NO953636D0 - Fremgangsmåte til fremstilling av kloridfattige eller kloridfrie aminofunksjonelle organosilaner - Google Patents
Fremgangsmåte til fremstilling av kloridfattige eller kloridfrie aminofunksjonelle organosilanerInfo
- Publication number
- NO953636D0 NO953636D0 NO953636A NO953636A NO953636D0 NO 953636 D0 NO953636 D0 NO 953636D0 NO 953636 A NO953636 A NO 953636A NO 953636 A NO953636 A NO 953636A NO 953636 D0 NO953636 D0 NO 953636D0
- Authority
- NO
- Norway
- Prior art keywords
- chloride
- poor
- preparation
- free amino
- functional organosilanes
- Prior art date
Links
- 150000001282 organosilanes Chemical class 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4432638 | 1994-09-14 | ||
DE19513976A DE19513976A1 (de) | 1994-09-14 | 1995-04-13 | Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen |
Publications (3)
Publication Number | Publication Date |
---|---|
NO953636D0 true NO953636D0 (no) | 1995-09-14 |
NO953636L NO953636L (no) | 1996-03-15 |
NO304554B1 NO304554B1 (no) | 1999-01-11 |
Family
ID=25940101
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO953636A NO304554B1 (no) | 1994-09-14 | 1995-09-14 | FremgangsmÕte til fremstilling av kloridfattige eller kloridfrie aminofunksjonelle organosilaner, og de derav fremstilte aminofunksjonelle organosilaner |
Country Status (6)
Country | Link |
---|---|
US (1) | US5616755A (no) |
EP (1) | EP0702017B1 (no) |
JP (1) | JPH0881478A (no) |
CZ (1) | CZ209295A3 (no) |
NO (1) | NO304554B1 (no) |
SK (1) | SK105695A3 (no) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19516386A1 (de) * | 1995-05-04 | 1996-11-07 | Huels Chemische Werke Ag | Verfahren zur Herstellung von an chlorfunktionellen Organosilanen armen bzw. freien aminofunktionellen Organosilanen |
EP0999214B1 (de) * | 1998-11-06 | 2004-12-08 | Degussa AG | Verfahren zur Herstellung von chloridarmen oder chloridfreien Alkoxysilanen |
EP0999215B1 (de) | 1998-11-06 | 2004-07-28 | Degussa AG | Verfahren zur Herstellung von Alkoxysilanen |
US7012292B1 (en) * | 1998-11-25 | 2006-03-14 | Advanced Technology Materials, Inc | Oxidative top electrode deposition process, and microelectronic device structure |
DE10058620A1 (de) * | 2000-11-25 | 2002-05-29 | Degussa | Verfahren zur Herstellung von Aminoalkylsilanen |
US7084080B2 (en) * | 2001-03-30 | 2006-08-01 | Advanced Technology Materials, Inc. | Silicon source reagent compositions, and method of making and using same for microelectronic device structure |
US7005392B2 (en) * | 2001-03-30 | 2006-02-28 | Advanced Technology Materials, Inc. | Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same |
DE10126669A1 (de) * | 2001-06-01 | 2002-12-05 | Degussa | Verfahren zur Spaltung von cyclischen Organosilanen bei der Herstellung von aminofunktionellen Organoalkoxysilanen |
DE10143568C2 (de) * | 2001-09-05 | 2003-07-03 | Degussa | Verfahren zur Behandlung von Aminosilanverfärbungen |
US6452033B1 (en) * | 2002-02-11 | 2002-09-17 | Dow Corning Corporation | Method of making N-[2-aminoethyl] aminoalkylalkoxysilanes with ethyenediamine salt recycle |
DE10353063B4 (de) | 2003-11-13 | 2006-03-02 | Wacker-Chemie Gmbh | Verfahren zur Herstellung von (N-Organylaminoorganyl)- und (N,N-Diorganylaminoorganyl)triorganylsilanen sowie (N-Cyclohexylaminomethyl)trimethoxysilan und [N,N-Bis-(N',N'-dimethylaminopropyl)aminomethyl]triorganylsilan erhältliche mittels dieses Verfahrens |
DE102004008442A1 (de) * | 2004-02-19 | 2005-09-15 | Degussa Ag | Siliciumverbindungen für die Erzeugung von SIO2-haltigen Isolierschichten auf Chips |
DE102004025766A1 (de) * | 2004-05-26 | 2005-12-22 | Degussa Ag | Herstellung von Organosilanestern |
