PL3932989T3 - Preparaty bisbenzocyklobutenu - Google Patents
Preparaty bisbenzocyklobutenuInfo
- Publication number
- PL3932989T3 PL3932989T3 PL21179645.3T PL21179645T PL3932989T3 PL 3932989 T3 PL3932989 T3 PL 3932989T3 PL 21179645 T PL21179645 T PL 21179645T PL 3932989 T3 PL3932989 T3 PL 3932989T3
- Authority
- PL
- Poland
- Prior art keywords
- bisbenzocyclobuten
- preparations
- bisbenzocyclobuten preparations
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D145/00—Coating compositions based on homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic system; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
- C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
- C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/045—Light guides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
- C08K5/23—Azo-compounds
- C08K5/235—Diazo and polyazo compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2150/00—Compositions for coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/145—Side-chains containing sulfur
- C08G2261/1452—Side-chains containing sulfur containing sulfonyl or sulfonate-groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/16—End groups
- C08G2261/164—End groups comprising organic end groups
- C08G2261/1644—End groups comprising organic end groups comprising other functional groups, e.g. OH groups, NH groups, COOH groups or boronic acid
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/31—Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
- C08G2261/314—Condensed aromatic systems, e.g. perylene, anthracene or pyrene
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12069—Organic material
- G02B2006/12073—Epoxy
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/1219—Polymerisation
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Optical Integrated Circuits (AREA)
- Epoxy Resins (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063047444P | 2020-07-02 | 2020-07-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL3932989T3 true PL3932989T3 (pl) | 2024-03-04 |
Family
ID=76483168
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL21179645.3T PL3932989T3 (pl) | 2020-07-02 | 2021-06-15 | Preparaty bisbenzocyklobutenu |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US20220002474A1 (pl) |
| EP (1) | EP3932989B1 (pl) |
| JP (1) | JP7171835B2 (pl) |
| KR (1) | KR102600273B1 (pl) |
| CN (1) | CN113881305B (pl) |
| FI (1) | FI3932989T3 (pl) |
| PL (1) | PL3932989T3 (pl) |
| PT (1) | PT3932989T (pl) |
| TW (1) | TWI808442B (pl) |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4826997A (en) | 1984-08-27 | 1989-05-02 | The Dow Chemical Company | N-Substituted arylcyclo butenyl-maleimides |
| US4724260A (en) | 1984-08-27 | 1988-02-09 | The Dow Chemical Company | Unsaturated alkyl monoarylcyclobutane monomers |
| US4540763A (en) | 1984-09-14 | 1985-09-10 | The Dow Chemical Company | Polymers derived from poly(arylcyclobutenes) |
| US4783514A (en) | 1986-02-28 | 1988-11-08 | The Dow Chemical Company | Polymeric monoarylcyclobutane compositions |
| US4812588A (en) | 1987-12-14 | 1989-03-14 | The Dow Chemical Company | Polyorganosiloxane-bridged bisbenzocyclobutene monomers |
| US4999499A (en) | 1989-09-21 | 1991-03-12 | General Dynamics Corporation | Method of inspecting solder joints with a laser inspection system |
| US5243068A (en) | 1991-03-28 | 1993-09-07 | The Dow Chemical Company | Process for preparing vinylically-unsaturated compounds (II) |
| US5136069A (en) | 1991-03-28 | 1992-08-04 | The Dow Chemical Company | Process for preparing vinylically-unsaturated compounds (II) |
| US5185391A (en) | 1991-11-27 | 1993-02-09 | The Dow Chemical Company | Oxidation inhibited arylcyclobutene polymers |
