RU2000131604A - METHOD OF GALVANIC COPPER OF SUBSTRATES - Google Patents
METHOD OF GALVANIC COPPER OF SUBSTRATESInfo
- Publication number
- RU2000131604A RU2000131604A RU2000131604/02A RU2000131604A RU2000131604A RU 2000131604 A RU2000131604 A RU 2000131604A RU 2000131604/02 A RU2000131604/02 A RU 2000131604/02A RU 2000131604 A RU2000131604 A RU 2000131604A RU 2000131604 A RU2000131604 A RU 2000131604A
- Authority
- RU
- Russia
- Prior art keywords
- copper
- carbonate
- substrates
- solution
- value
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 3
- 229910052802 copper Inorganic materials 0.000 claims 3
- 239000010949 copper Substances 0.000 claims 3
- 238000007747 plating Methods 0.000 claims 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims 3
- 150000001879 copper Chemical class 0.000 claims 2
- 229940116318 copper carbonate Drugs 0.000 claims 2
- 229910001431 copper ion Inorganic materials 0.000 claims 2
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 claims 2
- 239000003792 electrolyte Substances 0.000 claims 2
- 238000001556 precipitation Methods 0.000 claims 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims 2
- 239000005750 Copper hydroxide Substances 0.000 claims 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper(II) hydroxide Chemical group [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 claims 1
- 210000000188 Diaphragm Anatomy 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 150000001298 alcohols Chemical class 0.000 claims 1
- 230000001588 bifunctional Effects 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 229910001956 copper hydroxide Inorganic materials 0.000 claims 1
- ZMMDPCMYTCRWFF-UHFFFAOYSA-J dicopper;carbonate;dihydroxide Chemical compound [OH-].[OH-].[Cu+2].[Cu+2].[O-]C([O-])=O ZMMDPCMYTCRWFF-UHFFFAOYSA-J 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N propane Chemical class CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims 1
- 239000001187 sodium carbonate Substances 0.000 claims 1
- 229910000029 sodium carbonate Inorganic materials 0.000 claims 1
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19822076 | 1998-05-16 | ||
DE19822076.6 | 1998-05-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
RU2000131604A true RU2000131604A (en) | 2002-12-27 |
RU2222643C2 RU2222643C2 (en) | 2004-01-27 |
Family
ID=7868038
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
RU2000131604/02A RU2222643C2 (en) | 1998-05-16 | 1999-05-14 | Method for copper electroplating of substrates |
Country Status (22)
Country | Link |
---|---|
US (1) | US6576111B1 (en) |
EP (1) | EP1080252B1 (en) |
JP (1) | JP2002515549A (en) |
KR (1) | KR100545664B1 (en) |
CN (1) | CN1170965C (en) |
AT (1) | ATE221930T1 (en) |
AU (1) | AU4261799A (en) |
CA (1) | CA2331750A1 (en) |
DE (1) | DE59902276D1 (en) |
DK (1) | DK1080252T3 (en) |
HU (1) | HUP0102016A3 (en) |
IL (1) | IL139418A0 (en) |
IS (1) | IS5703A (en) |
NO (1) | NO20005777D0 (en) |
PL (1) | PL344529A1 (en) |
RO (1) | RO119838B1 (en) |
RU (1) | RU2222643C2 (en) |
SK (1) | SK16912000A3 (en) |
TR (1) | TR200003368T2 (en) |
WO (1) | WO1999060188A2 (en) |
YU (1) | YU70900A (en) |
ZA (1) | ZA200006624B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3725083B2 (en) * | 2002-02-21 | 2005-12-07 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | Method for enabling effective preservation of metal ion source in plating equipment |
US7776741B2 (en) | 2008-08-18 | 2010-08-17 | Novellus Systems, Inc. | Process for through silicon via filing |
US9109295B2 (en) * | 2009-10-12 | 2015-08-18 | Novellus Systems, Inc. | Electrolyte concentration control system for high rate electroplating |
US10472730B2 (en) | 2009-10-12 | 2019-11-12 | Novellus Systems, Inc. | Electrolyte concentration control system for high rate electroplating |
CN107636209B (en) * | 2015-06-26 | 2021-07-02 | 住友金属矿山股份有限公司 | Conductive substrate |
US10692735B2 (en) | 2017-07-28 | 2020-06-23 | Lam Research Corporation | Electro-oxidative metal removal in through mask interconnect fabrication |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3483078D1 (en) * | 1983-09-28 | 1990-10-04 | Blasberg Oberflaechentech | ACID GALVANIC COPPER BATH AND METHOD FOR THE PRODUCTION THEREOF. |
JPS62112996A (en) * | 1985-11-11 | 1987-05-23 | Mitsubishi Metal Corp | Heat-transmitting body |
DE4001960A1 (en) * | 1990-01-24 | 1991-07-25 | Roland Schnetteler | Zinc-nickel alloy electroplating of steel strip - with minimal carbon di:oxide entrainment on nickel carbonate addn. to electrolyte |
JPH04320088A (en) * | 1991-04-18 | 1992-11-10 | Cmk Corp | Manufacture of printed wiring board |
-
1999
- 1999-05-14 HU HU0102016A patent/HUP0102016A3/en unknown
- 1999-05-14 IL IL13941899A patent/IL139418A0/en unknown
- 1999-05-14 PL PL99344529A patent/PL344529A1/en unknown
- 1999-05-14 EP EP99952102A patent/EP1080252B1/en not_active Expired - Lifetime
- 1999-05-14 KR KR1020007012742A patent/KR100545664B1/en not_active IP Right Cessation
- 1999-05-14 SK SK1691-2000A patent/SK16912000A3/en unknown
- 1999-05-14 CN CNB998062502A patent/CN1170965C/en not_active Expired - Fee Related
- 1999-05-14 US US09/674,509 patent/US6576111B1/en not_active Expired - Fee Related
- 1999-05-14 DK DK99952102T patent/DK1080252T3/en active
- 1999-05-14 YU YU70900A patent/YU70900A/en unknown
- 1999-05-14 AU AU42617/99A patent/AU4261799A/en not_active Abandoned
- 1999-05-14 WO PCT/EP1999/003321 patent/WO1999060188A2/en active IP Right Grant
- 1999-05-14 RU RU2000131604/02A patent/RU2222643C2/en not_active IP Right Cessation
- 1999-05-14 AT AT99952102T patent/ATE221930T1/en not_active IP Right Cessation
- 1999-05-14 JP JP2000549788A patent/JP2002515549A/en active Pending
- 1999-05-14 TR TR2000/03368T patent/TR200003368T2/en unknown
- 1999-05-14 CA CA002331750A patent/CA2331750A1/en not_active Abandoned
- 1999-05-14 DE DE59902276T patent/DE59902276D1/en not_active Expired - Lifetime
- 1999-05-14 RO ROA200001121A patent/RO119838B1/en unknown
-
2000
- 2000-11-02 IS IS5703A patent/IS5703A/en unknown
- 2000-11-15 ZA ZA200006624A patent/ZA200006624B/en unknown
- 2000-11-15 NO NO20005777A patent/NO20005777D0/en not_active Application Discontinuation
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