RU2003105232A - COMPOSITION OF NAILS FOR NAILS - Google Patents

COMPOSITION OF NAILS FOR NAILS

Info

Publication number
RU2003105232A
RU2003105232A RU2003105232/15A RU2003105232A RU2003105232A RU 2003105232 A RU2003105232 A RU 2003105232A RU 2003105232/15 A RU2003105232/15 A RU 2003105232/15A RU 2003105232 A RU2003105232 A RU 2003105232A RU 2003105232 A RU2003105232 A RU 2003105232A
Authority
RU
Russia
Prior art keywords
component
composition according
derivatives
preceding paragraphs
salt
Prior art date
Application number
RU2003105232/15A
Other languages
Russian (ru)
Other versions
RU2245715C2 (en
Inventor
Федерико МЕЙЛЛЕНД
Original Assignee
Полишем С.А.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10035991A external-priority patent/DE10035991A1/en
Application filed by Полишем С.А. filed Critical Полишем С.А.
Publication of RU2003105232A publication Critical patent/RU2003105232A/en
Application granted granted Critical
Publication of RU2245715C2 publication Critical patent/RU2245715C2/en

Links

Claims (10)

1. Композиция лака для ногтей, включающая a) по меньшей мере одно противогрибковое средство и b) по меньшей мере одно водорастворимое пленкообразующее вещество, где компонент b) является производным хитозана, выбранным из гидроксиалкилхитозанов и карбоксиалкилхитозанов.1. A nail polish composition comprising a) at least one antifungal agent and b) at least one water-soluble film-forming substance, wherein component b) is a chitosan derivative selected from hydroxyalkyl chitosans and carboxyalkyl chitosans. 2. Композиция по п.1, где компонент a) присутствует в количестве от 0,1 до 15 мас.%.2. The composition according to claim 1, where component a) is present in an amount of from 0.1 to 15 wt.%. 3. Композиция по п.1 или 2, где компонент a) выбран из соединений 1-гидрокси-2-пиридона, производных имидазола, производных полиена, производных аллиламина, производных триазола, производных морфолина, соединений гризеофульвина, кислотных соединений, толнафтата, флуцитозина и их солей.3. The composition according to claim 1 or 2, wherein component a) is selected from 1-hydroxy-2-pyridone compounds, imidazole derivatives, polyene derivatives, allylamine derivatives, triazole derivatives, morpholine derivatives, griseofulvin compounds, acid compounds, tolnaftate, flucytosine and their salts. 4. Композиция по любому из предыдущих пунктов, где компонент a) является циклопироксом или его солью.4. The composition according to any one of the preceding paragraphs, where component a) is cyclopirox or its salt. 5. Композиция по любому из предыдущих пунктов, где компонент b) присутствует в количестве от 0,1 до 10 мас.%.5. The composition according to any one of the preceding paragraphs, where component b) is present in an amount of from 0.1 to 10 wt.%. 6. Композиция по любому из предыдущих пунктов, где компонент b) является гидроксипропилхитозаном.6. The composition according to any one of the preceding paragraphs, where component b) is hydroxypropylchitosan. 7. Композиция по любому из предыдущих пунктов, дополнительно включающая c), по меньшей мере, один физиологически приемлемый растворитель.7. A composition according to any one of the preceding paragraphs, further comprising c) at least one physiologically acceptable solvent. 8. Использование водорастворимого пленкообразующего вещества, выбранного из гидроксиалкилхитозанов и карбоксиалкилхитозанов в качестве добавки в лаке для ногтей.8. The use of a water-soluble film-forming substance selected from hydroxyalkylchitosans and carboxyalkylchitosans as an additive in nail polish. 9. Композиция по любому из пп.1, 2, 5, 6 или 7, где компонент a) является миконазолом или его солью.9. The composition according to any one of claims 1, 2, 5, 6, or 7, wherein component a) is miconazole or a salt thereof. 10. Композиция по любому из пп.1, 2, 5, 6 или 7, где компонент a) является аморолфином или его солью.10. The composition according to any one of claims 1, 2, 5, 6, or 7, wherein component a) is amorolfine or a salt thereof.
RU2003105232/15A 2000-07-24 2001-07-18 Composition of nail vanish RU2245715C2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10035991A DE10035991A1 (en) 2000-07-24 2000-07-24 Nail polish composition
DE10035991.4 2000-07-24

Publications (2)

Publication Number Publication Date
RU2003105232A true RU2003105232A (en) 2004-06-27
RU2245715C2 RU2245715C2 (en) 2005-02-10

Family

ID=7650015

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2003105232/15A RU2245715C2 (en) 2000-07-24 2001-07-18 Composition of nail vanish

Country Status (28)

Country Link
US (1) US7033578B2 (en)
EP (1) EP1303249B1 (en)
JP (3) JP4170751B2 (en)
KR (1) KR100530263B1 (en)
CN (2) CN1307971C (en)
AT (1) ATE261296T1 (en)
AU (1) AU2001272551A1 (en)
BG (1) BG65953B1 (en)
BR (1) BRPI0112725B8 (en)
CA (1) CA2416823C (en)
CZ (1) CZ295221B6 (en)
DE (2) DE10035991A1 (en)
DK (1) DK1303249T3 (en)
ES (1) ES2215918T3 (en)
HK (1) HK1053067A1 (en)
HR (1) HRP20030037B1 (en)
HU (1) HU228525B1 (en)
IL (4) IL154078A0 (en)
ME (1) ME00508B (en)
MX (1) MXPA03000764A (en)
PL (1) PL202741B1 (en)
PT (1) PT1303249E (en)
RS (1) RS50213B (en)
RU (1) RU2245715C2 (en)
SI (1) SI1303249T1 (en)
SK (1) SK285949B6 (en)
TR (1) TR200400612T4 (en)
WO (1) WO2002007683A1 (en)

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KR101777408B1 (en) * 2014-10-24 2017-09-11 인제대학교 산학협력단 Manicure composition having aloe extracts
KR101580077B1 (en) 2015-03-28 2015-12-24 한국콜마주식회사 Nail lacquer composition containing a ciclopirox
US20240100004A9 (en) * 2015-08-05 2024-03-28 Cmpd Licensing, Llc Topical compositions and methods of formulating same
AR108116A1 (en) 2016-04-11 2018-07-18 Biolab Sanus Farmaceutica Ltda DERMOCOSMETIC COMPOSITION, PROCESS OF PRODUCTION OF THE TOPICAL COMPOSITION, METHOD FOR STRENGTHENING OF FRAGILE NAILS AND USE OF COMPOSITION
CN105943549A (en) * 2016-05-10 2016-09-21 赫尔森江苏医药有限公司 Film-forming and bacterium-resisting agent for treating onychomycosis and preparation process of agent
RU2674765C2 (en) * 2016-10-03 2018-12-13 Михаил Лукич Ткаченко Antifungal composition of eutectic type (options)
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