SE7705358L - Sett att framstella en halvledaranordning - Google Patents
Sett att framstella en halvledaranordningInfo
- Publication number
- SE7705358L SE7705358L SE7705358A SE7705358A SE7705358L SE 7705358 L SE7705358 L SE 7705358L SE 7705358 A SE7705358 A SE 7705358A SE 7705358 A SE7705358 A SE 7705358A SE 7705358 L SE7705358 L SE 7705358L
- Authority
- SE
- Sweden
- Prior art keywords
- manufacture
- way
- semiconductor device
- semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
- H01L21/2255—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823857—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the gate insulating layers, e.g. different gate insulating layer thicknesses, particular gate insulator materials or particular gate insulator implants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/053—Field effect transistors fets
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/116—Oxidation, differential
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/141—Self-alignment coat gate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/143—Shadow masking
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/92—Controlling diffusion profile by oxidation
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Thin Film Transistor (AREA)
- Thyristors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7604986A NL7604986A (nl) | 1976-05-11 | 1976-05-11 | Werkwijze voor het vervaardigen van een halfgeleider- inrichting, en inrichting vervaardigd door toe- passing van de werkwijze. |
Publications (2)
Publication Number | Publication Date |
---|---|
SE7705358L true SE7705358L (sv) | 1977-11-12 |
SE429175B SE429175B (sv) | 1983-08-15 |
Family
ID=19826163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE7705358A SE429175B (sv) | 1976-05-11 | 1977-05-09 | Sett att framstella en halvledaranordning |
Country Status (11)
Country | Link |
---|---|
US (1) | US4139402A (sv) |
JP (1) | JPS5850015B2 (sv) |
AU (1) | AU508451B2 (sv) |
CA (1) | CA1086868A (sv) |
CH (1) | CH615781A5 (sv) |
DE (1) | DE2718894C2 (sv) |
FR (1) | FR2351501A1 (sv) |
GB (1) | GB1523246A (sv) |
IT (1) | IT1085067B (sv) |
NL (1) | NL7604986A (sv) |
SE (1) | SE429175B (sv) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4217149A (en) * | 1976-09-08 | 1980-08-12 | Sanyo Electric Co., Ltd. | Method of manufacturing complementary insulated gate field effect semiconductor device by multiple implantations and diffusion |
US4277881A (en) * | 1978-05-26 | 1981-07-14 | Rockwell International Corporation | Process for fabrication of high density VLSI circuits, having self-aligned gates and contacts for FET devices and conducting lines |
US4506437A (en) * | 1978-05-26 | 1985-03-26 | Rockwell International Corporation | Process for and structure of high density VLSI circuits, having self-aligned gates and contacts for FET devices and conducting lines |
US4455737A (en) * | 1978-05-26 | 1984-06-26 | Rockwell International Corporation | Process for and structure of high density VLSI circuits, having self-aligned gates and contacts for FET devices and conducting lines |
DE2936724A1 (de) * | 1978-09-11 | 1980-03-20 | Tokyo Shibaura Electric Co | Halbleitervorrichtung und verfahren zu ihrer herstellung |
JPS5555559A (en) * | 1978-10-19 | 1980-04-23 | Toshiba Corp | Method of fabricating semiconductor device |
US4305760A (en) * | 1978-12-22 | 1981-12-15 | Ncr Corporation | Polysilicon-to-substrate contact processing |
US4306916A (en) * | 1979-09-20 | 1981-12-22 | American Microsystems, Inc. | CMOS P-Well selective implant method |
US4295897B1 (en) * | 1979-10-03 | 1997-09-09 | Texas Instruments Inc | Method of making cmos integrated circuit device |
DE3037316C2 (de) * | 1979-10-03 | 1982-12-23 | Tokyo Shibaura Denki K.K., Kawasaki, Kanagawa | Verfahren zur Herstellung von Leistungsthyristoren |
US4404737A (en) * | 1979-11-29 | 1983-09-20 | Tokyo Shibaura Denki Kabushiki Kaisha | Method for manufacturing a semiconductor integrated circuit utilizing polycrystalline silicon deposition, oxidation and etching |
US4345366A (en) * | 1980-10-20 | 1982-08-24 | Ncr Corporation | Self-aligned all-n+ polysilicon CMOS process |
US4391650A (en) * | 1980-12-22 | 1983-07-05 | Ncr Corporation | Method for fabricating improved complementary metal oxide semiconductor devices |
NL187328C (nl) * | 1980-12-23 | 1991-08-16 | Philips Nv | Werkwijze ter vervaardiging van een halfgeleiderinrichting. |
AT387474B (de) * | 1980-12-23 | 1989-01-25 | Philips Nv | Verfahren zur herstellung einer halbleitervorrichtung |
DE3132809A1 (de) * | 1981-08-19 | 1983-03-10 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von integrierten mos-feldeffekttransistoren, insbesondere von komplementaeren mos-feldeffekttransistorenschaltungen mit einer aus metallsiliziden bestehenden zusaetzlichen leiterbahnebene |
