PT1255690E - Metodo de fabrico de microestruturas com varias propriedades de superficie em corpos de multiplas camadas por gravacao com plasma - Google Patents

Metodo de fabrico de microestruturas com varias propriedades de superficie em corpos de multiplas camadas por gravacao com plasma

Info

Publication number
PT1255690E
PT1255690E PT01901108T PT01901108T PT1255690E PT 1255690 E PT1255690 E PT 1255690E PT 01901108 T PT01901108 T PT 01901108T PT 01901108 T PT01901108 T PT 01901108T PT 1255690 E PT1255690 E PT 1255690E
Authority
PT
Portugal
Prior art keywords
surface properties
gravaca
plasma
bodies
multiple layers
Prior art date
Application number
PT01901108T
Other languages
English (en)
Inventor
Walter Schmidt
Joel S Rossier
Frederic Reymond
Original Assignee
Diagnoswiss Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Diagnoswiss Sa filed Critical Diagnoswiss Sa
Publication of PT1255690E publication Critical patent/PT1255690E/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00—Other mixers; Mixing plants; Combinations of mixers
    • B01F33/30—Micromixers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00119—Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00206—Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/416—Systems
    • G01N27/447—Systems using electrophoresis
    • G01N27/44756—Apparatus specially adapted therefor
    • G01N27/44791—Microapparatus
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/60—Construction of the column
    • G01N30/6095—Micromachined or nanomachined, e.g. micro- or nanosize
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0041—Etching of the substrate by chemical or physical means by plasma etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00819—Materials of construction
    • B01J2219/00824—Ceramic
    • B01J2219/00828—Silicon wafers or plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00851—Additional features
    • B01J2219/00858—Aspects relating to the size of the reactor
    • B01J2219/0086—Dimensions of the flow channels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/12—Specific details about manufacturing devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2009/00—Layered products
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/26—Conditioning of the fluid carrier; Flow patterns
    • G01N30/28—Control of physical parameters of the fluid carrier
    • G01N2030/285—Control of physical parameters of the fluid carrier electrically driven carrier
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Dispersion Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Pathology (AREA)
  • Plasma & Fusion (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Hematology (AREA)
  • Electrochemistry (AREA)
  • Clinical Laboratory Science (AREA)
  • Nanotechnology (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Surface Treatment Of Glass (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Micromachines (AREA)
PT01901108T 2000-01-31 2001-01-30 Metodo de fabrico de microestruturas com varias propriedades de superficie em corpos de multiplas camadas por gravacao com plasma PT1255690E (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US17933400P 2000-01-31 2000-01-31

Publications (1)

Publication Number Publication Date
PT1255690E true PT1255690E (pt) 2004-12-31

Family

ID=22656136

Family Applications (1)

Application Number Title Priority Date Filing Date
PT01901108T PT1255690E (pt) 2000-01-31 2001-01-30 Metodo de fabrico de microestruturas com varias propriedades de superficie em corpos de multiplas camadas por gravacao com plasma

Country Status (9)

