WITH LASER RADIATION SE7706658L (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69469376A 1976-06-10 1976-06-10

Publications (1)

Publication Number Publication Date
SE7706658L true SE7706658L (en) 1977-12-11

Family

ID=24789881

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7706658A SE7706658L (en) 1976-06-10 1977-06-08 PROCEDURE FOR DETECTING IMAGES WITH LASER RADIATION

Country Status (8)

Country Link
JP (1) JPS52151024A (en)
BE (1) BE855507A (en)
BR (1) BR7703742A (en)
CA (1) CA1094860A (en)
DE (1) DE2725309A1 (en)
FR (1) FR2354575A1 (en)
NL (1) NL7706254A (en)
SE (1) SE7706658L (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4419675A (en) * 1979-05-24 1983-12-06 American Hoechst Corporation Imaging system and method for printed circuit artwork and the like
EP0089506A3 (en) * 1982-03-18 1984-04-11 American Hoechst Corporation Light-sensitive mixture based on polycondensation products of diazonium salts, and light-sensitive recording material made therefrom
DE3660339D1 (en) * 1985-01-15 1988-07-28 Merck Patent Gmbh Photoresist compositions with enhanced sensitivity using polyamide esters
DE3606266A1 (en) * 1986-02-27 1987-09-03 Basf Ag LIGHT SENSITIVE RECORDING ELEMENT
DE3733874A1 (en) * 1987-10-07 1989-04-27 Hell Rudolf Dr Ing Gmbh PRINTING MANUFACTURING WITH A WASHABLE IMAGE CARRIER
US4940651A (en) * 1988-12-30 1990-07-10 International Business Machines Corporation Method for patterning cationic curable photoresist
US5814431A (en) 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
JP3814961B2 (en) 1996-08-06 2006-08-30 三菱化学株式会社 Positive photosensitive printing plate

Also Published As

Publication number Publication date
JPS52151024A (en) 1977-12-15
FR2354575B1 (en) 1980-02-15
FR2354575A1 (en) 1978-01-06
DE2725309A1 (en) 1977-12-22
NL7706254A (en) 1977-12-13
BR7703742A (en) 1978-04-04
BE855507A (en) 1977-12-08
CA1094860A (en) 1981-02-03

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