ATE50803T1 - Chemisches ersatzfuellsystem. - Google Patents

Chemisches ersatzfuellsystem.

Info

Publication number
ATE50803T1
ATE50803T1 AT85903147T AT85903147T ATE50803T1 AT E50803 T1 ATE50803 T1 AT E50803T1 AT 85903147 T AT85903147 T AT 85903147T AT 85903147 T AT85903147 T AT 85903147T AT E50803 T1 ATE50803 T1 AT E50803T1
Authority
AT
Austria
Prior art keywords
filling system
chemical replacement
replacement filling
reservoir
chemical
Prior art date
Application number
AT85903147T
Other languages
English (en)
Inventor
Bruce A Lipisko
John C Schumacher
Richard E Howard
Peter T Randtke
Adrian Sandu
Robert E Fletcher
Hans-Juergen Graf
Original Assignee
Schumacher Co J C
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schumacher Co J C filed Critical Schumacher Co J C
Application granted granted Critical
Publication of ATE50803T1 publication Critical patent/ATE50803T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
    • C30B31/165—Diffusion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Paper (AREA)
  • Fluid-Driven Valves (AREA)
  • Chemical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Detergent Compositions (AREA)
  • Fats And Perfumes (AREA)
  • Cultivation Of Plants (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
AT85903147T 1985-06-21 1985-06-21 Chemisches ersatzfuellsystem. ATE50803T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/US1985/001100 WO1986007615A1 (en) 1985-06-21 1985-06-21 Chemical refill system
EP85903147A EP0229050B1 (de) 1985-06-21 1985-06-21 Chemisches ersatzfüllsystem

Publications (1)

Publication Number Publication Date
ATE50803T1 true ATE50803T1 (de) 1990-03-15

Family

ID=22188721

Family Applications (1)

Application Number Title Priority Date Filing Date
AT85903147T ATE50803T1 (de) 1985-06-21 1985-06-21 Chemisches ersatzfuellsystem.

Country Status (9)

Country Link
EP (1) EP0229050B1 (de)
JP (1) JPS63500030A (de)
AT (1) ATE50803T1 (de)
AU (2) AU578297B2 (de)
DE (1) DE3576372D1 (de)
DK (1) DK88287A (de)
FI (1) FI870727A0 (de)
NO (1) NO870646L (de)
WO (1) WO1986007615A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4047408A (en) * 1975-12-08 1977-09-13 Johns Eddie D Lock mechanism
JPH04338227A (ja) * 1991-05-15 1992-11-25 Nec Kyushu Ltd ガス供給装置
US5551309A (en) * 1995-01-17 1996-09-03 Olin Corporation Computer-controlled chemical dispensing with alternative operating modes
JP5346620B2 (ja) * 1997-07-11 2013-11-20 アドバンスト テクノロジー マテリアルズ，インコーポレイテッド バルク化学物質供給システム
JP4364425B2 (ja) * 1997-07-11 2009-11-18 アドバンスト テクノロジー マテリアルズ，インコーポレイテッド バルク化学物質供給システム
CN101723299B (zh) * 2008-10-27 2013-04-17 中芯国际集成电路制造(上海)有限公司 四乙羟基硅再灌注系统及其净化方法
CN103635990B (zh) 2011-05-28 2016-11-16 恩特格里斯公司 具有净化能力的可再填充的安瓿
US20150259797A1 (en) * 2014-03-17 2015-09-17 Jiangsu Nata Opto-electronic Material Co., Ltd. Liquid-Metal Organic Compound Supply System
CN109200968A (zh) * 2018-11-07 2019-01-15 魏贵英 一种全自动化工反应釜
US12060377B2 (en) 2022-08-12 2024-08-13 Gelest, Inc. High purity tin compounds containing unsaturated substituent and method for preparation thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1263883A (fr) * 1960-04-28 1961-06-19 Commissariat Energie Atomique Perfectionnement aux dispositifs de jonction de tubes destinés au passage de liquide ne devant pas être mis au contact de l'atmosphère
US3658304A (en) * 1970-05-11 1972-04-25 Anchor Hocking Corp Means for vapor coating
US3827455A (en) * 1973-09-06 1974-08-06 Dow Chemical Co Self-sealing system for storing and dispensing a fluid material
US4134514A (en) * 1976-12-02 1979-01-16 J C Schumacher Co. Liquid source material container and method of use for semiconductor device manufacturing
US4235829A (en) * 1979-05-07 1980-11-25 Western Electric Company, Inc. Vapor delivery system and method of maintaining a constant level of liquid therein

Also Published As

Publication number Publication date
FI870727A (fi) 1987-02-20
NO870646D0 (no) 1987-02-18
EP0229050B1 (de) 1990-03-07
FI870727A0 (fi) 1987-02-20
DE3576372D1 (de) 1990-04-12
EP0229050A1 (de) 1987-07-22
AU4496985A (en) 1987-01-13
AU2855489A (en) 1989-05-04
NO870646L (no) 1987-02-18
JPS63500030A (ja) 1988-01-07
AU578297B2 (en) 1988-10-20
DK88287A (da) 1987-02-20
WO1986007615A1 (en) 1986-12-31
JPH0553760B2 (de) 1993-08-10
AU592048B2 (en) 1989-12-21

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties