PL1970474T3 - Urządzenie naparowujące do naparowywania metodą wiązki molekularnej oraz do epitaksji z wiązki molekularnej - Google Patents

Urządzenie naparowujące do naparowywania metodą wiązki molekularnej oraz do epitaksji z wiązki molekularnej

Info

Publication number
PL1970474T3
PL1970474T3 PL08003282T PL08003282T PL1970474T3 PL 1970474 T3 PL1970474 T3 PL 1970474T3 PL 08003282 T PL08003282 T PL 08003282T PL 08003282 T PL08003282 T PL 08003282T PL 1970474 T3 PL1970474 T3 PL 1970474T3
Authority
PL
Poland
Prior art keywords
molecular beam
vaporisation
moving substrate
molecular
substrate
Prior art date
Application number
PL08003282T
Other languages
English (en)
Inventor
Wolfgang Braun
Albrecht Fischer
Original Assignee
Createc Fischer & Co Gmbh
Forschungsverbund Berlin Ev
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Createc Fischer & Co Gmbh, Forschungsverbund Berlin Ev filed Critical Createc Fischer & Co Gmbh
Publication of PL1970474T3 publication Critical patent/PL1970474T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066—Heating of the material to be evaporated
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
PL08003282T 2007-03-14 2008-02-22 Urządzenie naparowujące do naparowywania metodą wiązki molekularnej oraz do epitaksji z wiązki molekularnej PL1970474T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007012370A DE102007012370A1 (de) 2007-03-14 2007-03-14 Bedampfungseinrichtung und Bedampfungsverfahren zur Molekularstrahlbedampfung und Molekularstrahlepitaxie
EP08003282A EP1970474B1 (de) 2007-03-14 2008-02-22 Bedampfungseinrichtung zur Molekularstrahlbedampfung und Molekularstrahlepitaxie

Publications (1)

Publication Number Publication Date
PL1970474T3 true PL1970474T3 (pl) 2011-01-31

Family

ID=39508192

Family Applications (1)

Application Number Title Priority Date Filing Date
PL08003282T PL1970474T3 (pl) 2007-03-14 2008-02-22 Urządzenie naparowujące do naparowywania metodą wiązki molekularnej oraz do epitaksji z wiązki molekularnej

Country Status (4)

Country Link
EP (1) EP1970474B1 (pl)
AT (1) ATE472619T1 (pl)
DE (2) DE102007012370A1 (pl)
PL (1) PL1970474T3 (pl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2956411B1 (fr) * 2010-02-16 2012-04-06 Astron Fiamm Safety Systeme de chauffage d'une source de depot en phase vapeur
DE102010060292B4 (de) 2010-11-01 2023-05-25 Antec Solar Gmbh Verfahren und CSS-Reaktor zum kontinuierlichen Beschichten von Substraten
DE102010055285A1 (de) * 2010-12-21 2012-06-21 Solarion Ag Photovoltaik Verdampferquelle, Verdampferkammer und Beschichtungsverfahren
DE102011013245A1 (de) 2011-03-07 2012-09-13 Createc Fischer & Co. Gmbh Vorrichtung für ein Vakuum und zum Übertragen oder Ermöglichen einer Bewegung
DE102011016814B4 (de) * 2011-04-12 2017-03-23 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verdampferzellen-Verschlusseinrichtung für eine Beschichtungsanlage
DE102012004082B4 (de) 2012-02-29 2014-02-13 Createc Fischer & Co. Gmbh Vorrichtung für ein Vakuum und zum Übertragen oder Ermöglichen einer Bewegung
DE102015117236A1 (de) * 2015-10-09 2017-04-13 Von Ardenne Gmbh Verfahren zum Einbringen von Material in eine Prozesskammer und Vorrichtung zum Behandeln von Substraten in einer Prozesskammer
EP3888467A1 (de) 2017-07-03 2021-10-06 Weber Maschinenbau GmbH Breidenbach Bereitstellen von bahnförmigem zwischenblattmaterial an einem schneidbereich
DE102017122754A1 (de) 2017-09-29 2019-04-04 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Vorrichtung sowie Vakuumkammer
DE102018131906A1 (de) * 2018-12-12 2020-06-18 VON ARDENNE Asset GmbH & Co. KG Verdampfungsanordnung und Verfahren

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2440135A (en) * 1944-08-04 1948-04-20 Alexander Paul Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers
DE2548357C2 (de) * 1975-10-29 1983-05-26 Robert Bosch Gmbh, 7000 Stuttgart Einrichtung zur kontinuierlichen Vakuumbedampfung eines bandförmigen Trägermaterials mit Zink
DE4422697C1 (de) * 1994-06-29 1996-01-25 Zsw Verdampferquelle für eine Aufdampfanlage und ihre Verwendung
US5906857A (en) * 1997-05-13 1999-05-25 Ultratherm, Inc. Apparatus, system and method for controlling emission parameters attending vaporized in a HV environment
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
DE19852326A1 (de) * 1998-11-12 1999-11-18 Siemens Ag Verfahren zum Herstellen eines mit einem dotierten Leuchtstoff beschichteten Substrats sowie Vorrichtung zum Bedampfen eines Substrats mit einem Beschichtungsstoff
US6551405B1 (en) * 2000-09-22 2003-04-22 The Board Of Trustees Of The University Of Arkansas Tool and method for in situ vapor phase deposition source material reloading and maintenance
DE10056686B4 (de) 2000-11-15 2005-09-29 Forschungsverbund Berlin E.V. Verdampferzelle und ein Verfahren zur Herstellung von Aufdampfschichten
JP2003002778A (ja) * 2001-06-26 2003-01-08 International Manufacturing & Engineering Services Co Ltd 薄膜堆積用分子線セル
EP1490895A4 (en) * 2002-03-19 2007-10-10 Innovex Inc EVAPORATION SOURCE FOR A DEPOSITION PROCESS AND INSULATION FIXING PLATE AND HEATED WINDING PLATE AND METHOD FOR FIXING A HEATING WIRE
DE102004041846B4 (de) * 2004-04-27 2007-08-02 Von Ardenne Anlagentechnik Gmbh Verdampfungseinrichtung und Verfahren zum Verdampfen von Beschichtungsmaterial

Also Published As

Publication number Publication date
ATE472619T1 (de) 2010-07-15
EP1970474A1 (de) 2008-09-17
DE102007012370A1 (de) 2008-09-18
DE502008000852D1 (de) 2010-08-12
EP1970474B1 (de) 2010-06-30
DE102007012370A8 (de) 2009-01-08

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