SE7706658L - Forfarande for uppteckning av bilder med laserstralning - Google Patents
Forfarande for uppteckning av bilder med laserstralningInfo
- Publication number
- SE7706658L SE7706658L SE7706658A SE7706658A SE7706658L SE 7706658 L SE7706658 L SE 7706658L SE 7706658 A SE7706658 A SE 7706658A SE 7706658 A SE7706658 A SE 7706658A SE 7706658 L SE7706658 L SE 7706658L
- Authority
- SE
- Sweden
- Prior art keywords
- laser radiation
- diazonium compound
- ultra
- exposed
- procedure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Dot-Matrix Printers And Others (AREA)
- Laser Beam Printer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US69469376A | 1976-06-10 | 1976-06-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
SE7706658L true SE7706658L (sv) | 1977-12-11 |
Family
ID=24789881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE7706658A SE7706658L (sv) | 1976-06-10 | 1977-06-08 | Forfarande for uppteckning av bilder med laserstralning |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS52151024A (sv) |
BE (1) | BE855507A (sv) |
BR (1) | BR7703742A (sv) |
CA (1) | CA1094860A (sv) |
DE (1) | DE2725309A1 (sv) |
FR (1) | FR2354575A1 (sv) |
NL (1) | NL7706254A (sv) |
SE (1) | SE7706658L (sv) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4419675A (en) * | 1979-05-24 | 1983-12-06 | American Hoechst Corporation | Imaging system and method for printed circuit artwork and the like |
EP0089506A3 (de) * | 1982-03-18 | 1984-04-11 | American Hoechst Corporation | Lichtempfindliches Gemisch auf Basis von Diazoniumsalz-Polykondensationsprodukten und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial |
DE3660339D1 (en) * | 1985-01-15 | 1988-07-28 | Merck Patent Gmbh | Photoresist compositions with enhanced sensitivity using polyamide esters |
DE3606266A1 (de) * | 1986-02-27 | 1987-09-03 | Basf Ag | Lichtempfindliches aufzeichnungselement |
DE3733874A1 (de) * | 1987-10-07 | 1989-04-27 | Hell Rudolf Dr Ing Gmbh | Druckformherstellung mittels auswaschbarem bildtraeger |
US4940651A (en) * | 1988-12-30 | 1990-07-10 | International Business Machines Corporation | Method for patterning cationic curable photoresist |
US5814431A (en) | 1996-01-10 | 1998-09-29 | Mitsubishi Chemical Corporation | Photosensitive composition and lithographic printing plate |
JP3814961B2 (ja) | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
-
1977
- 1977-06-03 CA CA279,807A patent/CA1094860A/en not_active Expired
- 1977-06-04 DE DE19772725309 patent/DE2725309A1/de not_active Withdrawn
- 1977-06-07 NL NL7706254A patent/NL7706254A/xx not_active Application Discontinuation
- 1977-06-08 BE BE178298A patent/BE855507A/xx not_active IP Right Cessation
- 1977-06-08 SE SE7706658A patent/SE7706658L/sv not_active Application Discontinuation
- 1977-06-08 BR BR7703742A patent/BR7703742A/pt unknown
- 1977-06-09 FR FR7717657A patent/FR2354575A1/fr active Granted
- 1977-06-10 JP JP6879477A patent/JPS52151024A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS52151024A (en) | 1977-12-15 |
DE2725309A1 (de) | 1977-12-22 |
FR2354575A1 (fr) | 1978-01-06 |
BR7703742A (pt) | 1978-04-04 |
BE855507A (fr) | 1977-12-08 |
NL7706254A (nl) | 1977-12-13 |
CA1094860A (en) | 1981-02-03 |
FR2354575B1 (sv) | 1980-02-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NAV | Patent application has lapsed |
Ref document number: 7706658-7 |