NO870646D0 - Kjemikaliepaafyllingssystem. - Google Patents

Kjemikaliepaafyllingssystem.

Info

Publication number
NO870646D0
NO870646D0 NO1987870646A NO870646A NO870646D0 NO 870646 D0 NO870646 D0 NO 870646D0 NO 1987870646 A NO1987870646 A NO 1987870646A NO 870646 A NO870646 A NO 870646A NO 870646 D0 NO870646 D0 NO 870646D0
Authority
NO
Norway
Prior art keywords
reservoir
kjemikaliepaafyllingssystem
bubbler
purged
pressurized
Prior art date
Application number
NO1987870646A
Other languages
English (en)
Norwegian (no)
Other versions
NO870646L (no
Inventor
Bruce A Lipisko
John C Schumacher
Richard E Howard
Peter T Randtke
Adrian Sandu
Robert E Fletcher
Hans-Juergen Graf
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of NO870646L publication Critical patent/NO870646L/no
Publication of NO870646D0 publication Critical patent/NO870646D0/no

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561Gas plumbing upstream of the reaction chamber
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16Feed and outlet means for the gases; Modifying the flow of the gases
    • C30B31/165Diffusion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Paper (AREA)
  • Fluid-Driven Valves (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cultivation Of Plants (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Detergent Compositions (AREA)
  • Fats And Perfumes (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
NO1987870646A 1985-06-21 1987-02-18 Kjemikaliepaafyllingssystem. NO870646D0 (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US1985/001100 WO1986007615A1 (en) 1985-06-21 1985-06-21 Chemical refill system

Publications (2)

Publication Number Publication Date
NO870646L NO870646L (no) 1987-02-18
NO870646D0 true NO870646D0 (no) 1987-02-18

Family

ID=22188721

Family Applications (1)

Application Number Title Priority Date Filing Date
NO1987870646A NO870646D0 (no) 1985-06-21 1987-02-18 Kjemikaliepaafyllingssystem.

Country Status (9)

Country Link
EP (1) EP0229050B1 (cs)
JP (1) JPS63500030A (cs)
AT (1) ATE50803T1 (cs)
AU (2) AU578297B2 (cs)
DE (1) DE3576372D1 (cs)
DK (1) DK88287A (cs)
FI (1) FI870727L (cs)
NO (1) NO870646D0 (cs)
WO (1) WO1986007615A1 (cs)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4047408A (en) * 1975-12-08 1977-09-13 Johns Eddie D Lock mechanism
JPH04338227A (ja) * 1991-05-15 1992-11-25 Nec Kyushu Ltd ガス供給装置
US5551309A (en) * 1995-01-17 1996-09-03 Olin Corporation Computer-controlled chemical dispensing with alternative operating modes
DE69837289T2 (de) * 1997-07-11 2007-11-08 Advanced Technology Materials, Inc., Danbury Vorrichtung zur Förderung von Chemischen Wirkstoffen
JP5346620B2 (ja) * 1997-07-11 2013-11-20 アドバンスト テクノロジー マテリアルズ,インコーポレイテッド バルク化学物質供給システム
CN101723299B (zh) * 2008-10-27 2013-04-17 中芯国际集成电路制造(上海)有限公司 四乙羟基硅再灌注系统及其净化方法
CN103635990B (zh) 2011-05-28 2016-11-16 恩特格里斯公司 具有净化能力的可再填充的安瓿
US20150259797A1 (en) * 2014-03-17 2015-09-17 Jiangsu Nata Opto-electronic Material Co., Ltd. Liquid-Metal Organic Compound Supply System
CN109200968A (zh) * 2018-11-07 2019-01-15 魏贵英 一种全自动化工反应釜
KR20250040045A (ko) 2022-08-12 2025-03-21 젤리스트 인코퍼레이티드 불포화 치환기를 함유하는 고순도 주석 화합물 및 이의 제조 방법
CN119998302A (zh) 2022-10-04 2025-05-13 盖列斯特有限公司 环状氮杂锡烷和环状氧杂锡烷化合物及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1263883A (fr) * 1960-04-28 1961-06-19 Commissariat Energie Atomique Perfectionnement aux dispositifs de jonction de tubes destinés au passage de liquide ne devant pas être mis au contact de l'atmosphère
US3658304A (en) * 1970-05-11 1972-04-25 Anchor Hocking Corp Means for vapor coating
US3827455A (en) * 1973-09-06 1974-08-06 Dow Chemical Co Self-sealing system for storing and dispensing a fluid material
US4134514A (en) * 1976-12-02 1979-01-16 J C Schumacher Co. Liquid source material container and method of use for semiconductor device manufacturing
US4235829A (en) * 1979-05-07 1980-11-25 Western Electric Company, Inc. Vapor delivery system and method of maintaining a constant level of liquid therein