DE3133468A1 (de) * | 1981-08-25 | 1983-03-17 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von hochintegrierten komplementaeren mos-feldeffekttransistorschaltungen in siliziumgate-technologie |
US4486943A (en) * | 1981-12-16 | 1984-12-11 | Inmos Corporation | Zero drain overlap and self aligned contact method for MOS devices |
US4412375A (en) * | 1982-06-10 | 1983-11-01 | Intel Corporation | Method for fabricating CMOS devices with guardband |
US4532695A (en) * | 1982-07-02 | 1985-08-06 | The United States Of America As Represented By The Secretary Of The Air Force | Method of making self-aligned IGFET |
US4480375A (en) * | 1982-12-09 | 1984-11-06 | International Business Machines Corporation | Simple process for making complementary transistors |
DE3314450A1 (de) * | 1983-04-21 | 1984-10-25 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von hochintegrierten komplementaeren mos-feldeffekttransistorschaltungen |
US4584761A (en) * | 1984-05-15 | 1986-04-29 | Digital Equipment Corporation | Integrated circuit chip processing techniques and integrated chip produced thereby |
US4760033A (en) * | 1986-04-08 | 1988-07-26 | Siemens Aktiengesellschaft | Method for the manufacture of complementary MOS field effect transistors in VLSI technology |
EP0375232B1 (en) * | 1988-12-21 | 1996-03-06 | AT&T Corp. | Growth-modified thermal oxidation process for thin oxides |
JP3256048B2 (ja) * | 1993-09-20 | 2002-02-12 | 富士通株式会社 | 半導体装置及びその製造方法 |
DE4404757C2 (de) * | 1994-02-15 | 1998-08-20 | Siemens Ag | Verfahren zur Herstellung eines einem Graben benachbarten Diffusionsgebietes in einem Substrat |
US7851339B2 (en) * | 2008-05-29 | 2010-12-14 | Promos Technologies Pte. Ltd. | Method of repairing deep subsurface defects in a silicon substrate that includes diffusing negatively charged ions into the substrate from a sacrificial oxide layer |
US9000525B2 (en) * | 2010-05-19 | 2015-04-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method for alignment marks |
US20140264557A1 (en) * | 2013-03-15 | 2014-09-18 | International Business Machines Corporation | Self-aligned approach for drain diffusion in field effect transistors |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3312577A (en) * | 1964-11-24 | 1967-04-04 | Int Standard Electric Corp | Process for passivating planar semiconductor devices |
US3418180A (en) * | 1965-06-14 | 1968-12-24 | Ncr Co | p-n junction formation by thermal oxydation |
US3507716A (en) * | 1966-09-02 | 1970-04-21 | Hitachi Ltd | Method of manufacturing semiconductor device |
US3574009A (en) * | 1968-03-06 | 1971-04-06 | Unitrode Corp | Controlled doping of semiconductors |
JPS495668B1 (sv) * | 1970-04-03 | 1974-02-08 | ||
BE766403A (fr) * | 1970-05-25 | 1971-09-16 | Gen Electric | Procede de fabrication de transistors a effet de champ |
US3932239A (en) * | 1970-10-27 | 1976-01-13 | Cogar Corporation | Semiconductor diffusion process |
US3690969A (en) * | 1971-05-03 | 1972-09-12 | Motorola Inc | Method of doping semiconductor substrates |
US3921283A (en) * | 1971-06-08 | 1975-11-25 | Philips Corp | Semiconductor device and method of manufacturing the device |
US3798081A (en) * | 1972-02-14 | 1974-03-19 | Ibm | Method for diffusing as into silicon from a solid phase |
US3806382A (en) * | 1972-04-06 | 1974-04-23 | Ibm | Vapor-solid impurity diffusion process |
JPS5341035B2 (sv) * | 1972-05-02 | 1978-10-31 | ||
IT993637B (it) * | 1972-10-16 | 1975-09-30 | Rca Corp | Metodo per la fabbricazione di dispositivi semiconduttori del tipo a doppia giunzione |
US3986896A (en) * | 1974-02-28 | 1976-10-19 | Tokyo Shibaura Electric Co., Ltd. | Method of manufacturing semiconductor devices |
-
1976
- 1976-05-11 NL NL7604986A patent/NL7604986A/xx not_active Application Discontinuation
-
1977
- 1977-04-13 US US05/787,029 patent/US4139402A/en not_active Expired - Lifetime
- 1977-04-28 DE DE2718894A patent/DE2718894C2/de not_active Expired
- 1977-05-04 CA CA277,656A patent/CA1086868A/en not_active Expired
- 1977-05-06 GB GB19069/77A patent/GB1523246A/en not_active Expired
- 1977-05-06 IT IT23301/77A patent/IT1085067B/it active
- 1977-05-07 JP JP52051768A patent/JPS5850015B2/ja not_active Expired
- 1977-05-09 SE SE7705358A patent/SE429175B/sv unknown
- 1977-05-09 AU AU24989/77A patent/AU508451B2/en not_active Expired
- 1977-05-09 CH CH578977A patent/CH615781A5/de not_active IP Right Cessation
- 1977-05-10 FR FR7714213A patent/FR2351501A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
CA1086868A (en) | 1980-09-30 |
JPS5850015B2 (ja) | 1983-11-08 |
US4139402A (en) | 1979-02-13 |
FR2351501B1 (sv) | 1982-11-19 |
DE2718894A1 (de) | 1977-11-24 |
DE2718894C2 (de) | 1983-04-14 |
FR2351501A1 (fr) | 1977-12-09 |
IT1085067B (it) | 1985-05-28 |
JPS52137276A (en) | 1977-11-16 |
AU2498977A (en) | 1978-11-16 |
AU508451B2 (en) | 1980-03-20 |
NL7604986A (nl) | 1977-11-15 |
GB1523246A (en) | 1978-08-31 |
SE429175B (sv) | 1983-08-15 |
CH615781A5 (sv) | 1980-02-15 |
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