SE315144B - - Google Patents

Info

Publication number
SE315144B
SE315144B SE9583/66A SE958366A SE315144B SE 315144 B SE315144 B SE 315144B SE 9583/66 A SE9583/66 A SE 9583/66A SE 958366 A SE958366 A SE 958366A SE 315144 B SE315144 B SE 315144B
Authority
SE
Sweden
Prior art keywords
gate
phase
distribution
sample
detected
Prior art date
Application number
SE9583/66A
Other languages
English (en)
Inventor
G Doerfler
Original Assignee
Boehler & Co Ag Geb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boehler & Co Ag Geb filed Critical Boehler & Co Ag Geb
Publication of SE315144B publication Critical patent/SE315144B/xx

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating And Analyzing Materials By Characteristic Methods (AREA)
SE9583/66A 1965-07-14 1966-07-13 SE315144B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT644965A AT279943B (de) 1965-07-14 1965-07-14 Einrichtung zur Elektronenstrahl-Mikroanalyse heterogen aufgebauter metallischer oder nichtmetallischer Stoffe

Publications (1)

Publication Number Publication Date
SE315144B true SE315144B (zh) 1969-09-22

Family

ID=3586421

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9583/66A SE315144B (zh) 1965-07-14 1966-07-13

Country Status (8)

Country Link
US (1) US3479506A (zh)
JP (1) JPS5311876B1 (zh)
AT (1) AT279943B (zh)
CH (1) CH463823A (zh)
DE (1) DE1598120B2 (zh)
GB (1) GB1150577A (zh)
NL (1) NL145677B (zh)
SE (1) SE315144B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1952283C3 (de) * 1969-10-17 1974-01-03 Siemens Ag, 1000 Berlin U. 8000 Muenchen Einrichtung zur Bestimmung und Registrierung des Anteils und der Verteilung von digital anfallenden Meßwerten
US3703637A (en) * 1970-11-23 1972-11-21 Western Electric Co Electron beam inspection
US3909612A (en) * 1971-04-20 1975-09-30 Image Analysing Computers Ltd Electron beam specimen analysis
US3813545A (en) * 1973-04-12 1974-05-28 Edax Int Inc X-ray scan area mapping system
US3866044A (en) * 1974-02-01 1975-02-11 Nuclear Equipment Corp Apparatus for determining concentration profile of an element
JPS5160591A (en) * 1974-11-22 1976-05-26 Mitsubishi Electric Corp Keiko x seniobunsekisochi
JPS51119289A (en) * 1974-11-29 1976-10-19 Agency Of Ind Science & Technol Method of determining the heterogenous sample of micro-particles
JPS6199632A (ja) * 1984-10-19 1986-05-17 Kawasaki Steel Corp 熱延鋼板の冷却制御方法
JPS61140811A (ja) * 1984-12-14 1986-06-27 Hitachi Ltd 電子ビ−ム測長装置
US7912679B2 (en) * 2007-09-20 2011-03-22 Tokyo Electron Limited Determining profile parameters of a structure formed on a semiconductor wafer using a dispersion function relating process parameter to dispersion
US7636649B2 (en) * 2007-09-21 2009-12-22 Tokyo Electron Limited Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersion

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1046443A (en) * 1962-04-24 1966-10-26 Ti Group Services Ltd A method of and apparatus for assessing the quantity of inclusions of foreign material in solid specimens
US3260845A (en) * 1962-07-10 1966-07-12 Ti Group Services Ltd Method for the analysis of x-rays from an electron probe device
US3340395A (en) * 1964-06-22 1967-09-05 James E Webb Time-of-flight mass spectrometer with feedback means from the detector to the low source and a specific counter

Also Published As

Publication number Publication date
NL145677B (nl) 1975-04-15
NL6609919A (zh) 1967-01-16
GB1150577A (en) 1969-04-30
JPS5311876B1 (zh) 1978-04-25
DE1598120B2 (de) 1976-07-22
AT279943B (de) 1970-03-25
CH463823A (de) 1968-10-15
DE1598120A1 (de) 1971-01-28
US3479506A (en) 1969-11-18

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