DE102004037675A1 (de) * | 2004-08-04 | 2006-03-16 | Degussa Ag | Verfahren und Vorrichtung zur Reinigung von Wasserstoffverbindungen enthaltendem Siliciumtetrachlorid oder Germaniumtetrachlorid |
DE102004060627A1 (de) * | 2004-12-16 | 2006-07-06 | Wacker Chemie Ag | Verfahren zur kontinuierlichen Herstellung von Amino-Gruppen tragenden Silicium-Verbindungen |
US9312557B2 (en) * | 2005-05-11 | 2016-04-12 | Schlumberger Technology Corporation | Fuel cell apparatus and method for downhole power systems |
DE102005041137A1 (de) * | 2005-08-30 | 2007-03-01 | Degussa Ag | Reaktor, Anlage und großtechnisches Verfahren zur kontinuierlichen Herstellung von hochreinem Siliciumtetrachlorid oder hochreinem Germaniumtetrachlorid |
DE102006003464A1 (de) * | 2006-01-25 | 2007-07-26 | Degussa Gmbh | Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung |
US7750173B2 (en) * | 2007-01-18 | 2010-07-06 | Advanced Technology Materials, Inc. | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films |
DE102007007874A1 (de) | 2007-02-14 | 2008-08-21 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Silane |
DE102007014107A1 (de) * | 2007-03-21 | 2008-09-25 | Evonik Degussa Gmbh | Aufarbeitung borhaltiger Chlorsilanströme |
DE102007037193A1 (de) * | 2007-08-07 | 2009-02-12 | Wacker Chemie Ag | Verfahren zur Herstellung von Aminoorganosilanen |
DE102007050199A1 (de) * | 2007-10-20 | 2009-04-23 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus anorganischen Silanen |
DE102007050573A1 (de) * | 2007-10-23 | 2009-04-30 | Evonik Degussa Gmbh | Großgebinde zur Handhabung und für den Transport von hochreinen und ultra hochreinen Chemikalien |
DE102007059170A1 (de) * | 2007-12-06 | 2009-06-10 | Evonik Degussa Gmbh | Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen |
DE102008004396A1 (de) * | 2008-01-14 | 2009-07-16 | Evonik Degussa Gmbh | Anlage und Verfahren zur Verminderung des Gehaltes von Elementen, wie Bor, in Halogensilanen |
DE102008002181A1 (de) * | 2008-06-03 | 2009-12-10 | Evonik Degussa Gmbh | Verfahren zur wässrigen Aufarbeitung eines Ammoniumhalogenide und/oder organische Aminhydrohalogenide enthaltenden aminofunktionellen Organosilans |
DE102008002183A1 (de) | 2008-06-03 | 2009-12-10 | Evonik Degussa Gmbh | Verfahren zur Aufarbeitung salzhaltiger Rückstände aus der Herstellung von aminofunktionellen Organosilanen |
DE102008002182A1 (de) * | 2008-06-03 | 2009-12-10 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Alkylaminoalkylalkoxysilanen |
DE102008002537A1 (de) * | 2008-06-19 | 2009-12-24 | Evonik Degussa Gmbh | Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens |
DE102008054537A1 (de) * | 2008-12-11 | 2010-06-17 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration |
DE102009026755A1 (de) | 2009-06-04 | 2010-12-09 | Wacker Chemie Ag | Verfahren zur Herstellung von Aminoorganosilanen |
JP2012136472A (ja) * | 2010-12-27 | 2012-07-19 | Shin-Etsu Chemical Co Ltd | 精製アミノシランの製造方法 |
DE102011006053A1 (de) | 2011-03-24 | 2012-09-27 | Evonik Degussa Gmbh | Verfahren zur Dechlorierung von alkylfunktionellen Organosilanen und alkylfunktionellen Organosiloxanen |
US9337018B2 (en) * | 2012-06-01 | 2016-05-10 | Air Products And Chemicals, Inc. | Methods for depositing films with organoaminodisilane precursors |
DE102012221170A1 (de) | 2012-11-20 | 2014-05-22 | Evonik Industries Ag | Verfahren zur Tiefenimprägnierung von mineralischen Substraten und Verwendung von Organosilanen und/oder Organosilxanen zur Tiefenimprägnierung von mineralischen Substraten |
CN103880875B (zh) * | 2012-12-19 | 2017-04-05 | 张家港市国泰华荣化工新材料有限公司 | 一种固砂偶联剂的制备方法 |
