RU2017108163A - Устройство для формирования покрытий на поверхностях элемента, ленточного материала или инструмента - Google Patents
Устройство для формирования покрытий на поверхностях элемента, ленточного материала или инструмента Download PDFInfo
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/10—Spray pistols; Apparatus for discharge producing a swirling discharge
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
- B05B7/22—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
- B05B7/222—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
- B05B7/224—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material having originally the shape of a wire, rod or the like
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
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- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/131—Wire arc spraying
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
- B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
- B05B13/0207—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the work being an elongated body, e.g. wire or pipe
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Claims (20)
1. Устройство для формирования покрытий на поверхностях элемента, ленточного материала или инструмента, причем в этом устройстве по меньшей мере один проволочный или ленточный материал (2.1 и/или 2.2), используемый для формирования покрытия, образует катод и/или анод, которые соединены с источником постоянного электрического тока и между которыми формируется электрическая дуга, при этом обеспечивается возможность подачи проволочного или ленточного материала (2.1 и/или 2.2) подающим устройством; и
расплавленный и/или испаренный материал из проволочного или ленточного материала (2.1 и/или 2.2) протекает посредством газовой струи (3) из газа или газовой смеси через впускное отверстие во внутреннюю часть камеры (4), которая выполнена с возможностью нагрева до температуры, которая по меньшей мере равна температуре испарения по меньшей мере одного материала, используемого для покрытия, или материала с относительно самой высокой температурой испарения, и
материал(ы) полностью испаряется и выходит через по меньшей мере одно отверстие (5), выполненное в камере (4), и соударяется с покрываемой поверхностью элемента или инструмента (6) для формирования соответствующего покрытия.
2. Устройство по п. 1, отличающееся тем, что атмосфера в камере и в отверстии (5) поддерживается бескислородной в случае, когда не должно формироваться покрытие, содержащее оксид.
3. Устройство по любому из пп. 1 и 2, отличающееся тем, что для снижения температуры испарения и/или обеспечения бескислородной среды давление внутри камеры (4) снижено по сравнению с давлением окружающей среды, предпочтительно до давления, которое соответствует по меньшей мере давлению, при котором испаряется вода.
4. Устройство по любому из предшествующих пунктов, отличающееся тем, что камера (4) выполнена с возможностью нагрева посредством индукционного нагревательного элемента (8), расположенного вокруг камеры (4) или встроенного в материал стенки камеры.
5. Устройство по любому из предшествующих пунктов, отличающееся тем, что газ или газовая смесь протекает через нагревательную зону индуктора для его нагрева.
6. Устройство по любому из предшествующих пунктов, отличающееся тем, что содержит распылительную головку, изготовленную из высокотемпературного керамического материала, предпочтительно, нитрида бора, или смеси элементов нитрида бора и графитовых элементов, и/или контактные элементы для ленточного и/или проволочного материала представляют собой медные элементы с водяным охлаждением.
7. Устройство по любому из предшествующих пунктов, отличающееся тем, что в стенках камеры (4) выполнены каналы (6), через которые испаренный материал и материал, еще подлежащий испарению, может быть направлен к выходу из отверстия (5) по протяженному пути в течение длительного периода времени.
8. Устройство по любому из предшествующих пунктов, отличающееся тем, что камера выполнена в форме циклонного сепаратора.
9. Устройство по любому из предшествующих пунктов, отличающееся тем, что два ленточных или проволочных материала (2.1, 2.2) выполнены из по меньшей мере двух различных материалов и/или из порошковой электродной проволоки.
10. Устройство по любому из предшествующих пунктов, отличающееся тем, что стенки камеры выполнены из графита или графита в сочетании с керамическим материалом, в частности с нитридом бора.
11. Устройство по любому из предшествующих пунктов, отличающееся тем, что в камере (4) выполнено множество отверстий (5).
12. Устройство по любому из предшествующих пунктов, отличающееся тем, что на распылительных головках в камере (4) формируется множество дуг (2), и/или множество камер (4) соединены друг с другом, в частности, посредством продольной напорной камеры.
13. Устройство по любому из предшествующих пунктов, отличающееся тем, что изменение толщины и состава покрытия обеспечивается изменением количества подаваемого проволочного или ленточного материала (2.1, 2.2), путем включения и выключения одной или множество дуг (2) и/или воздействием на камеры.
14. Устройство по любому из предшествующих пунктов, отличающееся тем, что изменение количества подлежащего испарению материала, по отношению к количеству расплавленного материала в процессе дуговой плавки, обеспечивается изменением объемного расхода газовой струи.
15. Устройство по любому из предшествующих пунктов, отличающееся тем, что отверстие (отверстия) (5) камеры (4) и сопло распылительной головки содержат материал по меньшей мере с самой высокой температура плавления.
16. Устройство по любому из предшествующих пунктов, отличающееся тем, что для изоляции камеры (4) при температурах >2000°С используется комбинация графитовой ваты для стенки камеры, и медных проводников с водяным охлаждением, покрытых оксидом алюминия, - для индукционного нагревательного элемента.
17. Устройство по любому из предшествующих пунктов, отличающееся тем, что отверстие (5) выполнено в форме конусообразно сужающегося или расширяющегося сопла.