Country Link
US (1) US7087181B2 (pt)
EP (1) EP1255690B1 (pt)
AT (1) ATE277865T1 (pt)
AU (1) AU776266C (pt)
CA (1) CA2399027C (pt)
DE (1) DE60105979T2 (pt)
ES (1) ES2225466T3 (pt)
PT (1) PT1255690E (pt)
WO (1) WO2001056771A2 (pt)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100450818B1 (ko) * 2002-03-09 2004-10-01 삼성전자주식회사 다챔버 ｐｃｒ 칩
US7745203B2 (en) 2002-07-31 2010-06-29 Kabushiki Kaisha Toshiba Base sequence detection apparatus and base sequence automatic analyzing apparatus
JP4057967B2 (ja) * 2002-07-31 2008-03-05 株式会社東芝 塩基配列自動解析装置
EP1548429A4 (en) * 2002-09-05 2009-06-17 Katayanagi Inst METHOD FOR DISCONNECTING SUBSTANCES
US7279134B2 (en) * 2002-09-17 2007-10-09 Intel Corporation Microfluidic devices with porous membranes for molecular sieving, metering, and separations
US6818964B2 (en) 2002-09-30 2004-11-16 The Regents Of The University Of California Selectively-etched nanochannel electrophoretic and electrochemical devices
US7034854B2 (en) * 2002-11-12 2006-04-25 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
US7012017B2 (en) 2004-01-29 2006-03-14 3M Innovative Properties Company Partially etched dielectric film with conductive features
AU2005212396A1 (en) 2004-02-06 2005-08-25 Bayer Healthcare Llc Oxidizable species as an internal reference for biosensors and method of use
FR2886652B1 (fr) * 2005-06-06 2007-09-14 Centre Nat Rech Scient Procede de realisation d'une zone hydrophile sur un substrat hydrophobe, par voie electrochimique
UY29681A1 (es) 2005-07-20 2007-02-28 Bayer Healthcare Llc Amperometria regulada
ES2716136T3 (es) 2005-09-30 2019-06-10 Ascensia Diabetes Care Holdings Ag Voltamperometría controlada
DE102006004887B4 (de) * 2006-02-03 2010-07-22 Karlsruher Institut für Technologie Vorrichtung zur Erzeugung von Flüssigkeitsströmungen, Verfahren zu ihrer Herstellung und zu ihrem Betrieb sowie ihre Verwendung
JP4844168B2 (ja) * 2006-02-28 2011-12-28 パナソニック株式会社 部品接合方法および部品積層方法
JP5244116B2 (ja) 2006-10-24 2013-07-24 バイエル・ヘルスケア・エルエルシー 過渡減衰電流測定法
US8921283B2 (en) * 2006-10-30 2014-12-30 Washington University Method for generating microscopic patterns of protein and other macromolecules
WO2008078781A1 (ja) 2006-12-26 2008-07-03 Sekisui Chemical Co., Ltd. ヘモグロビン類の測定方法及び電気泳動装置
EP2011629A1 (de) 2007-07-03 2009-01-07 F. Hoffman-la Roche AG Verfahren zur Herstellung eines mikrofluiden Systems auf einer Polymeroberfläche
DE102007046305A1 (de) 2007-09-27 2009-04-02 Robert Bosch Gmbh Mikrofluidisches Bauelement sowie Herstellungsverfahren
PL2045363T3 (pl) * 2007-10-05 2012-05-31 Unilin Bvba Sposób wytwarzania płyty prasującej i sposób wytłaczania panelu podłogowego
WO2009076302A1 (en) 2007-12-10 2009-06-18 Bayer Healthcare Llc Control markers for auto-detection of control solution and methods of use
US20090250347A1 (en) * 2008-04-03 2009-10-08 Protea Biosciences, Inc. Microfluidic devices & processes for electrokinetic transport
US20090250345A1 (en) * 2008-04-03 2009-10-08 Protea Biosciences, Inc. Microfluidic electroelution devices & processes
DE102008027461B4 (de) 2008-06-09 2011-07-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 Vorrichtung und Verfahren zur mikrostrukturierten Plasmabehandlung
DE102008042196A1 (de) 2008-09-18 2010-03-25 Robert Bosch Gmbh Verfahren zum Herstellen eines mikrofluidischen Bauelementes sowie mikrofluidisches Bauelement
FR2938062B1 (fr) 2008-11-05 2014-02-28 Biomerieux Sa Dispositif de preparation et/ou de traitement d'un echantillon biologique
US20110143378A1 (en) * 2009-11-12 2011-06-16 CyVek LLC. Microfluidic method and apparatus for high performance biological assays
US9651568B2 (en) 2009-11-23 2017-05-16 Cyvek, Inc. Methods and systems for epi-fluorescent monitoring and scanning for microfluidic assays
US9759718B2 (en) 2009-11-23 2017-09-12 Cyvek, Inc. PDMS membrane-confined nucleic acid and antibody/antigen-functionalized microlength tube capture elements, and systems employing them, and methods of their use
US9855735B2 (en) 2009-11-23 2018-01-02 Cyvek, Inc. Portable microfluidic assay devices and methods of manufacture and use
WO2011063408A1 (en) 2009-11-23 2011-05-26 Cyvek, Inc. Method and apparatus for performing assays
US10065403B2 (en) 2009-11-23 2018-09-04 Cyvek, Inc. Microfluidic assay assemblies and methods of manufacture
US9500645B2 (en) 2009-11-23 2016-11-22 Cyvek, Inc. Micro-tube particles for microfluidic assays and methods of manufacture
US9700889B2 (en) 2009-11-23 2017-07-11 Cyvek, Inc. Methods and systems for manufacture of microarray assay systems, conducting microfluidic assays, and monitoring and scanning to obtain microfluidic assay results
WO2012129455A2 (en) 2011-03-22 2012-09-27 Cyvek, Inc Microfluidic devices and methods of manufacture and use
CA2860501C (en) 2012-01-09 2021-05-18 Sophion Bioscience A/S Improved patch area cell adhesion
ITTO20120121A1 (it) * 2012-02-13 2013-08-14 Christian Riekel Dispositivo electrowetting-on-dielectric superidrofobico provvisto di una configurazione di elettrodi multipli
EP2822688B1 (en) 2012-03-08 2019-09-25 Cyvek, Inc. Microfluidic assay assemblies and methods of manufacture
US10228367B2 (en) 2015-12-01 2019-03-12 ProteinSimple Segmented multi-use automated assay cartridge
JP6639732B2 (ja) 2017-03-27 2020-02-05 株式会社アルバック 電子部品の製造方法
TWI726225B (zh) * 2018-07-18 2021-05-01 李俊豪 生醫晶片製作方法
JP7246041B2 (ja) * 2018-11-07 2023-03-27 ウシオ電機株式会社 細胞培養チップ及びその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59208606D1 (de) 1991-02-28 1997-07-17 Heinze Dyconex Patente Verfahren zur herstellung eines aus mikrosieben bestehenden verbundkörpers
US5985356A (en) * 1994-10-18 1999-11-16 The Regents Of The University Of California Combinatorial synthesis of novel materials
JP2001517794A (ja) * 1997-09-19 2001-10-09 アクレイラ バイオサイエンシズ，インコーポレイティド キャピラリ電気フロー装置および方法
US5992820A (en) * 1997-11-19 1999-11-30 Sarnoff Corporation Flow control in microfluidics devices by controlled bubble formation
EP1060022A1 (en) * 1998-02-04 2000-12-20 Merck & Co., Inc. Virtual wells for use in high throughput screening assays
US6756019B1 (en) * 1998-02-24 2004-06-29 Caliper Technologies Corp. Microfluidic devices and systems incorporating cover layers
US6103199A (en) * 1998-09-15 2000-08-15 Aclara Biosciences, Inc. Capillary electroflow apparatus and method
CN1185492C (zh) * 1999-03-15 2005-01-19 清华大学 可单点选通式微电磁单元阵列芯片、电磁生物芯片及应用
US20030113528A1 (en) * 1999-09-17 2003-06-19 Wilson Moya Patterned porous structures
US6423465B1 (en) * 2000-01-28 2002-07-23 International Business Machines Corporation Process for preparing a patterned continuous polymeric brush on a substrate surface
ES2267828T3 (es) * 2000-10-10 2007-03-16 Serono Genetics Institute S.A. Polimeros que se adsorben sobre superficies y su uso para tratar superficies hidrofobas o hidrofilas.

