RU2018103405A - Подложка, снабженная стопкой слоев с теплотехническими свойствами - Google Patents
Подложка, снабженная стопкой слоев с теплотехническими свойствами Download PDFInfo
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- RU2018103405A RU2018103405A RU2018103405A RU2018103405A RU2018103405A RU 2018103405 A RU2018103405 A RU 2018103405A RU 2018103405 A RU2018103405 A RU 2018103405A RU 2018103405 A RU2018103405 A RU 2018103405A RU 2018103405 A RU2018103405 A RU 2018103405A
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- Prior art keywords
- layer
- dielectric
- functional
- layers
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- 239000000126 substance Substances 0.000 title 1
- 239000010410 layer Substances 0.000 claims 44
- 238000000576 coating method Methods 0.000 claims 22
- 239000011248 coating agent Substances 0.000 claims 19
- 239000000463 material Substances 0.000 claims 14
- 229910052751 metal Inorganic materials 0.000 claims 14
- 239000002184 metal Substances 0.000 claims 14
- 239000002346 layers by function Substances 0.000 claims 12
- 230000003287 optical effect Effects 0.000 claims 9
- 230000000087 stabilizing effect Effects 0.000 claims 9
- 230000000903 blocking effect Effects 0.000 claims 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 6
- 230000004888 barrier function Effects 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 3
- 239000011787 zinc oxide Substances 0.000 claims 3
- 239000011651 chromium Substances 0.000 claims 2
- 239000010955 niobium Substances 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910003087 TiOx Inorganic materials 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims 1
- 238000001755 magnetron sputter deposition Methods 0.000 claims 1
- 229910001092 metal group alloy Inorganic materials 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910001120 nichrome Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 1
- 150000004767 nitrides Chemical class 0.000 claims 1
- 239000011241 protective layer Substances 0.000 claims 1
- -1 silicon nitrides Chemical class 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
Classifications
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- B32B17/10009—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets
- B32B17/10036—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets comprising two outer glass sheets
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
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Claims (43)
1. Материал, содержащий прозрачную подложку, покрытую стопкой тонких слоев, последовательно включающих, начиная с подложки, чередование трех функциональных металлических слоев на основе серебра, обозначаемых начиная от подложки, как первый, второй и третий функциональные слои, и четырех диэлектрических покрытий, обозначаемых начиная от подложки, как M1, M2, M3 и M4, при этом каждое диэлектрическое покрытие содержит, по меньшей мере, один диэлектрический слой, при условии, что каждый функциональный металлический слой расположен между двумя диэлектрическими покрытиями, характеризующийся тем, что:
- толщина первого функционального слоя меньше, чем толщина второго функционального слоя,
- толщина первого функционального слоя меньше, чем толщина третьего функционального слоя,
- отношение толщины третьего функционального металлического слоя к толщине второго функционального слоя составляет между 0,90 и 1,10, включая эти значения,
- каждое из диэлектрических покрытий M1, M2, M3 и M4 имеет оптическую толщину Eo1, Eo2, Eo3 и Eo4, удовлетворяющую следующему уравнению: Eo4 < Eo1 < Eo2 < Eo3, при этом
- оптическая толщина Eo1 диэлектрического покрытия M1 более чем 80 нм,
- оптическая толщина Eo2 диэлектрического покрытия M2 более чем 100 нм,
- оптическая толщина Eo3 диэлектрического покрытия M3 более чем 120 нм,
- оптическая толщина Eo4 диэлектрического покрытия M4 более чем 60 нм.
2. Материал по п. 1, в котором толщина второго функционального слоя составляет более чем 15 нм.
3. Материал по любому из предшествующих пунктов, в котором три функциональных металлических слоя удовлетворяют следующим характеристикам:
- толщина первого функционального металлического слоя составляет от 6 до 12 нм,
- толщина второго функциональный металлического слоя составляет от 15 до 20 нм,
- толщина третьего функционального металлического слоя составляет от 15 до 20 нм.
4. Материал по любому одному из предшествующих пунктов, в котором стопка слоев также содержит, по меньшей мере, один блокирующий слой, расположенный в контакте с функциональным металлическим слоем, выбранный из металлических слоев на основе металла или металлического сплава, слоев нитридов металлов, слоев оксидов металлов и слоев оксинитридов металлов из одного или более элементов, выбранных из титана, никеля, хрома и ниобия, таких как слой Ti, TiN, TiOx, Nb, NbN, Ni, NiN, Cr, CrN, NiCr или NiCrN.
5. Материал по предшествующему пункту, в котором общая толщина всех блокирующих слоев, которые находятся в контакте с функциональными слоями, составляет между 4 и 7 нм, включая эти величины.
6. Материал по одному из предшествующих пунктов, в котором диэлектрические покрытия удовлетворяют следующим характеристикам:
- оптическая толщина первого диэлектрического покрытия M1 составляет от 80 до 140 нм,
- оптическая толщина второго диэлектрическое покрытие M2 составляет от 100 до 170 нм,
- оптическая толщина третьего диэлектрическое покрытие M3 составляет от 120 до 240 нм,
- оптическая толщина четвертого диэлектрического покрытия M4 составляет от 60 до 120 нм.