18. Устройство по любому из предшествующих пунктов, отличающееся тем, что оно выполнено с возможностью регулировки расстояния между поверхностью (поверхностями) подлежащего покрытию ленточного материала (7) и поверхностью камеры (4), по меньшей мере в области отверстия (5), с помощью кинетической энергии истекающего потока пара-газа.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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DE102014218770.2 | 2014-09-18 | ||
DE102014218770 | 2014-09-18 | ||
PCT/EP2015/071327 WO2016042079A1 (de) | 2014-09-18 | 2015-09-17 | Vorrichtung zur ausbildung von beschichtungen auf oberflächen eines bauteils, bandförmigen materials oder werkzeugs |
Publications (3)
Publication Number | Publication Date |
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RU2017108163A true RU2017108163A (ru) | 2018-10-18 |
RU2017108163A3 RU2017108163A3 (ru) | 2018-11-13 |
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KR101777777B1 (ko) * | 2015-12-23 | 2017-09-26 | 주식회사 포스코 | 고속 코팅용 진공 증착 장치 |
US10535525B2 (en) * | 2017-08-31 | 2020-01-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for forming semiconductor device structure |
CN111441038B (zh) * | 2020-03-20 | 2023-08-22 | 华南理工大学 | 一种基于化学气相沉积法的纳米材料打印机 |
CN113564534B (zh) * | 2020-04-28 | 2023-05-09 | 宝山钢铁股份有限公司 | 一种真空镀机组镀液连续供给装置及其供给方法 |
DE102020118015A1 (de) * | 2020-07-08 | 2022-01-13 | Thyssenkrupp Steel Europe Ag | Beschichtungsvorrichtung zum Ablagern eines Beschichtungsmaterials auf einem Substrat |
DE102020126101A1 (de) | 2020-10-06 | 2022-04-07 | Thyssenkrupp Steel Europe Ag | Beschichtungsvorrichtung zum Ablagern eines Beschichtungsmaterials auf einem Substrat |
DE102021126205A1 (de) | 2020-10-09 | 2022-04-14 | Thyssenkrupp Steel Europe Ag | Düsenabschnitt zur Anordnung an einen Verdampfungsabschnitt, Vorrichtung zur Gasphasenabscheidung eines Materials und Bandbeschichtunganlage |
DE102021100060A1 (de) | 2021-01-05 | 2022-07-07 | Thyssenkrupp Steel Europe Ag | Beschichtungsanordnung |
DE102021200421A1 (de) | 2021-01-18 | 2022-07-21 | Alethia-Group Gmbh | Sprüheinheit und Verfahren zum Aufsprühen eines aus einem Festkörper gewonnenen Materials |
DE102021101383A1 (de) | 2021-01-22 | 2022-07-28 | Thyssenkrupp Steel Europe Ag | Verfahren zur kontinuierlichen Beschichtung eines Bands und Beschichtungsanlage |
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DE102021117574A1 (de) | 2021-07-07 | 2023-01-12 | Thyssenkrupp Steel Europe Ag | Beschichtungsanlage zur Beschichtung eines flächigen Gegenstands sowie ein Verfahren zum Beschichten eines flächigen Gegenstands |
DE102021120004A1 (de) | 2021-08-02 | 2023-02-02 | Thyssenkrupp Steel Europe Ag | Beschichtungsanlage zur Beschichtung eines Gegenstands, Verfahren zum Beschichten eines Gegenstands sowie Verwendung |
DE102021133090A1 (de) | 2021-12-14 | 2023-06-15 | Thyssenkrupp Steel Europe Ag | Verfahren zur Herstellung eines Stahlflachprodukts mit einem kathodischen Korrosionsschutz, Anlage zur Herstellung eines mit einem kathodischen Korrosionsschutz versehenen Stahlflachprodukts und Verwendung |
DE102022105889A1 (de) | 2022-03-14 | 2023-09-14 | Thyssenkrupp Steel Europe Ag | Verfahren zum Beschichten eines Substrats mit einer Metalllegierungsbeschichtung, die wenigstens zwei Metalle enthält |
DE102022133485A1 (de) | 2022-12-15 | 2024-06-20 | Thyssenkrupp Steel Europe Ag | Stahlblech mit optimiertem Metallüberzug |
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KR20130095063A (ko) | 2012-02-17 | 2013-08-27 | 삼성디스플레이 주식회사 | 유기층 증착 장치와, 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101513725B1 (ko) * | 2014-03-03 | 2015-04-22 | 주식회사 미래와도전 | 원자력발전소에 사용되는 여과 배기 계통 |
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Publication number | Publication date |
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JP6650442B2 (ja) | 2020-02-19 |
ES2767400T3 (es) | 2020-06-17 |
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EP3194635A1 (de) | 2017-07-26 |
US10787733B2 (en) | 2020-09-29 |
CN107109626A (zh) | 2017-08-29 |
JP2017528602A (ja) | 2017-09-28 |
RU2703751C2 (ru) | 2019-10-22 |
KR20170072882A (ko) | 2017-06-27 |
EP3194635B1 (de) | 2019-11-20 |
RU2017108163A3 (ru) | 2018-11-13 |
KR102244897B1 (ko) | 2021-04-27 |
US20170283937A1 (en) | 2017-10-05 |
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