PL3010098T3 - Wysokoczęstotliwościowe urządzenie zasilające i sposób zapłonu plazmy - Google Patents
Wysokoczęstotliwościowe urządzenie zasilające i sposób zapłonu plazmyInfo
- Publication number
- PL3010098T3 PL3010098T3 PL14881474T PL14881474T PL3010098T3 PL 3010098 T3 PL3010098 T3 PL 3010098T3 PL 14881474 T PL14881474 T PL 14881474T PL 14881474 T PL14881474 T PL 14881474T PL 3010098 T3 PL3010098 T3 PL 3010098T3
- Authority
- PL
- Poland
- Prior art keywords
- power supply
- supply device
- frequency power
- plasma ignition
- ignition method
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T15/00—Circuits specially adapted for spark gaps, e.g. ignition circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32146—Amplitude modulation, includes pulsing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32926—Software, data control or modelling
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
- H05B41/14—Circuit arrangements
- H05B41/24—Circuit arrangements in which the lamp is fed by high frequency AC, or with separate oscillator frequency
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Combustion & Propulsion (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014019060A JP5704772B1 (ja) | 2014-02-04 | 2014-02-04 | 高周波電源装置およびプラズマ着火方法 |
| PCT/JP2014/056411 WO2015118696A1 (ja) | 2014-02-04 | 2014-03-12 | 高周波電源装置およびプラズマ着火方法 |
| EP14881474.2A EP3010098B1 (en) | 2014-02-04 | 2014-03-12 | High-frequency power supply device, and plasma ignition method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL3010098T3 true PL3010098T3 (pl) | 2019-01-31 |
Family
ID=52985992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL14881474T PL3010098T3 (pl) | 2014-02-04 | 2014-03-12 | Wysokoczęstotliwościowe urządzenie zasilające i sposób zapłonu plazmy |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9451687B2 (pl) |
| EP (1) | EP3010098B1 (pl) |
| JP (1) | JP5704772B1 (pl) |
| KR (1) | KR101689508B1 (pl) |
| CN (1) | CN105637723B (pl) |
| PL (1) | PL3010098T3 (pl) |
| TW (1) | TWI524821B (pl) |
| WO (1) | WO2015118696A1 (pl) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6202644B2 (ja) * | 2013-08-26 | 2017-09-27 | 株式会社日立国際電気 | プラズマ生成用電源装置 |
| JP6491888B2 (ja) * | 2015-01-19 | 2019-03-27 | 株式会社日立ハイテクノロジーズ | プラズマ処理方法およびプラズマ処理装置 |
| US10440808B2 (en) * | 2015-11-17 | 2019-10-08 | Southwest Research Institute | High power impulse plasma source |
| US10354845B2 (en) | 2016-02-18 | 2019-07-16 | Southwest Research Institute | Atmospheric pressure pulsed arc plasma source and methods of coating therewith |
| KR101857470B1 (ko) | 2016-04-18 | 2018-05-14 | 현대자동차주식회사 | 공기 유량 제어 방법 및 시스템 |
| JP6947504B2 (ja) | 2016-12-27 | 2021-10-13 | 株式会社京三製作所 | 電源装置、及び電源装置の制御方法 |
| JP6712547B2 (ja) | 2016-12-27 | 2020-06-24 | 株式会社京三製作所 | 電源装置、及び電源装置の制御方法 |
| JP6873687B2 (ja) | 2016-12-27 | 2021-05-19 | 株式会社京三製作所 | 電源装置、及び電源装置の制御方法 |
| JP6830150B2 (ja) * | 2017-04-04 | 2021-02-17 | 株式会社Ｆｕｊｉ | 情報処理装置 |
| CN107086431B (zh) * | 2017-06-12 | 2019-05-24 | 中国原子能科学研究院 | 驱动聚变冲击点火的复杂形状非相干激光脉冲的产生方法及装置 |
| CN111916327B (zh) * | 2019-05-10 | 2023-04-28 | 中微半导体设备(上海)股份有限公司 | 多频率多阶段的等离子体射频输出的方法及其装置 |
