NO810299L - Fremkaller. - Google Patents
Fremkaller.Info
- Publication number
- NO810299L NO810299L NO810299A NO810299A NO810299L NO 810299 L NO810299 L NO 810299L NO 810299 A NO810299 A NO 810299A NO 810299 A NO810299 A NO 810299A NO 810299 L NO810299 L NO 810299L
- Authority
- NO
- Norway
- Prior art keywords
- acid
- developer
- salt
- carboxylic acid
- radiation
- Prior art date
Links
- 230000005855 radiation Effects 0.000 claims abstract description 30
- 150000003839 salts Chemical class 0.000 claims abstract description 24
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 claims abstract description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 6
- 239000002253 acid Substances 0.000 claims description 14
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 10
- 239000000243 solution Substances 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 6
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 claims description 4
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 claims description 4
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 claims description 4
- 239000002736 nonionic surfactant Substances 0.000 claims description 3
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 claims description 2
- 239000005711 Benzoic acid Substances 0.000 claims description 2
- 235000010233 benzoic acid Nutrition 0.000 claims description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 2
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 claims description 2
- DUWWHGPELOTTOE-UHFFFAOYSA-N n-(5-chloro-2,4-dimethoxyphenyl)-3-oxobutanamide Chemical compound COC1=CC(OC)=C(NC(=O)CC(C)=O)C=C1Cl DUWWHGPELOTTOE-UHFFFAOYSA-N 0.000 claims description 2
- 235000019260 propionic acid Nutrition 0.000 claims description 2
- 235000010199 sorbic acid Nutrition 0.000 claims description 2
- 239000004334 sorbic acid Substances 0.000 claims description 2
- 229940075582 sorbic acid Drugs 0.000 claims description 2
- 239000000411 inducer Substances 0.000 claims 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 claims 2
- AWQSAIIDOMEEOD-UHFFFAOYSA-N 5,5-Dimethyl-4-(3-oxobutyl)dihydro-2(3H)-furanone Chemical compound CC(=O)CCC1CC(=O)OC1(C)C AWQSAIIDOMEEOD-UHFFFAOYSA-N 0.000 claims 1
- 229940005605 valeric acid Drugs 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 abstract description 10
- 239000006260 foam Substances 0.000 abstract description 9
- 239000011347 resin Substances 0.000 abstract description 9
- 229920005989 resin Polymers 0.000 abstract description 9
- 239000003960 organic solvent Substances 0.000 abstract description 7
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 150000001875 compounds Chemical class 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000000463 material Substances 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 8
- 239000007795 chemical reaction product Substances 0.000 description 8
- 229910052708 sodium Inorganic materials 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- 125000001931 aliphatic group Chemical class 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000007859 condensation product Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 5
- WXMKPNITSTVMEF-UHFFFAOYSA-M sodium benzoate Chemical compound [Na+].[O-]C(=O)C1=CC=CC=C1 WXMKPNITSTVMEF-UHFFFAOYSA-M 0.000 description 5
- 239000004299 sodium benzoate Substances 0.000 description 5
- 235000010234 sodium benzoate Nutrition 0.000 description 5
- QFMDFTQOJHFVNR-UHFFFAOYSA-N 1-[2,2-dichloro-1-(4-ethylphenyl)ethyl]-4-ethylbenzene Chemical compound C1=CC(CC)=CC=C1C(C(Cl)Cl)C1=CC=C(CC)C=C1 QFMDFTQOJHFVNR-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 238000005187 foaming Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- -1 alkali metal salt Chemical class 0.000 description 3
- 239000012736 aqueous medium Substances 0.000 description 3
- 159000000032 aromatic acids Chemical class 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-M bisulphate group Chemical group S([O-])(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-M 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- BYKRNSHANADUFY-UHFFFAOYSA-M sodium octanoate Chemical compound [Na+].CCCCCCCC([O-])=O BYKRNSHANADUFY-UHFFFAOYSA-M 0.000 description 3