Also Published As

Publication number Publication date
WO2001056771A2 (en) 2001-08-09
CA2399027A1 (en) 2001-08-09
US20030102284A1 (en) 2003-06-05
DE60105979D1 (de) 2004-11-04
AU776266C (en) 2006-01-05
EP1255690A2 (en) 2002-11-13
EP1255690B1 (en) 2004-09-29
US7087181B2 (en) 2006-08-08
AU776266B2 (en) 2004-09-02
CA2399027C (en) 2010-06-22
AU2661701A (en) 2001-08-14
WO2001056771A3 (en) 2002-01-24
ES2225466T3 (es) 2005-03-16
DE60105979T2 (de) 2005-10-06
ATE277865T1 (de) 2004-10-15

Similar Documents

Publication Publication Date Title
PT1255690E (pt) Metodo de fabrico de microestruturas com varias propriedades de superficie em corpos de multiplas camadas por gravacao com plasma
AU2003275687A1 (en) Carbon nanotube device, process for producing the same and carbon nanotube transcriptional body
TW200744831A (en) Self-aligned process for fabricating imprint templates containing variously etched features
WO2006065986A3 (en) Aerodynamic jetting of aerosolized fluids for fabrication of passive structures
WO2009108752A3 (en) Laser-induced structuring of substrate surfaces
WO2008096335A3 (en) Producing an array of nanoscale structures on a substrate surface via a self-assembled template
WO2007117524A3 (en) Method of concurrently patterning a substrate having a plurality of fields and alignment marks
DK2275211T3 (da) Fremgangsmåde til at producere en organisk tyndfilm
WO2004013693A3 (en) Scatterometry alignment for imprint lithography
FI20075428A (fi) Nanopertikkelisysteemeihin liittyvä menetelmä ja laite
WO2004063775A3 (en) Lenticular lens pattern-forming device for prouducing a web roll of lenticular lens
TW200743140A (en) Method for fabricating fine pattern in semiconductor device
WO2011011142A3 (en) Method and materials for reverse patterning
DE502004002029D1 (de) Mehrschichtkörper, vorrichtung und verfahren zur erzeugung eines flächenmusters hoher auflösung
WO2010112827A3 (en) Method and apparatus for producing three dimensional nano and micro scale structures
ATE412256T1 (de) Verfahren zur herstellung strukturierter schichten
CN106115681A (zh) 一种实现二维材料图形化的方法
DE60205464D1 (de) Herstellung eines metallischen musters
Cheng et al. Customization and design of directed self-assembly using hybrid prepatterns
ATE535810T1 (de) Verfahren zur immobilisierung von lipidschichten
Miki et al. Fabrication of microstructure array directly on β-phase poly (vinylidene fluoride) thin film by O2 reactive ion etching
FR2849657B1 (fr) Feuille possedant un aspect iridescent, et son procede de fabrication
ATE388477T1 (de) Tastatur und verfahren zur herstellung einer tastatur
TW200802539A (en) Method for fabricating a fine pattern in a semiconductor device
TW200632444A (en) Method for printing by printed pattern and production equipment for printing printed pattern