CN103333200B (zh) * | 2013-07-22 | 2015-08-12 | 荆州市江汉精细化工有限公司 | 一种正丁基氨丙基三烷氧基硅烷的合成方法 |
JP7077966B2 (ja) * | 2019-01-07 | 2022-05-31 | 信越化学工業株式会社 | アミノ基含有有機ケイ素化合物の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2521399A1 (de) * | 1975-05-14 | 1976-11-25 | Bayer Ag | Verfahren zur herstellung von aminoalkylsilanen |
EP0464819B1 (en) * | 1990-07-05 | 1996-01-24 | OSi Specialties, Inc. | Reducing halide contamination in alkoxy silanes |
JP2552950B2 (ja) * | 1990-11-13 | 1996-11-13 | 信越化学工業株式会社 | アルコキシシランの製造方法 |
DE4130643A1 (de) * | 1991-09-14 | 1993-03-18 | Degussa | Verfahren zur reinigung von alkoxysilanen |
US5210254A (en) * | 1992-03-31 | 1993-05-11 | Union Carbide Chemicals & Plastics Technology Corporation | Acidic halide neutralization in alkoxysilanes |
-
1995
- 1995-07-14 EP EP95111038A patent/EP0702017B1/de not_active Expired - Lifetime
- 1995-08-16 CZ CZ952092A patent/CZ209295A3/cs unknown
- 1995-08-25 SK SK1056-95A patent/SK105695A3/sk unknown
- 1995-09-11 JP JP7232897A patent/JPH0881478A/ja not_active Abandoned
- 1995-09-14 NO NO953636A patent/NO304554B1/no not_active IP Right Cessation
- 1995-09-14 US US08/527,873 patent/US5616755A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5616755A (en) | 1997-04-01 |
JPH0881478A (ja) | 1996-03-26 |
NO953636L (no) | 1996-03-15 |
EP0702017B1 (de) | 2001-11-14 |
EP0702017A1 (de) | 1996-03-20 |
SK105695A3 (en) | 1996-04-03 |
NO304554B1 (no) | 1999-01-11 |
CZ209295A3 (en) | 1996-04-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NO953636D0 (no) | Fremgangsmåte til fremstilling av kloridfattige eller kloridfrie aminofunksjonelle organosilaner | |
NO950760D0 (no) | Fremgangsmåte for fremstilling av alkylhalosilaner | |
NO306815B1 (no) | Fremgangsmåte ved fremstilling av siliciumkarbid | |
NO962391D0 (no) | Fremgangsmåte til fremstilling av alkylhydrogensilaner | |
DE69618703T2 (de) | Verfahren zur Herstellung von Polysiloxanen | |
NO971540D0 (no) | Fremgangsmåte for fremstilling av oligoaminer eller polyaminer | |
NO20000189D0 (no) | Fremgangsmåte for fremstilling av heparine | |
NO972402D0 (no) | Fremgangsmåte for fremstilling av bærere | |
NO972240D0 (no) | Fremgangsmåte ved fremstilling av N-fosfonometylglycin | |
NO950902L (no) | Fremgangsmåte for fremstilling av metylklorsilaner | |
NO993949D0 (no) | FremgangsmÕte for fremstilling av substituert tiazolidindion | |
NO993912L (no) | FremgangsmÕte for fremstilling av eprosartan | |
NO304110B1 (no) | FremgangsmÕte for fremstilling av glutardialdehyd | |
NO993913D0 (no) | Fremgangsmåte for fremstilling av eprosartan | |
NO20012470D0 (no) | Fremgangsmåte for fremstilling av 1-substituerte 5- eller 3- hydroksypyrazoler | |
NO934154L (no) | Framgangsmåte for framstilling av alkyl-halosilaner | |
NO975429D0 (no) | Fremgangsmåte for fremstilling av ruthenium (III) acetatopplösning | |
NO982503D0 (no) | FremgangsmÕte ved fremstilling av dioksoazabicykloheksaner | |
NO972682D0 (no) | Ny fremgangsmåte for fremstilling av sameridin | |
NO304883B1 (no) | FremgangsmÕte ved fremstilling av hydrazin-nitroform | |
NO962292D0 (no) | Framgangsmåte for framstilling av acylhalid eller sulfonyhalid | |
NO20001793L (no) | FremgangsmÕte ved fremstilling av azacykloalkylalkanoylpseudotetrapeptider | |
NO953402L (no) | Fremgangsmåte for fremstilling av nitrosamin-frie silikonartikler | |
DE59509834D1 (de) | Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen | |
NO953459L (no) | Fremgangsmåte ved fremstilling av cykloheptimidazolderivater |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM1K | Lapsed by not paying the annual fees |
Free format text: LAPSED IN MARCH 2002 |