- 159000000000 sodium salts Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 description 3
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 2
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 240000007930 Oxalis acetosella Species 0.000 description 2
- 235000008098 Oxalis acetosella Nutrition 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229920002257 Plurafac® Polymers 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical class OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 230000003254 anti-foaming effect Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- 239000002563 ionic surfactant Substances 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 2
- 239000004300 potassium benzoate Substances 0.000 description 2
- 235000010235 potassium benzoate Nutrition 0.000 description 2
- 229940103091 potassium benzoate Drugs 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000012047 saturated solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- HMAMGXMFMCAOPV-UHFFFAOYSA-N 1-propylnaphthalene Chemical compound C1=CC=C2C(CCC)=CC=CC2=C1 HMAMGXMFMCAOPV-UHFFFAOYSA-N 0.000 description 1
- SPXOTSHWBDUUMT-UHFFFAOYSA-N 138-42-1 Chemical compound OS(=O)(=O)C1=CC=C([N+]([O-])=O)C=C1 SPXOTSHWBDUUMT-UHFFFAOYSA-N 0.000 description 1
- LXFQSRIDYRFTJW-UHFFFAOYSA-N 2,4,6-trimethylbenzenesulfonic acid Chemical compound CC1=CC(C)=C(S(O)(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- 239000004386 Erythritol Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- NHRPUYSGVMBLNP-UHFFFAOYSA-N N-phenylaniline phosphoric acid Chemical compound OP(O)(O)=O.C=1C=CC=CC=1NC1=CC=CC=C1 NHRPUYSGVMBLNP-UHFFFAOYSA-N 0.000 description 1
- FNZSVEHJZREFPF-ZETCQYMHSA-N Nonate Chemical compound CCCCC[C@H](C(O)=O)CC(O)=O FNZSVEHJZREFPF-ZETCQYMHSA-N 0.000 description 1
- 239000004283 Sodium sorbate Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 235000013832 Valeriana officinalis Nutrition 0.000 description 1
- 244000126014 Valeriana officinalis Species 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical compound OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 description 1
- 229940009714 erythritol Drugs 0.000 description 1
- 235000019414 erythritol Nutrition 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LPNBBFKOUUSUDB-UHFFFAOYSA-N p-toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 description 1
- 239000002304 perfume Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- YOSXTSJZQNTKKX-UHFFFAOYSA-M potassium;heptanoate Chemical compound [K+].CCCCCCC([O-])=O YOSXTSJZQNTKKX-UHFFFAOYSA-M 0.000 description 1
- RLEFZEWKMQQZOA-UHFFFAOYSA-M potassium;octanoate Chemical compound [K+].CCCCCCCC([O-])=O RLEFZEWKMQQZOA-UHFFFAOYSA-M 0.000 description 1
- HIURFGKIUTXLCT-UHFFFAOYSA-N propyl naphthalene-1-sulfonate Chemical group C1=CC=C2C(S(=O)(=O)OCCC)=CC=CC2=C1 HIURFGKIUTXLCT-UHFFFAOYSA-N 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- JXKPEJDQGNYQSM-UHFFFAOYSA-M sodium propionate Chemical compound [Na+].CCC([O-])=O JXKPEJDQGNYQSM-UHFFFAOYSA-M 0.000 description 1
- 239000004324 sodium propionate Substances 0.000 description 1
- 235000010334 sodium propionate Nutrition 0.000 description 1
- 229960003212 sodium propionate Drugs 0.000 description 1
- LROWVYNUWKVTCU-STWYSWDKSA-M sodium sorbate Chemical compound [Na+].C\C=C\C=C\C([O-])=O LROWVYNUWKVTCU-STWYSWDKSA-M 0.000 description 1
- 235000019250 sodium sorbate Nutrition 0.000 description 1
- NHQVTOYJPBRYNG-UHFFFAOYSA-M sodium;2,4,7-tri(propan-2-yl)naphthalene-1-sulfonate Chemical compound [Na+].CC(C)C1=CC(C(C)C)=C(S([O-])(=O)=O)C2=CC(C(C)C)=CC=C21 NHQVTOYJPBRYNG-UHFFFAOYSA-M 0.000 description 1
- VYPDUQYOLCLEGS-UHFFFAOYSA-M sodium;2-ethylhexanoate Chemical compound [Na+].CCCCC(CC)C([O-])=O VYPDUQYOLCLEGS-UHFFFAOYSA-M 0.000 description 1
- HHGDLPTYJQQMKT-UHFFFAOYSA-M sodium;4-nitrobenzenesulfonate Chemical compound [Na+].[O-][N+](=O)C1=CC=C(S([O-])(=O)=O)C=C1 HHGDLPTYJQQMKT-UHFFFAOYSA-M 0.000 description 1