| US5277536A (en) | 1991-12-02 | 1994-01-11 | Baldwin Kevin L | Co-mingled material recovery apparatus for recycling |
| US6361926B1 (en) * | 1998-10-23 | 2002-03-26 | The Dow Chemical Company | Acid functional polymers based on benzocyclobutene |
| US6579914B1 (en) * | 2000-07-14 | 2003-06-17 | Alcatel | Coating compositions for optical waveguides and optical waveguides coated therewith |
| JP4997670B2 (ja) * | 2001-06-29 | 2012-08-08 | 日本電気株式会社 | 共重合高分子膜の作製方法、前記形成方法で作製される共重合高分子膜、共重合高分子膜を利用する半導体装置 |
| AU2002317579A1 (en) * | 2001-07-26 | 2003-02-17 | The Penn State Research Foundation | Optical waveguides and grating structures fabricated using polymeric dielectric compositions |
| JP2003287882A (ja) * | 2002-03-27 | 2003-10-10 | Fuji Photo Film Co Ltd | 感光材料および平版印刷版の製版方法 |
| US7019093B2 (en) | 2002-10-18 | 2006-03-28 | Dow Global Technologies Inc. | Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance |
| JP4277616B2 (ja) * | 2003-08-08 | 2009-06-10 | 住友ベークライト株式会社 | アルカリ可溶性感光性樹脂組成物及び樹脂層の形成方法 |
| JP4453298B2 (ja) * | 2003-08-11 | 2010-04-21 | 住友ベークライト株式会社 | 感光性樹脂組成物及び樹脂層の形成方法 |
| JP2005062405A (ja) * | 2003-08-11 | 2005-03-10 | Sumitomo Bakelite Co Ltd | アルカリ可溶性感光性樹脂組成物及び樹脂層の形成方法 |
| EP1802694B1 (en) | 2004-10-13 | 2010-04-28 | Dow Global Technologies Inc. | Aqueous developable benzocyclobutene-based polymer composition and method of use of such compositions |
| US8351752B2 (en) * | 2006-03-06 | 2013-01-08 | Hitachi Chemical Company, Ltd. | Flexible optical waveguide, method for manufacturing such flexible optical waveguide, and optical module |
| US9296915B1 (en) * | 2015-04-10 | 2016-03-29 | Dow Global Technologies Llc | Toughened arylcyclobutene polymers |
| US9441055B1 (en) * | 2015-09-18 | 2016-09-13 | Dow Global Technologies Llc | Arylcyclobutenes |
| US20170174805A1 (en) * | 2015-12-21 | 2017-06-22 | Dow Global Technologies Llc | Arylcyclobutenes |
| CN106432729A (zh) * | 2016-09-25 | 2017-02-22 | 复旦大学 | 一种含苯并环丁烯官能团的聚倍半硅氧烷及其制备方法 |
| US20190112400A1 (en) * | 2017-10-12 | 2019-04-18 | Rohm And Haas Electronic Materials Llc | Polymers from bis-arylcyclobutene group containing monomers that cure through other groups and methods for making the same |
| CN108586748B (zh) * | 2018-04-23 | 2021-09-17 | 复旦大学 | 一种苯并环丁烯官能化有机硅聚合物及其制备方法和应用 |
| EP3636692A1 (en) * | 2018-10-08 | 2020-04-15 | SABIC Global Technologies B.V. | Poly(arylene ether) copolymer |
-
2021
- 2021-06-03 US US17/337,980 patent/US20220002474A1/en not_active Abandoned
- 2021-06-15 PT PT211796453T patent/PT3932989T/pt unknown
- 2021-06-15 FI FIEP21179645.3T patent/FI3932989T3/fi active
- 2021-06-15 EP EP21179645.3A patent/EP3932989B1/en active Active
- 2021-06-15 PL PL21179645.3T patent/PL3932989T3/pl unknown
- 2021-06-28 CN CN202110717496.4A patent/CN113881305B/zh active Active
- 2021-06-28 TW TW110123647A patent/TWI808442B/zh active
- 2021-06-29 KR KR1020210085193A patent/KR102600273B1/ko active Active
- 2021-06-29 JP JP2021107683A patent/JP7171835B2/ja active Active
-
2025
- 2025-05-06 US US19/199,890 patent/US20250270366A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TWI808442B (zh) | 2023-07-11 |
| US20250270366A1 (en) | 2025-08-28 |
| CN113881305B (zh) | 2022-11-15 |
| PT3932989T (pt) | 2024-01-22 |
| EP3932989B1 (en) | 2023-11-29 |
| KR20220003973A (ko) | 2022-01-11 |
| EP3932989A1 (en) | 2022-01-05 |
| TW202202547A (zh) | 2022-01-16 |
| FI3932989T3 (fi) | 2024-02-02 |
| CN113881305A (zh) | 2022-01-04 |
| US20220002474A1 (en) | 2022-01-06 |
| JP2022013856A (ja) | 2022-01-18 |
| KR102600273B1 (ko) | 2023-11-08 |
| JP7171835B2 (ja) | 2022-11-15 |
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