Also Published As

Publication number Publication date
AU2855489A (en) 1989-05-04
NO870646L (no) 1987-02-18
ATE50803T1 (de) 1990-03-15
AU4496985A (en) 1987-01-13
FI870727A7 (fi) 1987-02-20
AU578297B2 (en) 1988-10-20
FI870727A0 (fi) 1987-02-20
JPH0553760B2 (cs) 1993-08-10
FI870727L (fi) 1987-02-20
DK88287A (da) 1987-02-20
EP0229050B1 (en) 1990-03-07
AU592048B2 (en) 1989-12-21
DE3576372D1 (de) 1990-04-12
JPS63500030A (ja) 1988-01-07
WO1986007615A1 (en) 1986-12-31
EP0229050A1 (en) 1987-07-22

Similar Documents

Publication Publication Date Title
ES8705240A1 (es) Dispositivo osmotico para la administracion controlada de unagente benefico a un ambiente de utilizacion
NO870646D0 (no) Kjemikaliepaafyllingssystem.
DE68900943D1 (de) Demontierbarer druckbehaelter.
DE58900330D1 (de) Foerdervorrichtung zur versorgung eines beatmungsgeraetes mit atemgas.
DE69005765D1 (de) Druckgasgefäss mit kontrollierter Gasabgabe.
ES510556A0 (es) "deposito para gas licuado, especialmente para metano licuado".
DK162830C (da) Pumpestander til tankstationer
IT8820830A0 (it) Tappo serbatoio per polveri.
EP0052150A4 (en) PUMP FOR LIQUID FUELS.
DE69015783D1 (de) Kraftstoffzufuhrschlauch.
IT1231830B (it) Un dispositivo per il rifornimento di tubetti tessili.
DE3675650D1 (de) Hochdruck-gasfuellventil fuer einen druckfesten behaelter.
IT7967890A0 (it) Dispositivo per limitare l'erogazio ne di gas in un accendino a gas liquefatto
NO875211D0 (no) Drivgassloes skumavleveringsinnretning.
IT8153910U1 (it) Bocchettone per serbatoi carburante.
IT8747644A0 (it) Soffiante per fluido gassoso, in particolare combustibile
DE3766452D1 (de) Als gasdruck-behaelter ausgefuehrtes flaschenfoermiges geraet.
DE3869161D1 (de) Gaslieferungseinheit.
FR2661230B1 (fr) Reservoir de liquide maintenu sous pression par un gaz.
IT8623921V0 (it) Ricarica per un vaporizzatore per profumo.
NO904686D0 (no) Gasstank.
IT8819744A0 (it) Serbatoio per trasporto di fluidi, particolarmente gas.
IT8321176A0 (it) Dispositivo erogatore d'aria per un autorespiratore.
IT8163286V0 (it) Dispositivo di aggancio-sgancio, particolarmente utile per l'uso in un congegno di articolazione peranta-ribalta.
IT8820831A0 (it) Tappo serbatoio per polveri.