- LHYPLJGBYPAQAK-UHFFFAOYSA-M sodium;pentanoate Chemical compound [Na+].CCCCC([O-])=O LHYPLJGBYPAQAK-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 235000016788 valerian Nutrition 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Developing Agents For Electrophotography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Medicines Containing Material From Animals Or Micro-Organisms (AREA)
- Electrotherapy Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8002934 | 1980-01-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
NO810299L true NO810299L (no) | 1981-07-30 |
Family
ID=10510965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO810299A NO810299L (no) | 1980-01-29 | 1981-01-28 | Fremkaller. |
Country Status (19)
Country | Link |
---|---|
US (1) | US4350756A (fr) |
EP (1) | EP0033232B2 (fr) |
AT (1) | ATE7823T1 (fr) |
AU (1) | AU543918B2 (fr) |
BR (1) | BR8100520A (fr) |
CA (1) | CA1165610A (fr) |
DE (1) | DE3162627D1 (fr) |
DK (1) | DK160848C (fr) |
ES (1) | ES8204348A1 (fr) |
FI (1) | FI72395C (fr) |
GB (1) | GB2068136B (fr) |
HU (1) | HU187293B (fr) |
IE (1) | IE50592B1 (fr) |
KE (1) | KE3465A (fr) |
MW (1) | MW481A1 (fr) |
NO (1) | NO810299L (fr) |
NZ (1) | NZ196110A (fr) |
ZA (1) | ZA81518B (fr) |
ZW (1) | ZW1781A1 (fr) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3100259A1 (de) * | 1981-01-08 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten |
DE3140186A1 (de) * | 1981-10-09 | 1983-04-28 | Hoechst Ag, 6230 Frankfurt | Entwickler und verfahren zum entwickeln fuer belichtete negativ-arbeitende reproduktionsschichten |
US4436807A (en) | 1982-07-15 | 1984-03-13 | American Hoechst Corporation | Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material |
US4824769A (en) * | 1984-10-15 | 1989-04-25 | Allied Corporation | High contrast photoresist developer |
DE3439597A1 (de) * | 1984-10-30 | 1986-04-30 | Hoechst Ag, 6230 Frankfurt | Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers |
GB2167572A (en) * | 1984-11-23 | 1986-05-29 | Colin George Thompson | Photo mechanical imaging |
US4786582A (en) * | 1985-08-02 | 1988-11-22 | Hoechst Celanese Corporation | Organic solvent free developer for photosensitive coatings |
US4714670A (en) * | 1986-06-09 | 1987-12-22 | Imperial Metal & Chemical Company | Developer including an aliphatic cyclic carbonate in the oil phase emulsion |
US4780396A (en) * | 1987-02-17 | 1988-10-25 | Hoechst Celanese Corporation | Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant |
US4851324A (en) * | 1987-07-27 | 1989-07-25 | Hoechst Celanese Corporation | Phenoxy propanol containing developer compositions for lithographic plates having neutral pH |
US5081003A (en) * | 1987-07-27 | 1992-01-14 | Hoechst Celanese Corporation | Developer compositions for newspaper plates |
US4912021A (en) * | 1988-02-03 | 1990-03-27 | Hoechst Celanese Corporation | Developer-finisher compositions for lithographic plates |
US4873174A (en) * | 1988-02-03 | 1989-10-10 | Hoechst Celanese Corporation | Method of using developer-finisher compositions for lithographic plates |
US5278030A (en) * | 1988-10-24 | 1994-01-11 | Du Pont-Howson Limited | Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12 |
GB8918161D0 (en) * | 1989-08-09 | 1989-09-20 | Du Pont | Improvements in or relating to radiation sensitive compounds |
US5122438A (en) * | 1989-11-02 | 1992-06-16 | Konica Corporation | Method for developing a waterless light-sensitive lithographic plate |
US5316892A (en) * | 1992-07-23 | 1994-05-31 | Eastman Kodak Company | Method for developing lithographic printing plates |
US5279927A (en) * | 1992-07-23 | 1994-01-18 | Eastman Kodak Company | Aqueous developer for lithographic printing plates with improved desensitizing capability |
EP0602736B1 (fr) * | 1992-12-17 | 1997-11-05 | Eastman Kodak Company | Développateur aqueux pour des plaques lithographiques pour diminution de formation de boue |
US5380623A (en) * | 1992-12-17 | 1995-01-10 | Eastman Kodak Company | Aqueous developer for lithographic printing plates which provides improved oleophilicity |
US5582964A (en) * | 1994-04-14 | 1996-12-10 | Fuji Photo Film Co., Ltd. | Photographic material having a syndiotactic styrenic polymer containing support |
