SE457001B - Foerfarande och apparat foer ytlegering av ett elektriskt ledande substrat. - Google Patents
Foerfarande och apparat foer ytlegering av ett elektriskt ledande substrat.Info
- Publication number
- SE457001B SE457001B SE8500364A SE8500364A SE457001B SE 457001 B SE457001 B SE 457001B SE 8500364 A SE8500364 A SE 8500364A SE 8500364 A SE8500364 A SE 8500364A SE 457001 B SE457001 B SE 457001B
- Authority
- SE
- Sweden
- Prior art keywords
- exploring
- procedure
- conductive substrate
- electric conductive
- electric
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Physical Vapour Deposition (AREA)
- Glass Compositions (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/498,313 US4520268A (en) | 1983-05-26 | 1983-05-26 | Method and apparatus for introducing normally solid materials into substrate surfaces |
Publications (3)
Publication Number | Publication Date |
---|---|
SE8500364D0 SE8500364D0 (sv) | 1985-01-25 |
SE8500364L SE8500364L (sv) | 1985-01-25 |
SE457001B true SE457001B (sv) | 1988-11-21 |
Family
ID=23980526
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE8500364A SE457001B (sv) | 1983-05-26 | 1985-01-25 | Foerfarande och apparat foer ytlegering av ett elektriskt ledande substrat. |
Country Status (11)
Country | Link |
---|---|
US (1) | US4520268A (xx) |
EP (1) | EP0146595B1 (xx) |
JP (1) | JPS60501416A (xx) |
AU (1) | AU580734B2 (xx) |
BR (1) | BR8406913A (xx) |
CA (1) | CA1212486A (xx) |
DE (1) | DE3490250T1 (xx) |
GB (1) | GB2150602B (xx) |
NL (1) | NL8420153A (xx) |
SE (1) | SE457001B (xx) |
WO (1) | WO1984004761A1 (xx) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4731539A (en) * | 1983-05-26 | 1988-03-15 | Plaur Corporation | Method and apparatus for introducing normally solid material into substrate surfaces |
JPS6115967A (ja) * | 1984-06-29 | 1986-01-24 | Sumitomo Electric Ind Ltd | 表面処理方法 |
FR2589485B1 (fr) * | 1985-11-05 | 1991-12-13 | Nippon Telegraph & Telephone | Magnesium ou alliage du magnesium traite en surface et procede pour le traitement de surface du magnesium ou d'un alliage de magnesium |
DE3913716A1 (de) * | 1989-04-26 | 1990-10-31 | Fraunhofer Ges Forschung | Verfahren und vorrichtung zum beschichten eines substrates in einem plasma |
GB9007600D0 (en) * | 1990-04-04 | 1990-05-30 | Hunting Communication Tech | Ring communication system |
GB2261227B (en) * | 1991-11-08 | 1995-01-11 | Univ Hull | Surface treatment of metals |
CN1318639C (zh) * | 2005-01-07 | 2007-05-30 | 太原理工大学 | 热电子增强离子渗硼装置及工艺 |
US8273222B2 (en) * | 2006-05-16 | 2012-09-25 | Southwest Research Institute | Apparatus and method for RF plasma enhanced magnetron sputter deposition |
US8029875B2 (en) * | 2007-05-23 | 2011-10-04 | Southwest Research Institute | Plasma immersion ion processing for coating of hollow substrates |
US8277617B2 (en) * | 2007-08-14 | 2012-10-02 | Southwest Research Institute | Conformal magnetron sputter deposition |
US9175381B2 (en) * | 2008-07-09 | 2015-11-03 | Southwest Research Institute | Processing tubular surfaces using double glow discharge |
US8747631B2 (en) * | 2010-03-15 | 2014-06-10 | Southwest Research Institute | Apparatus and method utilizing a double glow discharge plasma for sputter cleaning |
US8753725B2 (en) | 2011-03-11 | 2014-06-17 | Southwest Research Institute | Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode |
US9121540B2 (en) | 2012-11-21 | 2015-09-01 | Southwest Research Institute | Superhydrophobic compositions and coating process for the internal surface of tubular structures |
CN103088286B (zh) * | 2013-01-15 | 2016-01-27 | 太原理工大学 | 一种硼掺杂二氧化钛薄膜的制备方法 |
CN104109842A (zh) * | 2014-07-22 | 2014-10-22 | 桂林电子科技大学 | 一种表面渗铪+渗碳的耐高温不锈钢及其制备方法 |
CN105039918A (zh) * | 2015-08-21 | 2015-11-11 | 北京石油化工学院 | 一种在石墨工件表面沉积金属扩散层的方法 |
CN105385974B (zh) * | 2015-11-30 | 2017-06-23 | 济南泰丽龙企业管理咨询有限公司 | 一种提高镍钛记忆合金缝合线表面性能方法 |
CN109234669B (zh) * | 2018-09-20 | 2020-06-16 | 湖北上大模具材料科技股份有限公司 | 一种渗Co塑料模具钢的制备方法及该模具钢 |
