NL7706254A - IMAGE DISPLAY WITH LASER RAYS. - Google Patents

IMAGE DISPLAY WITH LASER RAYS.

Info

Publication number
NL7706254A
NL7706254A NL7706254A NL7706254A NL7706254A NL 7706254 A NL7706254 A NL 7706254A NL 7706254 A NL7706254 A NL 7706254A NL 7706254 A NL7706254 A NL 7706254A NL 7706254 A NL7706254 A NL 7706254A
Authority
NL
Netherlands
Prior art keywords
image display
laser rays
rays
laser
image
Prior art date
Application number
NL7706254A
Other languages
Dutch (nl)
Original Assignee
Hoechst Co American
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Co American filed Critical Hoechst Co American
Publication of NL7706254A publication Critical patent/NL7706254A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
NL7706254A 1976-06-10 1977-06-07 IMAGE DISPLAY WITH LASER RAYS. NL7706254A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69469376A 1976-06-10 1976-06-10

Publications (1)

Publication Number Publication Date
NL7706254A true NL7706254A (en) 1977-12-13

Family

ID=24789881

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7706254A NL7706254A (en) 1976-06-10 1977-06-07 IMAGE DISPLAY WITH LASER RAYS.

Country Status (8)

Country Link
JP (1) JPS52151024A (en)
BE (1) BE855507A (en)
BR (1) BR7703742A (en)
CA (1) CA1094860A (en)
DE (1) DE2725309A1 (en)
FR (1) FR2354575A1 (en)
NL (1) NL7706254A (en)
SE (1) SE7706658L (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4419675A (en) * 1979-05-24 1983-12-06 American Hoechst Corporation Imaging system and method for printed circuit artwork and the like
EP0089506A3 (en) * 1982-03-18 1984-04-11 American Hoechst Corporation Light-sensitive mixture based on polycondensation products of diazonium salts, and light-sensitive recording material made therefrom
EP0188205B1 (en) * 1985-01-15 1988-06-22 Ciba-Geigy Ag Photoresist compositions with enhanced sensitivity using polyamide esters
DE3606266A1 (en) * 1986-02-27 1987-09-03 Basf Ag LIGHT SENSITIVE RECORDING ELEMENT
DE3733874A1 (en) * 1987-10-07 1989-04-27 Hell Rudolf Dr Ing Gmbh PRINTING MANUFACTURING WITH A WASHABLE IMAGE CARRIER
US4940651A (en) * 1988-12-30 1990-07-10 International Business Machines Corporation Method for patterning cationic curable photoresist
US5814431A (en) 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
JP3814961B2 (en) 1996-08-06 2006-08-30 三菱化学株式会社 Positive photosensitive printing plate

Also Published As

Publication number Publication date
JPS52151024A (en) 1977-12-15
FR2354575A1 (en) 1978-01-06
DE2725309A1 (en) 1977-12-22
CA1094860A (en) 1981-02-03
FR2354575B1 (en) 1980-02-15
SE7706658L (en) 1977-12-11
BR7703742A (en) 1978-04-04
BE855507A (en) 1977-12-08

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BV The patent application has lapsed