SE372427B - - Google Patents

Info

Publication number
SE372427B
SE372427B SE7016055A SE1605570A SE372427B SE 372427 B SE372427 B SE 372427B SE 7016055 A SE7016055 A SE 7016055A SE 1605570 A SE1605570 A SE 1605570A SE 372427 B SE372427 B SE 372427B
Authority
SE
Sweden
Application number
SE7016055A
Inventor
K Bienert
W Lang
E Nordt
Original Assignee
Wacker Chemitronic
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19691959392 external-priority patent/DE1959392C3/de
Application filed by Wacker Chemitronic filed Critical Wacker Chemitronic
Publication of SE372427B publication Critical patent/SE372427B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/10Reaction chambers; Selection of materials therefor
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002Crucibles or containers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/90Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S206/00Special receptacle or package
    • Y10S206/832Semiconductor wafer boat
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/13Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/131Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
    • Y10T428/1317Multilayer [continuous layer]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Ceramic Products (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
SE7016055A 1969-11-26 1970-11-26 SE372427B (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691959392 DE1959392C3 (de) 1969-11-26 Verwendung von mit inerten Stoffen geschützten Quarzampullen für die Herstellung und/oder Weiterverarbeitung von siliciumarmen 1I I-V-Halbleiterkörpern

Publications (1)

Publication Number Publication Date
SE372427B true SE372427B (ja) 1974-12-23

Family

ID=5752154

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7016055A SE372427B (ja) 1969-11-26 1970-11-26

Country Status (8)

Country Link
US (1) US3734817A (ja)
JP (1) JPS4942419B1 (ja)
BE (1) BE759405A (ja)
CA (1) CA932246A (ja)
FR (1) FR2082986A5 (ja)
GB (1) GB1338243A (ja)
NL (1) NL7017167A (ja)
SE (1) SE372427B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890530A (en) * 1973-01-22 1975-06-17 Gen Electric Precoat for fluorescent lamp
JPS5231995U (ja) * 1975-08-27 1977-03-05
US4522849A (en) * 1981-07-10 1985-06-11 General Electric Company Method for coating quartz with boron nitride
GB2183501A (en) * 1985-11-15 1987-06-10 Kollmorgen Tech Corp Horizontal bridgman crystal growth
GB2188854A (en) * 1986-04-09 1987-10-14 Philips Electronic Associated Apparatus and a method for growing a crystal using a low-pressure Czochralski method and a crucible holder for use in such apparatus and method
DE69506600T2 (de) * 1994-03-11 1999-05-06 Sumitomo Electric Industries, Ltd., Osaka Verfahren und Tiegel zur Herstellung eines Verbundhalbleiter-Kristalles
DE69609568T2 (de) * 1995-05-26 2001-02-01 Sumitomo Electric Industries, Ltd. Verfahren zur Herstellung von einem II-VI oder III-V Halbleitereinkristall
JP2003124235A (ja) * 2001-10-17 2003-04-25 Sumitomo Electric Ind Ltd Ii−vi族化合物半導体、その熱処理方法およびその熱処理装置
CN115537921A (zh) * 2022-10-24 2022-12-30 广东先导微电子科技有限公司 一种磷化铟的合成方法

Also Published As

Publication number Publication date
JPS4942419B1 (ja) 1974-11-14
US3734817A (en) 1973-05-22
DE1959392B2 (de) 1973-09-13
CA932246A (en) 1973-08-21
FR2082986A5 (ja) 1971-12-10
NL7017167A (ja) 1971-05-28
DE1959392A1 (de) 1971-06-03
BE759405A (fr) 1971-05-25
GB1338243A (en) 1973-11-21

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