EP0732628A1 (fr) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Solution alkaline aqueuse pour le développement des plaques offset |
US6383717B1 (en) | 2000-10-11 | 2002-05-07 | Kodak Polychrome Graphics, Llc | Aqueous developer for negative working lithographic printing plates |
US7316891B2 (en) * | 2002-03-06 | 2008-01-08 | Agfa Graphics Nv | Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution |
WO2005111727A1 (fr) * | 2004-05-19 | 2005-11-24 | Agfa-Gevaert | Procede de fabrication d'une plaque d'impression photopolymere |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE624160A (fr) * | 1961-10-30 | |||
GB1220808A (en) * | 1967-05-18 | 1971-01-27 | Howson Algraphy Ltd | Processing of presensitized photolithographic printing plate |
US3547632A (en) * | 1967-11-16 | 1970-12-15 | Eastman Kodak Co | Method of lithographic reproduction and solution to render image areas oleophilic |
DE1767384A1 (de) * | 1968-05-04 | 1971-11-18 | Henkel & Cie Gmbh | Schaumarme Spuel- und Reinigungsmittel fuer die Geschirreinigung |
US3707373A (en) * | 1969-03-17 | 1972-12-26 | Eastman Kodak Co | Lithographic plate developers |
US3745028A (en) * | 1971-04-26 | 1973-07-10 | Eastman Kodak Co | Lithographic plate desensitizer formulations |
US4147545A (en) * | 1972-11-02 | 1979-04-03 | Polychrome Corporation | Photolithographic developing composition with organic lithium compound |
US4055515A (en) * | 1975-12-31 | 1977-10-25 | Borden, Inc. | Developer for printing plates |
DE2925363C2 (de) * | 1978-06-23 | 1985-09-05 | Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa | Schutzmittel vom Emulsionstyp für die Oberfläche von lithographischen Druckplatten |
JPS5542890A (en) * | 1978-09-22 | 1980-03-26 | Fuji Photo Film Co Ltd | Desensitizing solution for lithographic printing |
US4287082A (en) * | 1980-02-22 | 1981-09-01 | The Procter & Gamble Company | Homogeneous enzyme-containing liquid detergent compositions containing saturated acids |
-
1981
- 1981-01-23 DE DE8181300301T patent/DE3162627D1/de not_active Expired
- 1981-01-23 GB GB8102097A patent/GB2068136B/en not_active Expired
- 1981-01-23 EP EP81300301A patent/EP0033232B2/fr not_active Expired
- 1981-01-23 AT AT81300301T patent/ATE7823T1/de not_active IP Right Cessation
- 1981-01-26 ZA ZA00810518A patent/ZA81518B/xx unknown
- 1981-01-26 NZ NZ196110A patent/NZ196110A/xx unknown
- 1981-01-27 FI FI810229A patent/FI72395C/fi not_active IP Right Cessation
- 1981-01-28 HU HU81186A patent/HU187293B/hu unknown
- 1981-01-28 ES ES498879A patent/ES8204348A1/es not_active Expired
- 1981-01-28 NO NO810299A patent/NO810299L/no unknown
- 1981-01-28 IE IE163/81A patent/IE50592B1/en not_active IP Right Cessation
- 1981-01-28 DK DK037881A patent/DK160848C/da not_active IP Right Cessation
- 1981-01-28 CA CA000369521A patent/CA1165610A/fr not_active Expired
- 1981-01-28 ZW ZW17/81A patent/ZW1781A1/xx unknown
- 1981-01-29 MW MW4/81A patent/MW481A1/xx unknown
- 1981-01-29 AU AU66699/81A patent/AU543918B2/en not_active Ceased
- 1981-01-29 BR BR8100520A patent/BR8100520A/pt unknown
- 1981-02-04 US US06/231,416 patent/US4350756A/en not_active Expired - Lifetime
-
1984
- 1984-10-05 KE KE3465A patent/KE3465A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
IE810163L (en) | 1981-07-29 |
CA1165610A (fr) | 1984-04-17 |
FI810229L (fi) | 1981-07-30 |
DE3162627D1 (en) | 1984-07-12 |
DK160848C (da) | 1991-10-07 |
ZA81518B (en) | 1982-02-24 |
FI72395C (fi) | 1987-05-11 |
AU6669981A (en) | 1981-08-06 |
EP0033232B1 (fr) | 1984-06-06 |
ES498879A0 (es) | 1982-05-01 |
IE50592B1 (en) | 1986-05-14 |
AU543918B2 (en) | 1985-05-09 |
DK37881A (da) | 1981-07-30 |
US4350756A (en) | 1982-09-21 |
ATE7823T1 (de) | 1984-06-15 |
EP0033232B2 (fr) | 1988-08-24 |
DK160848B (da) | 1991-04-22 |
ZW1781A1 (en) | 1981-12-09 |
ES8204348A1 (es) | 1982-05-01 |
GB2068136A (en) | 1981-08-05 |
EP0033232A1 (fr) | 1981-08-05 |
KE3465A (en) | 1984-11-09 |
BR8100520A (pt) | 1981-08-18 |
FI72395B (fi) | 1987-01-30 |
GB2068136B (en) | 1984-09-05 |
HU187293B (en) | 1985-12-28 |
MW481A1 (en) | 1982-07-14 |
NZ196110A (en) | 1983-06-17 |
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