RU2017123030A - Прозрачная диффузная подложка осид и способ получения такой подложки - Google Patents
Прозрачная диффузная подложка осид и способ получения такой подложки Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims 12
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000126 substance Substances 0.000 title 1
- 239000011521 glass Substances 0.000 claims 13
- 210000003298 dental enamel Anatomy 0.000 claims 12
- 238000000034 method Methods 0.000 claims 8
- 229910044991 metal oxide Inorganic materials 0.000 claims 5
- 150000004706 metal oxides Chemical class 0.000 claims 5
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims 3
- 238000010304 firing Methods 0.000 claims 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 claims 1
- 229910006404 SnO 2 Inorganic materials 0.000 claims 1
- 229910010413 TiO 2 Inorganic materials 0.000 claims 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
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- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
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- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
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- C03C2217/00—Coatings on glass
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- C03C2217/21—Oxides
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- C03C2217/00—Coatings on glass
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- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
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Claims (20)
1. Способ получения многослойной подложки для светоизлучающего устройства, содержащий, по меньшей мере, следующие этапы:
обеспечения стеклянной подложки (1), обладающей показателем преломления, при 550 нм, 1,45-1,65,
нанесения стеклофритты (3), обладающей показателем преломления, при 550 нм, по меньшей мере, 1,7, на упомянутую стеклянную подложку (1), причем упомянутая стеклофритта содержит, по меньшей мере, 30 мас.% Bi2O3,
обжига полученной стеклянной подложки с нанесенной стеклофриттой при температуре выше температуры Литлтона для стеклофритты, с образованием, таким образом, первого (4) слоя эмали с высоким показателем преломления,
нанесения слоя (2) оксида металла на упомянутый первый слой эмали с высоким показателем преломления, и
обжига результирующей покрытой стеклянной подложки при температуре выше температуры Литлтона для стеклофритты, составляющей 530-620°C, что, таким образом, заставляет оксид металла (2) реагировать с нижележащим первым (4) слоем эмали с высоким показателем преломления, и формирования второго (5) слоя эмали с высоким показателем преломления, с множеством сферических пустот (6), внедренных в верхний участок второго слоя эмали с высоким показателем преломления вблизи границы раздела с воздухом.
2. Способ по п. 1, в котором слой оксида металла обладает толщиной 5-60 нм, предпочтительно, 10-40 нм, более предпочтительно, 15-30 нм.
3. Способ по п. 1 или 2, в котором оксид металла выбран из группы, состоящей из TiO2, Al2O3, ZrO2, Nb2O5, HfO2, Ta2O5, WO3, Ga2O3, In2O3 и SnO2 и их смесей.
4. Способ по любому из предыдущих пунктов, в котором показатель преломления стеклофритты составляет 1,70-2,20, предпочтительно, 1,80-2,10.
5. Способ по любому из предыдущих пунктов, в котором стеклофритта содержит, по меньшей мере, 50 мас.%, предпочтительно, по меньшей мере, 60 мас.% Bi2O3.
6. Способ по любому из предыдущих пунктов, в котором этапы обжига (c) и (e) осуществляют при температуре, составляющей 540-600°C.
7. Способ по любому из предыдущих пунктов, дополнительно содержащий (f) нанесение прозрачного электропроводящего слоя (TCL) (8) на второй (5) слой эмали с высоким показателем преломления.
8. Многослойная подложка, получаемая способом по любому из предыдущих пунктов, содержащая:
стеклянную подложку (1), обладающую показателем преломления 1,45-1,65,
(ii) слой (5) стеклянной эмали с высоким показателем преломления, обладающий показателем преломления, при 550 нм, по меньшей мере, 1,7, и содержащий, по меньшей мере, 30 мас.% Bi2O3,
характеризующаяся тем, что множество сферических пустот (6) внедрены в слой (5) эмали с высоким показателем преломления вблизи его поверхности, по меньшей мере, 95%, предпочтительно, по меньшей мере, 99%, и более предпочтительно, по существу все сферические пустоты имеют диаметр, значительно меньший, чем половина толщины слоя (5) эмали с высоким показателем преломления и расположенны в верхней половине слоя эмали с высоким показателем преломления вблизи границы раздела (7) с воздухом.
9. Многослойная подложка по п. 8, в которой сферические пустоты обладают средним эквивалентным сферическим диаметром 0,2-8 мкм, предпочтительно, 0,4-4 мкм, более предпочтительно, 0,5-3 мкм.
10. Многослойная подложка по п. 8 или 9, в которой толщина второго слоя эмали с высоким показателем преломления составляет 3-25 мкм, предпочтительно, 4-20 мкм, а более предпочтительно, 5-15 мкм.
11. Многослойная подложка по любому из пп. 8-10, дополнительно содержащая (iii) прозрачный электропроводящий слой (8) на слое (5) эмали с высоким показателем преломления.
12. Многослойная подложка по любому из пп. 8-11, в которой сферические пустоты занимают, по меньшей мере, 20% поверхности и по большей мере, 80% поверхности области, ранее покрытой оксидом металла.
