RU2012124075A - Композиционный материал, применимый в электролитических ваннах для производства алюминия - Google Patents
Композиционный материал, применимый в электролитических ваннах для производства алюминия Download PDFInfo
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- 239000002131 composite material Substances 0.000 title claims abstract 40
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract 13
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract 13
- 238000004519 manufacturing process Methods 0.000 title claims abstract 11
- 239000000843 powder Substances 0.000 claims abstract 7
- 239000002245 particle Substances 0.000 claims abstract 6
- 238000000034 method Methods 0.000 claims abstract 4
- 239000000203 mixture Substances 0.000 claims abstract 3
- 229910001610 cryolite Inorganic materials 0.000 claims 1
- 238000007731 hot pressing Methods 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
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Abstract
1. Композитная футеровочная плита (12, 14, 16) электролитической ванны (10) для производства алюминия, содержащая TiBи BN.2. Композитная футеровочная плита (12, 14, 16) по п.1, в которой TiBсоставляет от около 50 до около 99 весовых процентов композитной футеровочной плиты (12, 14, 16), а BN составляет от около 1 до около 50 весовых процентов композитной футеровочной плиты (12, 14, 16).3. Композитная футеровочная плита (12, 14, 16) по п.1, в которой TiBсоставляет от около 70 до около 98 весовых процентов композитной футеровочной плиты (12, 14, 16), а BN составляет от около 2 до около 30 весовых процентов композитной футеровочной плиты (12, 14, 16).4. Композитная футеровочная плита (12, 14, 16) по п.1, в которой TiBсоставляет от около 75 до около 95 весовых процентов композитной футеровочной плиты (12, 14, 16), а BN составляет от около 5 до около 25 весовых процентов композитной футеровочной плиты (12, 14, 16).5. Композитная футеровочная плита (12, 14, 16) по п.1, в которой относительные количества TiBи BN варьируются в различных местах плиты (12, 14, 16).6. Композитная футеровочная плита (12, 14, 16) по п.5, в которой отношение TiBк BN варьируется в различных местах в плоскости плиты (12, 14, 16).7. Композитная футеровочная плита (12, 14, 16) по п.5, в которой отношение TiBк BN варьируется по толщине плиты (12, 14, 16).8. Композитная футеровочная плита (12, 14, 16) по п.1, в которой TiBимеет средний размер частиц от около 1 до около 50 микрон, а BN имеет средний размер частиц от около 1 до около 50 микрон.9. Способ изготовления композитной футеровочной плиты (12, 14, 16) для электролитической ванны (10) для производства алюминия, включающий:смешивание порошка TiBи порошка BN; иотверждение смеси TiBи BN для формирования композитной футеровочной плиты (12, 14, 16).10. Способ
Claims (20)
1. Композитная футеровочная плита (12, 14, 16) электролитической ванны (10) для производства алюминия, содержащая TiB2 и BN.
2. Композитная футеровочная плита (12, 14, 16) по п.1, в которой TiB2 составляет от около 50 до около 99 весовых процентов композитной футеровочной плиты (12, 14, 16), а BN составляет от около 1 до около 50 весовых процентов композитной футеровочной плиты (12, 14, 16).
3. Композитная футеровочная плита (12, 14, 16) по п.1, в которой TiB2 составляет от около 70 до около 98 весовых процентов композитной футеровочной плиты (12, 14, 16), а BN составляет от около 2 до около 30 весовых процентов композитной футеровочной плиты (12, 14, 16).
4. Композитная футеровочная плита (12, 14, 16) по п.1, в которой TiB2 составляет от около 75 до около 95 весовых процентов композитной футеровочной плиты (12, 14, 16), а BN составляет от около 5 до около 25 весовых процентов композитной футеровочной плиты (12, 14, 16).
5. Композитная футеровочная плита (12, 14, 16) по п.1, в которой относительные количества TiB2 и BN варьируются в различных местах плиты (12, 14, 16).