7. Материал по любому одному из предшествующих пунктов, в котором каждое диэлектрическое покрытие содержит по меньшей мере один диэлектрический слой, имеющий барьерную функцию, на основе соединений кремния и/или алюминия, выбранных из оксидов, таких как SiO2 and Al2O3, нитридов кремния Si3N4 и AlN, и оксинитридов SiOxNy и AlOxNy.
8. Материал по любому одному из предшествующих пунктов, в котором каждое диэлектрическое покрытие содержит, по меньшей мере, один диэлектрический слой, имеющий стабилизирующую функцию, на основе кристаллического оксида, в частности на основе оксида цинка, необязательно, легированного при помощи, по меньшей мере, одного другого элемента, такого как алюминий.
9. Материал по любому из предшествующих пунктов, отличающийся тем, что каждый функциональный слой находится сверху диэлектрического покрытия, верхний слой которого представляет собой диэлектрический слой, имеющий стабилизирующую функцию предпочтительно на основе оксида цинка, и/или под диэлектрическим покрытием, нижний слой которого представляет собой диэлектрический слой, имеющий стабилизирующую функцию, предпочтительно на основе оксида цинка.
10. Материал по любому одному из предшествующих пунктов, отличающийся тем, что материал содержит стопку слоев, определяемых, начиная от прозрачной подложки, и содержащих:
- первое диэлектрическое покрытие, содержащее, по меньшей мере, один диэлектрический слой, имеющий барьерную функцию, и один диэлектрический слой, имеющий стабилизирующую функцию,
- необязательно блокирующий слой,
- первый функциональный слой,
- необязательно блокирующий слой,
- второе диэлектрическое покрытие, содержащее, по меньшей мере, один нижний диэлектрический слой, имеющий стабилизирующую функцию, один диэлектрический слой, имеющий барьерную функцию и один верхний диэлектрический слой, имеющий стабилизирующую функцию,
- необязательно блокирующий слой,
- второй функциональный слой,
- необязательно блокирующий слой,
- третье диэлектрическое покрытие, содержащее, по меньшей мере, один нижний диэлектрический слой, имеющий стабилизирующую функцию, один диэлектрический слой, имеющий барьерную функцию и один верхний диэлектрический слой, имеющий стабилизирующую функцию,
- необязательно блокирующий слой,
- третий функциональный слой,
- необязательно блокирующий слой,
- четвертое диэлектрическое покрытие, содержащее, по меньшей мере, один диэлектрический слой, имеющий стабилизирующую функцию, один диэлектрический слой, имеющий барьерную функцию, и необязательно один защитный слой.
11. Материал по любому одному из предшествующих пунктов, отличающийся тем, что он имеет светопропускание менее чем 50% и/или отражение света на внешней стороне менее чем 20%.
12. Способ получения материала по одному из предшествующих пунктов, в котором стопка слоев нанесена с помощью магнетронного напыления.
13. Остекление, содержащее, по меньшей мере, один материал по любому одному пп. 1-11.
14. Остекление по предшествующему пункту, отличающееся тем, что стопка слоев расположена в остеклении так, что падающий свет, поступающий снаружи, проходит через первое диэлектрическое покрытие перед прохождением через первый функциональный металлический слой.
15. Остекление по одному из пп.13-14, отличающееся тем, что оно выполнено в форме монолитного, ламинированного или многослойного остекления, в частности, двойного остекления или тройного остекления.
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FR1556476 | 2015-07-08 | ||
FR1556476A FR3038596B1 (fr) | 2015-07-08 | 2015-07-08 | Materiau muni d'un empilement a proprietes thermiques |
PCT/FR2016/051645 WO2017006027A1 (fr) | 2015-07-08 | 2016-06-30 | Substrat muni d'un empilement a proprietes thermiques |
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EP (1) | EP3319919B1 (ru) |
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CN (1) | CN107709263B (ru) |
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CN110914211A (zh) * | 2017-03-10 | 2020-03-24 | 佳殿玻璃有限公司 | 玻璃基底的相对侧面上具有三重银涂层和电介质涂层的ig窗单元 |
FR3078653B1 (fr) | 2018-03-08 | 2023-10-27 | Saint Gobain | Materiau muni d'un empilement a proprietes thermiques |
FR3082199B1 (fr) * | 2018-06-12 | 2020-06-26 | Saint-Gobain Glass France | Materiau comprenant un empilement a proprietes thermiques et esthetiques |