CN114015988B (zh) * | 2021-11-04 | 2022-11-29 | 上海交通大学 | 表面合金化处理的方法和装置 |
CN115287596B (zh) * | 2022-07-22 | 2023-10-24 | 江苏襄宿新材料有限公司 | 一种不锈钢上铬合金层的制备方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1162149A (en) * | 1914-10-22 | 1915-11-30 | Engelhardt A Eckhardt | Process of making wear-withstanding coat. |
AT149330B (de) * | 1932-07-19 | 1937-04-26 | Deutsche Edelstahlwerke Ag | Verfahren zum Einverleiben von Elementen, wie Kohlenstoff, Stickstoff, Phosphor, Silizium, Bor und Mischungen von diesen zumindest in Oberflächenschichten von Gegenständen. |
US3189535A (en) * | 1962-04-18 | 1965-06-15 | James E Webb | Means and method of depositing thin films on substrates |
US3475307A (en) * | 1965-02-04 | 1969-10-28 | Continental Can Co | Condensation of monomer vapors to increase polymerization rates in a glow discharge |
US3516855A (en) * | 1967-05-29 | 1970-06-23 | Ibm | Method of depositing conductive ions by utilizing electron beam |
US3361659A (en) * | 1967-08-14 | 1968-01-02 | Ibm | Process of depositing thin films by cathode sputtering using a controlled grid |
FR1595037A (xx) * | 1968-02-12 | 1970-06-08 | ||
US3630871A (en) * | 1969-06-11 | 1971-12-28 | Gen Instrument Corp | Cathodic sputtering method |
US3816288A (en) * | 1970-05-20 | 1974-06-11 | Xerox Corp | Glow discharge technique for the preparation of electrophotographic plates |
JPS5123393B2 (xx) * | 1972-10-03 | 1976-07-16 | ||
US3908183A (en) * | 1973-03-14 | 1975-09-23 | California Linear Circuits Inc | Combined ion implantation and kinetic transport deposition process |
GB1488657A (en) * | 1973-09-24 | 1977-10-12 | Ion Tech Ltd | Ion sources |
GB1500701A (en) * | 1974-01-24 | 1978-02-08 | Atomic Energy Authority Uk | Vapour deposition apparatus |
CH611938A5 (xx) * | 1976-05-19 | 1979-06-29 | Battelle Memorial Institute | |
JPS53138006U (xx) * | 1977-04-06 | 1978-11-01 | ||
US4325776A (en) * | 1977-06-20 | 1982-04-20 | Siemens Aktiengesellschaft | Method for preparing coarse-crystal or single-crystal metal films |
EP0008634B1 (de) * | 1978-07-08 | 1983-03-30 | Wolfgang Kieferle | Verfahren zum Auflagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück und Vorrichtung zur Durchführung desselben |
JPS5531154A (en) * | 1978-08-28 | 1980-03-05 | Hitachi Ltd | Plasma etching apparatus |
-
1983
- 1983-05-26 US US06/498,313 patent/US4520268A/en not_active Expired - Fee Related
-
1984
- 1984-05-23 CA CA000454950A patent/CA1212486A/en not_active Expired
- 1984-05-24 BR BR8406913A patent/BR8406913A/pt not_active IP Right Cessation
- 1984-05-24 AU AU29670/84A patent/AU580734B2/en not_active Ceased
- 1984-05-24 WO PCT/US1984/000795 patent/WO1984004761A1/en active IP Right Grant
- 1984-05-24 JP JP59502282A patent/JPS60501416A/ja active Granted
- 1984-05-24 DE DE19843490250 patent/DE3490250T1/de not_active Ceased
- 1984-05-24 NL NL8420153A patent/NL8420153A/nl not_active Application Discontinuation
- 1984-05-24 EP EP84902296A patent/EP0146595B1/en not_active Expired
- 1984-05-24 GB GB08501735A patent/GB2150602B/en not_active Expired
-
1985
- 1985-01-25 SE SE8500364A patent/SE457001B/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US4520268A (en) | 1985-05-28 |
JPH0551663B2 (xx) | 1993-08-03 |
JPS60501416A (ja) | 1985-08-29 |
GB8501735D0 (en) | 1985-02-27 |
WO1984004761A1 (en) | 1984-12-06 |
SE8500364D0 (sv) | 1985-01-25 |
EP0146595A4 (en) | 1987-07-30 |
GB2150602B (en) | 1987-05-28 |
CA1212486A (en) | 1986-10-07 |
NL8420153A (nl) | 1985-04-01 |
DE3490250T1 (de) | 1985-07-25 |
BR8406913A (pt) | 1985-05-21 |
EP0146595B1 (en) | 1990-09-12 |
AU2967084A (en) | 1984-12-18 |
GB2150602A (en) | 1985-07-03 |
EP0146595A1 (en) | 1985-07-03 |
AU580734B2 (en) | 1989-02-02 |
SE8500364L (sv) | 1985-01-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |
Ref document number: 8500364-8 Effective date: 19911209 Format of ref document f/p: F |