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Application Number | Priority Date | Filing Date | Title |
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EP14195677.1 | 2014-12-01 | ||
EP14195677.1A EP3028999B1 (en) | 2014-12-01 | 2014-12-01 | Transparent diffusive oled substrate and method for producing such a substrate |
PCT/EP2015/077393 WO2016087252A1 (en) | 2014-12-01 | 2015-11-23 | Transparent diffusive oled substrate and method for producing such a substrate |
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RU2017123030A true RU2017123030A (ru) | 2019-01-10 |
RU2017123030A3 RU2017123030A3 (ru) | 2019-05-24 |
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RU2017123030A RU2017123030A (ru) | 2014-12-01 | 2015-11-23 | Прозрачная диффузная подложка осид и способ получения такой подложки |
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US (1) | US10361398B2 (ru) |
EP (1) | EP3028999B1 (ru) |
JP (1) | JP6608932B2 (ru) |
KR (1) | KR20170093810A (ru) |
CN (1) | CN107001119B (ru) |
ES (1) | ES2637715T3 (ru) |
RU (1) | RU2017123030A (ru) |
TW (1) | TWI660926B (ru) |
WO (1) | WO2016087252A1 (ru) |
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CN108454196A (zh) * | 2018-02-27 | 2018-08-28 | 嘉兴奥普劲达厨卫科技有限公司 | 一种具有除甲醛功能的铝合金覆膜板及其制造方法 |
US20230070792A1 (en) * | 2019-12-20 | 2023-03-09 | Agc Glass Europe | Enameled glazing |
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WO2009017035A1 (ja) * | 2007-07-27 | 2009-02-05 | Asahi Glass Co., Ltd. | 透光性基板、その製造方法、有機led素子及びその製造方法 |
EP2219416B1 (en) * | 2007-11-09 | 2018-02-14 | Asahi Glass Company, Limited | Light transmitting substrate, method for manufacturing light transmitting substrate, organic led element and method for manufacturing organic led element |
JP5531967B2 (ja) * | 2009-01-26 | 2014-06-25 | 旭硝子株式会社 | 有機led素子の散乱層用ガラス及び有機led素子 |
FR2955575B1 (fr) * | 2010-01-22 | 2012-02-24 | Saint Gobain | Substrat verrier revetu d'une couche haut indice sous un revetement electrode et dispositif electroluminescent organique comportant un tel substrat. |
US9222641B2 (en) * | 2010-07-16 | 2015-12-29 | Agc Glass Europe | Translucent conductive substrate for organic light emitting devices |
FI3962088T3 (fi) | 2010-11-04 | 2023-09-20 | Ge Video Compression Llc | Kuvankoodaus, joka tukee lohkojen yhdistämistä ja ohittavaa toimintamuotoa |
WO2012075018A1 (en) * | 2010-12-01 | 2012-06-07 | Nitto Denko Corporation | Emissive ceramic materials having a dopant concentration gradient and methods of making and using the same |
DE102012206955B4 (de) * | 2012-04-26 | 2016-09-22 | Osram Oled Gmbh | Verfahren zum Herstellen einer Streuschicht für elektromagnetische Strahlung |
KR101715112B1 (ko) | 2012-06-14 | 2017-03-10 | 쌩-고벵 글래스 프랑스 | Oled 소자용 적층체, 그 제조방법 및 이를 구비한 oled 소자 |
EP2712851B1 (en) * | 2012-09-28 | 2015-09-09 | Saint-Gobain Glass France | Method of producing a transparent diffusive oled substrate |
MY174696A (en) * | 2013-02-25 | 2020-05-08 | Saint Gobain | Substrate for device having an organic light-emitting diode |
KR101436548B1 (ko) * | 2013-05-28 | 2014-10-30 | 코닝정밀소재 주식회사 | 유기발광소자용 광추출 기판 및 그 제조방법 |
EP2975008B1 (en) * | 2014-07-16 | 2017-03-01 | Saint-Gobain Glass France | Transparent diffusive oled substrate and method for producing such a substrate |
EP3082172A1 (en) * | 2015-04-16 | 2016-10-19 | Saint-Gobain Glass France | Layered structure for an oled and a method for producing such a structure |
-
2014
- 2014-12-01 EP EP14195677.1A patent/EP3028999B1/en not_active Not-in-force
- 2014-12-01 ES ES14195677.1T patent/ES2637715T3/es active Active
-
2015
- 2015-11-10 TW TW104137020A patent/TWI660926B/zh not_active IP Right Cessation
- 2015-11-23 WO PCT/EP2015/077393 patent/WO2016087252A1/en active Application Filing
- 2015-11-23 KR KR1020177014585A patent/KR20170093810A/ko unknown
- 2015-11-23 JP JP2017528946A patent/JP6608932B2/ja not_active Expired - Fee Related
- 2015-11-23 CN CN201580065046.4A patent/CN107001119B/zh not_active Expired - Fee Related
- 2015-11-23 US US15/531,874 patent/US10361398B2/en not_active Expired - Fee Related
- 2015-11-23 RU RU2017123030A patent/RU2017123030A/ru not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
KR20170093810A (ko) | 2017-08-16 |
CN107001119B (zh) | 2019-11-26 |
EP3028999A1 (en) | 2016-06-08 |
TW201630844A (zh) | 2016-09-01 |
RU2017123030A3 (ru) | 2019-05-24 |
JP2018503940A (ja) | 2018-02-08 |
ES2637715T3 (es) | 2017-10-16 |
US20170263894A1 (en) | 2017-09-14 |
TWI660926B (zh) | 2019-06-01 |
EP3028999B1 (en) | 2017-05-24 |
JP6608932B2 (ja) | 2019-11-20 |
WO2016087252A1 (en) | 2016-06-09 |
CN107001119A (zh) | 2017-08-01 |
US10361398B2 (en) | 2019-07-23 |
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