| CN116261249A (zh) * | 2023-03-13 | 2023-06-13 | 上海集成电路装备材料产业创新中心有限公司 | 一种刻蚀机启辉方法、装置、设备及计算机可读存储介质 |
| US20250191879A1 (en) * | 2023-12-11 | 2025-06-12 | Forth-Rite Technologies, Llc | System and method for enhanced rf power delivery using harmonic waveform synthesis |
| CN119485886B (zh) * | 2024-11-12 | 2025-11-25 | 中国原子能科学研究院 | 一种降低高频脉冲负氢离子源吸极电子负载的方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11329787A (ja) * | 1998-05-20 | 1999-11-30 | Mitsubishi Electric Corp | プラズマ発生用高周波ソースシステムおよび当該システムを含むプラズマ発生装置 |
| JP2005129666A (ja) | 2003-10-22 | 2005-05-19 | Canon Inc | 処理方法及び装置 |
| US20050103620A1 (en) * | 2003-11-19 | 2005-05-19 | Zond, Inc. | Plasma source with segmented magnetron cathode |
| JP2006185876A (ja) | 2004-12-28 | 2006-07-13 | Tdk Corp | 電源装置 |
| JP4905304B2 (ja) * | 2007-09-10 | 2012-03-28 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ処理方法及び記憶媒体 |
| US8391329B2 (en) | 2009-01-26 | 2013-03-05 | Coherent, Inc. | Gas laser discharge pre-ionization using a simmer-discharge |
| JP2010238881A (ja) * | 2009-03-31 | 2010-10-21 | Tokyo Electron Ltd | プラズマ処理装置及びプラズマ処理方法 |
| KR101322539B1 (ko) | 2009-08-07 | 2013-10-28 | 가부시끼가이샤교산세이사꾸쇼 | 펄스 변조 고주파 전력 제어 방법 및 펄스 변조 고주파 전원 장치 |
| JP5413186B2 (ja) | 2009-12-25 | 2014-02-12 | 株式会社デンソー | 高周波プラズマ点火装置 |
| JP5100853B2 (ja) | 2011-01-11 | 2012-12-19 | 東京エレクトロン株式会社 | プラズマ処理方法 |
| US9301375B2 (en) * | 2011-04-29 | 2016-03-29 | Osram Sylvania Inc. | Multiple strike ballast with lamp protection for electrodeless lamp |
| GB2477463B (en) * | 2011-05-17 | 2013-01-16 | Greentek Green Solutions 2009 Ltd | System and method for ignition and operation of a high-intensity discharge lamp |
| JP5839921B2 (ja) * | 2011-09-30 | 2016-01-06 | 株式会社ダイヘン | 高周波電源装置 |
| US9171699B2 (en) | 2012-02-22 | 2015-10-27 | Lam Research Corporation | Impedance-based adjustment of power and frequency |
| JP5534365B2 (ja) * | 2012-06-18 | 2014-06-25 | 株式会社京三製作所 | 高周波電力供給装置、及び反射波電力制御方法 |
-
2014
- 2014-02-04 JP JP2014019060A patent/JP5704772B1/ja active Active
- 2014-03-12 KR KR1020167009142A patent/KR101689508B1/ko active Active
- 2014-03-12 WO PCT/JP2014/056411 patent/WO2015118696A1/ja not_active Ceased
- 2014-03-12 PL PL14881474T patent/PL3010098T3/pl unknown
- 2014-03-12 US US14/904,886 patent/US9451687B2/en active Active
- 2014-03-12 EP EP14881474.2A patent/EP3010098B1/en active Active
- 2014-03-12 CN CN201480056402.1A patent/CN105637723B/zh active Active
- 2014-03-20 TW TW103110469A patent/TWI524821B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3010098B1 (en) | 2018-08-15 |
| CN105637723A (zh) | 2016-06-01 |
| US9451687B2 (en) | 2016-09-20 |
| JP2015146280A (ja) | 2015-08-13 |
| JP5704772B1 (ja) | 2015-04-22 |
| WO2015118696A1 (ja) | 2015-08-13 |
| EP3010098A1 (en) | 2016-04-20 |
| TW201532483A (zh) | 2015-08-16 |
| EP3010098A4 (en) | 2017-04-05 |
| KR20160046918A (ko) | 2016-04-29 |
| KR101689508B1 (ko) | 2016-12-23 |
| US20160165713A1 (en) | 2016-06-09 |
| TWI524821B (zh) | 2016-03-01 |
| CN105637723B (zh) | 2017-09-15 |
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