NO130903B - - Google Patents
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- Publication number
- NO130903B NO130903B NO03659/70A NO365970A NO130903B NO 130903 B NO130903 B NO 130903B NO 03659/70 A NO03659/70 A NO 03659/70A NO 365970 A NO365970 A NO 365970A NO 130903 B NO130903 B NO 130903B
- Authority
- NO
- Norway
- Prior art keywords
- trichlorosilane
- chlorine
- hydrogen
- approx
- tetrachlorosilane
- Prior art date
Links
- 239000000203 mixture Substances 0.000 claims description 30
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 28
- 239000000460 chlorine Chemical group 0.000 claims description 28
- 229910052801 chlorine Chemical group 0.000 claims description 28
- 239000001257 hydrogen Substances 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 11
- 239000005046 Chlorosilane Substances 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- -1 hydrogen silanes Chemical class 0.000 claims description 5
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 36
- 239000005052 trichlorosilane Substances 0.000 description 36
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 18
- 239000000047 product Substances 0.000 description 17
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 15
- 229910000077 silane Inorganic materials 0.000 description 14
- 238000004821 distillation Methods 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 10
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 10
- 239000007789 gas Substances 0.000 description 8
- 150000004756 silanes Chemical class 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 238000009835 boiling Methods 0.000 description 4
- 238000005660 chlorination reaction Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000004880 explosion Methods 0.000 description 3
- 238000011835 investigation Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 150000001804 chlorine Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- POFAUXBEMGMSAV-UHFFFAOYSA-N [Si].[Cl] Chemical class [Si].[Cl] POFAUXBEMGMSAV-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005235 decoking Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 239000002552 dosage form Substances 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000002920 hazardous waste Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011814 protection agent Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- QHAHOIWVGZZELU-UHFFFAOYSA-N trichloro(trichlorosilyloxy)silane Chemical compound Cl[Si](Cl)(Cl)O[Si](Cl)(Cl)Cl QHAHOIWVGZZELU-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE1948911A DE1948911C3 (de) | 1969-09-27 | 1969-09-27 | Verfahren zur Entfernung von Hydrogensilanen aus Chlorsilanen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NO130903B true NO130903B (nl) | 1974-11-25 |
| NO130903C NO130903C (nl) | 1975-03-05 |
Family
ID=5746694
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO3659/70A NO130903C (nl) | 1969-09-27 | 1970-09-25 |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US3790459A (nl) |
| JP (1) | JPS4943199B1 (nl) |
| AT (1) | AT303070B (nl) |
| BE (1) | BE756657A (nl) |
| CA (1) | CA937026A (nl) |
| CH (1) | CH540197A (nl) |
| DE (1) | DE1948911C3 (nl) |
| DK (1) | DK131619C (nl) |
| FI (1) | FI50407C (nl) |
| FR (1) | FR2062686A5 (nl) |
| GB (1) | GB1298738A (nl) |
| NL (1) | NL167658C (nl) |
| NO (1) | NO130903C (nl) |
| SE (1) | SE361297B (nl) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3502367A1 (de) * | 1985-01-25 | 1986-07-31 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren zum entfernen von wasserstoff aus in siliziumtetrachlorid oder germaniumtetrachlorid geloesten wasserstoffhaltigen verbindungen |
| JPS6440301U (nl) * | 1987-08-29 | 1989-03-10 | ||
| DE3805282A1 (de) * | 1988-02-19 | 1989-08-31 | Wacker Chemitronic | Verfahren zur entfernung von n-dotierenden verunreinigungen aus bei der gasphasenabscheidung von silicium anfallenden fluessigen oder gasfoermigen stoffen |
| JP2867696B2 (ja) * | 1990-11-29 | 1999-03-08 | 信越化学工業株式会社 | 四塩化ケイ素の精製方法 |
| DE19616556A1 (de) * | 1996-04-25 | 1997-10-30 | Wacker Chemie Gmbh | Verfahren zur Stabilisierung von hydridischen Silanen |
-
0
- BE BE756657D patent/BE756657A/xx not_active IP Right Cessation
-
1969
- 1969-09-27 DE DE1948911A patent/DE1948911C3/de not_active Expired
-
1970
- 1970-09-22 CH CH1403070A patent/CH540197A/de not_active IP Right Cessation
- 1970-09-25 AT AT867470A patent/AT303070B/de not_active IP Right Cessation
- 1970-09-25 SE SE13088/70A patent/SE361297B/xx unknown
- 1970-09-25 NL NL7014170A patent/NL167658C/nl not_active IP Right Cessation
- 1970-09-25 NO NO3659/70A patent/NO130903C/no unknown
- 1970-09-25 CA CA094157A patent/CA937026A/en not_active Expired
- 1970-09-25 FR FR7034881A patent/FR2062686A5/fr not_active Expired
- 1970-09-25 DK DK489970A patent/DK131619C/da active
- 1970-09-25 GB GB45905/70A patent/GB1298738A/en not_active Expired
- 1970-09-25 FI FI702623A patent/FI50407C/fi active
- 1970-09-28 US US00076253A patent/US3790459A/en not_active Expired - Lifetime
- 1970-09-28 JP JP45084935A patent/JPS4943199B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DK131619B (da) | 1975-08-11 |
| FR2062686A5 (nl) | 1971-06-25 |
| DE1948911B2 (de) | 1978-06-01 |
| FI50407C (fi) | 1976-03-10 |
| CA937026A (en) | 1973-11-20 |
| US3790459A (en) | 1974-02-05 |
| CH540197A (de) | 1973-08-15 |
| JPS4943199B1 (nl) | 1974-11-19 |
| DE1948911C3 (de) | 1985-12-05 |
| AT303070B (de) | 1972-11-10 |
| DK131619C (da) | 1976-01-12 |
| DE1948911A1 (de) | 1971-04-15 |
| FI50407B (nl) | 1975-12-01 |
| NL7014170A (nl) | 1971-03-30 |
| NL167658B (nl) | 1981-08-17 |
| BE756657A (fr) | 1971-03-01 |
| NO130903C (nl) | 1975-03-05 |
| GB1298738A (en) | 1972-12-06 |
| NL167658C (nl) | 1982-01-18 |
| SE361297B (nl) | 1973-10-29 |
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