FR3082198B1 (fr) * | 2018-06-12 | 2020-06-26 | Saint-Gobain Glass France | Materiau comprenant un empilement a proprietes thermiques et esthetique |
FR3084356A1 (fr) | 2018-07-26 | 2020-01-31 | Saint-Gobain Glass France | Materiau comprenant un substrat muni d'un empilement a proprietes thermiques. |
FR3087767B1 (fr) * | 2018-10-30 | 2021-02-26 | Saint Gobain | Materiau comprenant un substrat muni d'un empilement de couches minces a proprietes thermiques |
GB201820002D0 (en) * | 2018-12-07 | 2019-01-23 | Pilkington Group Ltd | Coated glass pane |
KR102659107B1 (ko) * | 2018-12-31 | 2024-04-18 | 쌩-고벵 글래스 프랑스 | 다층 박막이 구비된 투명 기판 및 이를 포함하는 다중 글레이징 유닛 |
FR3110159A1 (fr) * | 2020-05-12 | 2021-11-19 | Saint-Gobain Glass France | Matériau bas émissif comprenant une couche à base de nitrure ou d'oxynitrure de silicium et une couche à base d'oxyde de zinc et d'étain |
FR3114315B1 (fr) | 2020-09-21 | 2023-03-24 | Saint Gobain | Materiau comprenant un substrat muni d’un empilement de couches minces a proprietes thermiques |
MX2023007461A (es) * | 2020-12-21 | 2023-09-06 | Saint Gobain | Material que comprende una pila de capas delgadas para aislamiento termico y propiedades esteticas. |
FR3121675B1 (fr) | 2021-04-12 | 2023-12-29 | Saint Gobain | Substrat muni d’un empilement a proprietes thermiques |
CN113896432B (zh) * | 2021-10-18 | 2024-03-12 | 上海玻光科技合伙企业(有限合伙) | 一种镀膜汽车玻璃 |
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SU822122A1 (ru) * | 1979-06-22 | 1981-04-15 | Предприятие П/Я А-1705 | Оптическа система |
SU1083144A1 (ru) * | 1982-04-12 | 1984-03-30 | Предприятие П/Я В-8450 | Просветл ющее интерференционное покрытие |
SU1704123A1 (ru) * | 1990-02-05 | 1992-01-07 | Конструкторское бюро точного электронного машиностроения | Интерференционное просветл ющее покрытие |
FR2748743B1 (fr) * | 1996-05-14 | 1998-06-19 | Saint Gobain Vitrage | Vitrage a revetement antireflet |
CA2484181C (en) * | 2002-05-03 | 2010-02-23 | Ppg Industries Ohio, Inc. | Substrate having thermal management coating for an insulating glass unit |
WO2004071984A1 (en) * | 2003-02-14 | 2004-08-26 | Glaverbel | Glazing panel carrying a coating stack |
FR2942794B1 (fr) * | 2009-03-09 | 2011-02-18 | Saint Gobain | Substrat muni d'un empilement a proprietes thermiques comportant des couches a haut indice de refraction |
BE1019345A3 (fr) | 2010-05-25 | 2012-06-05 | Agc Glass Europe | Vitrage de controle solaire a faible facteur solaire. |
CN202175621U (zh) * | 2011-07-11 | 2012-03-28 | 信义节能玻璃(芜湖)有限公司 | 一种三银low-e镀膜玻璃 |
CN202157011U (zh) * | 2011-07-27 | 2012-03-07 | 林嘉宏 | 一种三银低辐射镀膜玻璃 |
JP5916894B2 (ja) * | 2012-01-10 | 2016-05-11 | サン−ゴバン グラス フランスSaint−Gobain Glass France | 導電性コーティングを含む透明ガラスパネル |
FR2985724B1 (fr) * | 2012-01-16 | 2014-03-07 | Saint Gobain | Substrat muni d'un empilement a proprietes thermiques comportant quatre couches fonctionnelles metalliques. |
US9499899B2 (en) * | 2013-03-13 | 2016-11-22 | Intermolecular, Inc. | Systems, methods, and apparatus for production coatings of low-emissivity glass including a ternary alloy |
FR3005048B1 (fr) * | 2013-04-30 | 2020-09-25 | Saint Gobain | Substrat muni d'un empilement a proprietes thermiques |
ES2642767T3 (es) * | 2013-05-30 | 2017-11-20 | Agc Glass Europe | Acristalamiento de control solar |
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FR3038596A1 (fr) | 2017-01-13 |
CO2017012948A2 (es) | 2018-03-09 |
CN107709263B (zh) | 2022-02-22 |
PL3319919T3 (pl) | 2021-09-27 |
US10843962B2 (en) | 2020-11-24 |
BR112017027153A2 (ru) | 2018-08-21 |
FR3038596B1 (fr) | 2021-12-10 |
RU2720336C2 (ru) | 2020-04-29 |
HUE055180T2 (hu) | 2021-11-29 |
EP3319919A1 (fr) | 2018-05-16 |
ES2884111T3 (es) | 2021-12-10 |
WO2017006027A1 (fr) | 2017-01-12 |
KR20180028436A (ko) | 2018-03-16 |
CN107709263A (zh) | 2018-02-16 |
PT3319919T (pt) | 2021-09-02 |
JP6951317B2 (ja) | 2021-10-20 |
KR102568551B1 (ko) | 2023-08-21 |
RU2018103405A3 (ru) | 2019-10-22 |
EP3319919B1 (fr) | 2021-06-16 |
JP2018519238A (ja) | 2018-07-19 |
MX2017016710A (es) | 2018-03-09 |
BR112017027153B1 (pt) | 2022-10-18 |
US20180194676A1 (en) | 2018-07-12 |
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