6. Композитная футеровочная плита (12, 14, 16) по п.5, в которой отношение TiB2 к BN варьируется в различных местах в плоскости плиты (12, 14, 16).
7. Композитная футеровочная плита (12, 14, 16) по п.5, в которой отношение TiB2 к BN варьируется по толщине плиты (12, 14, 16).
8. Композитная футеровочная плита (12, 14, 16) по п.1, в которой TiB2 имеет средний размер частиц от около 1 до около 50 микрон, а BN имеет средний размер частиц от около 1 до около 50 микрон.
9. Способ изготовления композитной футеровочной плиты (12, 14, 16) для электролитической ванны (10) для производства алюминия, включающий:
смешивание порошка TiB2 и порошка BN; и
отверждение смеси TiB2 и BN для формирования композитной футеровочной плиты (12, 14, 16).
10. Способ по п.9, дополнительно включающий промывку порошка BN.
11. Способ по п.10, в котором порошок BN промывают перед смешиванием с порошком TiB2.
12. Способ по п.9, в котором смесь TiB2 и BN отверждают посредством горячего прессования.
13. Ванна (10) для производства алюминия, содержащая нижнюю стенку и боковую стенку (14, 16) для вмещения расплавленного криолита (20), при этом по меньшей мере одна из нижней стенки (12) и боковой стенки (14, 16) содержит композитную футеровочную плиту, содержащую TiB2 и BN.
14. Ванна (10) для производства алюминия по п.13, в которой TiB2 составляет от около 50 до около 99 весовых процентов композитной футеровочной плиты, а BN составляет от около 1 до около 50 весовых процентов композитной футеровочной плиты.
15. Ванна (10) для производства алюминия по п.13, в которой TiB2 составляет от около 70 до около 98 весовых процентов композитной футеровочной плиты, а BN составляет от около 2 до около 30 весовых процентов композитной футеровочной плиты.
16. Ванна (10) для производства алюминия по п.13, в которой TiB2 составляет от около 75 до около 95 весовых процентов композитной футеровочной плиты, а BN составляет от около 5 до около 25 весовых процентов композитной футеровочной плиты.
17. Ванна (10) для производства алюминия по п.13, в которой относительные количества TiB2 и BN варьируются в различных местах плиты.
18. Ванна (10) для производства алюминия по п. 17, в которой отношение TiB2 к BN варьируется в различных местах в плоскости плиты.
19. Ванна (10) для производства алюминия по п.17, в которой отношение TiB2 к BN варьируется по толщине плиты.
20. Ванна (10) для производства алюминия по п.13, в которой TiB2 имеет средний размер частиц от около 1 до около 50 микрон, а BN имеет средний размер частиц от около 1 до около 50 микрон.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US12/618,403 | 2009-11-13 | ||
US12/618,403 US20110114479A1 (en) | 2009-11-13 | 2009-11-13 | Composite Material Useful in Electrolytic Aluminum Production Cells |
PCT/US2010/056222 WO2011060064A2 (en) | 2009-11-13 | 2010-11-10 | Composite material useful in electrolytic aluminum production cells |
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RU2012124075A true RU2012124075A (ru) | 2013-12-20 |
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RU2012124075/02A RU2012124075A (ru) | 2009-11-13 | 2010-11-10 | Композиционный материал, применимый в электролитических ваннах для производства алюминия |
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US (1) | US20110114479A1 (ru) |
BR (1) | BR112012011070A2 (ru) |
DE (1) | DE112010004393T5 (ru) |
GB (1) | GB2490052A (ru) |
RU (1) | RU2012124075A (ru) |
WO (1) | WO2011060064A2 (ru) |
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US8501050B2 (en) | 2011-09-28 | 2013-08-06 | Kennametal Inc. | Titanium diboride-silicon carbide composites useful in electrolytic aluminum production cells and methods for producing the same |
CN113897639B (zh) * | 2021-11-19 | 2024-06-07 | 河南世源铝业科技有限公司 | 一种电解铝用析铝析氧电极及其制备方法 |
