PL102117B1 - A mixture capable of doing photopolymerization - Google Patents
A mixture capable of doing photopolymerization Download PDFInfo
- Publication number
- PL102117B1 PL102117B1 PL1974174324A PL17432474A PL102117B1 PL 102117 B1 PL102117 B1 PL 102117B1 PL 1974174324 A PL1974174324 A PL 1974174324A PL 17432474 A PL17432474 A PL 17432474A PL 102117 B1 PL102117 B1 PL 102117B1
- Authority
- PL
- Poland
- Prior art keywords
- mixture
- monomer
- component
- water
- layer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Graft Or Block Polymers (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB45090/73A GB1489567A (en) | 1973-09-26 | 1973-09-26 | Photopolymerisable compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL102117B1 true PL102117B1 (pl) | 1979-03-31 |
Family
ID=10435847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL1974174324A PL102117B1 (pl) | 1973-09-26 | 1974-09-25 | A mixture capable of doing photopolymerization |
Country Status (19)
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54147031A (en) * | 1978-05-11 | 1979-11-16 | Toray Industries | Photosensitive material |
| DE2822190A1 (de) * | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
| DE3441787A1 (de) * | 1984-03-17 | 1985-09-19 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| JPH0760264B2 (ja) * | 1984-06-29 | 1995-06-28 | 日本合成化学工業株式会社 | 感光性樹脂組成物 |
| DE3447356A1 (de) * | 1984-12-24 | 1986-07-03 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliches aufzeichnungselement |
-
1973
- 1973-09-26 GB GB45090/73A patent/GB1489567A/en not_active Expired
-
1974
- 1974-09-19 IE IE1938/74A patent/IE40031B1/xx unknown
- 1974-09-24 FI FI2775/74A patent/FI277574A7/fi unknown
- 1974-09-24 ZA ZA00746059A patent/ZA746059B/xx unknown
- 1974-09-25 DK DK504374A patent/DK504374A/da unknown
- 1974-09-25 MC MC1125A patent/MC1037A1/xx unknown
- 1974-09-25 NO NO743464A patent/NO743464L/no unknown
- 1974-09-25 NL NL7412653A patent/NL7412653A/xx not_active Application Discontinuation
- 1974-09-25 CA CA210,077A patent/CA1064755A/en not_active Expired
- 1974-09-25 FR FR7432297A patent/FR2244793B1/fr not_active Expired
- 1974-09-25 SE SE7412063A patent/SE403913B/xx unknown
- 1974-09-25 PL PL1974174324A patent/PL102117B1/pl unknown
- 1974-09-25 IT IT27711/74A patent/IT1030620B/it active
- 1974-09-25 LU LU71000A patent/LU71000A1/xx unknown
- 1974-09-26 ES ES430442A patent/ES430442A1/es not_active Expired
- 1974-09-26 JP JP49111395A patent/JPS5077104A/ja active Pending
- 1974-09-26 DE DE19742446056 patent/DE2446056A1/de not_active Withdrawn
- 1974-09-26 BE BE148956A patent/BE820404A/xx unknown
- 1974-09-26 AT AT774674A patent/AT344202B/de not_active IP Right Cessation
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