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US4560448A (en) * | 1982-05-10 | 1985-12-24 | Eltech Systems Corporation | Aluminum wettable materials for aluminum production |
US4544469A (en) * | 1982-07-22 | 1985-10-01 | Commonwealth Aluminum Corporation | Aluminum cell having aluminum wettable cathode surface |
US4514355A (en) * | 1982-12-22 | 1985-04-30 | Union Carbide Corporation | Process for improving the high temperature flexural strength of titanium diboride-boron nitride |
US4599320A (en) * | 1982-12-30 | 1986-07-08 | Alcan International Limited | Refractory lining material for electrolytic reduction cell for aluminum production and method of making the same |
US4534835A (en) * | 1982-12-30 | 1985-08-13 | Corning Glass Works | Electrolytic Al production with reaction sintered multiphase ceramic |
US4664760A (en) * | 1983-04-26 | 1987-05-12 | Aluminum Company Of America | Electrolytic cell and method of electrolysis using supported electrodes |
US4582553A (en) * | 1984-02-03 | 1986-04-15 | Commonwealth Aluminum Corporation | Process for manufacture of refractory hard metal containing plates for aluminum cell cathodes |
US5028301A (en) * | 1989-01-09 | 1991-07-02 | Townsend Douglas W | Supersaturation plating of aluminum wettable cathode coatings during aluminum smelting in drained cathode cells |
US5227045A (en) * | 1989-01-09 | 1993-07-13 | Townsend Douglas W | Supersaturation coating of cathode substrate |
US5158655A (en) * | 1989-01-09 | 1992-10-27 | Townsend Douglas W | Coating of cathode substrate during aluminum smelting in drained cathode cells |
US4929328A (en) * | 1989-03-07 | 1990-05-29 | Martin Marietta Energy Systems, Inc. | Titanium diboride ceramic fiber composites for Hall-Heroult cells |
US4983340A (en) * | 1989-12-28 | 1991-01-08 | Union Carbide Coatings Service Technology Corporation | Method for forming a high density metal boride composite |
US5217583A (en) * | 1991-01-30 | 1993-06-08 | University Of Cincinnati | Composite electrode for electrochemical processing and method for using the same in an electrolytic process for producing metallic aluminum |
US5100845A (en) * | 1991-03-13 | 1992-03-31 | Union Carbide Coatings Service Technology Corporation | Process for producing titanium diboride and boron nitride powders |
US5310476A (en) * | 1992-04-01 | 1994-05-10 | Moltech Invent S.A. | Application of refractory protective coatings, particularly on the surface of electrolytic cell components |
FR2830856B1 (fr) * | 2001-10-15 | 2004-07-30 | Pechiney Aluminium | Precurseur de revetement et procede pour revetir un substrat d'une couche refractaire |
FR2893329B1 (fr) * | 2005-11-14 | 2008-05-16 | Aluminium Pechiney Soc Par Act | Cuve d'electrolyse avec echangeur thermique. |
-
2009
- 2009-11-13 US US12/618,403 patent/US20110114479A1/en not_active Abandoned
-
2010
- 2010-11-10 WO PCT/US2010/056222 patent/WO2011060064A2/en active Application Filing
- 2010-11-10 BR BR112012011070A patent/BR112012011070A2/pt not_active IP Right Cessation
- 2010-11-10 RU RU2012124075/02A patent/RU2012124075A/ru not_active Application Discontinuation
- 2010-11-10 DE DE112010004393T patent/DE112010004393T5/de not_active Ceased
- 2010-11-10 GB GB1210445.1A patent/GB2490052A/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
US20110114479A1 (en) | 2011-05-19 |
DE112010004393T5 (de) | 2012-09-13 |
WO2011060064A2 (en) | 2011-05-19 |
WO2011060064A3 (en) | 2011-08-25 |
GB2490052A (en) | 2012-10-17 |
GB201210445D0 (en) | 2012-07-25 |
BR112012011070A2 (pt) | 2016-07-05 |
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FA92 | Acknowledgement of application withdrawn (lack of supplementary materials submitted) |
Effective date: 20150408 |