NO116664B - - Google Patents
Download PDFInfo
- Publication number
- NO116664B NO116664B NO16086265A NO16086265A NO116664B NO 116664 B NO116664 B NO 116664B NO 16086265 A NO16086265 A NO 16086265A NO 16086265 A NO16086265 A NO 16086265A NO 116664 B NO116664 B NO 116664B
- Authority
- NO
- Norway
- Prior art keywords
- baths
- carbon hydrogen
- galvanic
- tertiary amino
- carboxyl group
- Prior art date
Links
- 239000002184 metal Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- 230000002378 acidificating effect Effects 0.000 claims description 4
- 125000005842 heteroatom Chemical group 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 125000002015 acyclic group Chemical group 0.000 claims description 3
- 125000004429 atom Chemical group 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000001302 tertiary amino group Chemical group 0.000 claims description 3
- 150000001450 anions Chemical class 0.000 claims description 2
- 125000000623 heterocyclic group Chemical group 0.000 claims description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- XYZWMVYYUIMRIZ-UHFFFAOYSA-N 4-bromo-n,n-dimethylaniline Chemical compound CN(C)C1=CC=C(Br)C=C1 XYZWMVYYUIMRIZ-UHFFFAOYSA-N 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- YMDNODNLFSHHCV-UHFFFAOYSA-N 2-chloro-n,n-diethylethanamine Chemical compound CCN(CC)CCCl YMDNODNLFSHHCV-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 238000005246 galvanizing Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 238000005956 quaternization reaction Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- NJYFRQQXXXRJHK-UHFFFAOYSA-N (4-aminophenyl) thiocyanate Chemical compound NC1=CC=C(SC#N)C=C1 NJYFRQQXXXRJHK-UHFFFAOYSA-N 0.000 description 1
- WNRWEBKEQARBKV-UHFFFAOYSA-N 1-(2-chloroethyl)piperidine Chemical compound ClCCN1CCCCC1 WNRWEBKEQARBKV-UHFFFAOYSA-N 0.000 description 1
- OQRCDIPTOADXMP-UHFFFAOYSA-N 2-chloro-n,n-diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1Cl OQRCDIPTOADXMP-UHFFFAOYSA-N 0.000 description 1
- ZAPMTSHEXFEPSD-UHFFFAOYSA-N 4-(2-chloroethyl)morpholine Chemical compound ClCCN1CCOCC1 ZAPMTSHEXFEPSD-UHFFFAOYSA-N 0.000 description 1
- IONGEXNDPXANJD-UHFFFAOYSA-N 4-chloro-n,n-dimethylaniline Chemical compound CN(C)C1=CC=C(Cl)C=C1 IONGEXNDPXANJD-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004902 Softening Agent Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 125000005997 bromomethyl group Chemical group 0.000 description 1
- 125000002603 chloroethyl group Chemical group [H]C([*])([H])C([H])([H])Cl 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000003651 drinking water Substances 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- CJDICMLSLYHRPT-UHFFFAOYSA-N n,n-dimethyl-3-nitroaniline Chemical compound CN(C)C1=CC=CC([N+]([O-])=O)=C1 CJDICMLSLYHRPT-UHFFFAOYSA-N 0.000 description 1
- QJAIOCKFIORVFU-UHFFFAOYSA-N n,n-dimethyl-4-nitroaniline Chemical compound CN(C)C1=CC=C([N+]([O-])=O)C=C1 QJAIOCKFIORVFU-UHFFFAOYSA-N 0.000 description 1
- DBDNQNARCHWMSP-UHFFFAOYSA-N n-(2-chloroethyl)-n-ethylaniline Chemical compound ClCCN(CC)C1=CC=CC=C1 DBDNQNARCHWMSP-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- -1 tri-methyl-4-chlorophenyl-ammonium bromide Chemical compound 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NO16086265A NO116664B (enrdf_load_stackoverflow) | 1965-12-10 | 1965-12-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NO16086265A NO116664B (enrdf_load_stackoverflow) | 1965-12-10 | 1965-12-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO116664B true NO116664B (enrdf_load_stackoverflow) | 1969-04-28 |
Family
ID=19909380
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO16086265A NO116664B (enrdf_load_stackoverflow) | 1965-12-10 | 1965-12-10 |
Country Status (1)
| Country | Link |
|---|---|
| NO (1) | NO116664B (enrdf_load_stackoverflow) |
-
1965
- 1965-12-10 NO NO16086265A patent/NO116664B/no unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES2944135T3 (es) | Baño de galvanizado que contiene cromo trivalente y proceso para depositar cromo | |
| US2903403A (en) | Method of copper-plating metal surfaces | |
| ES2609384T3 (es) | Baño galvánico de electrodeposición de níquel o aleación de níquel para depositar un níquel semibrillante o aleación de níquel, método de electrodeposición y uso de tal baño y compuestos para el mismo | |
| NO127437B (enrdf_load_stackoverflow) | ||
| ITTO950840A1 (it) | Bagni alcalini elettrolitici e procedimenti per zinco e leghe di zinco | |
| US2842488A (en) | Process for the production of metal electrodeposits | |
| TW201402878A (zh) | 銅－鎳合金電鍍浴及電鍍方法 | |
| US3054733A (en) | Composition for the electrolytic deposition of well levelled and ductile nickel coatings of mirror-like luster | |
| NO131468B (enrdf_load_stackoverflow) | ||
| US2891871A (en) | Tin immersion plating composition and process for using the same | |
| US4071419A (en) | Electrodeposition of zinc and additive therefore | |
| US3183067A (en) | Metal having two coats of sulfurcontaining nickel and method of making same | |
| US2069566A (en) | Nickel plating solutions and processes | |
| NO116664B (enrdf_load_stackoverflow) | ||
| NO126918B (enrdf_load_stackoverflow) | ||
| US2986498A (en) | Process for the production of metal electrodeposits | |
| US7300563B2 (en) | Use of N-alllyl substituted amines and their salts as brightening agents in nickel plating baths | |
| US3374156A (en) | Electro-depositing stainless steel coatings on metal surfaces | |
| JP6218473B2 (ja) | 無電解Ｎｉ−Ｐ−Ｓｎめっき液 | |
| JPH09157884A (ja) | 非酸性ニッケルめっき浴及び該めっき浴を用いためっき方法 | |
| JPS6112038B2 (enrdf_load_stackoverflow) | ||
| JPS63171892A (ja) | 電気めっき方法 | |
| JP2022528995A (ja) | 半光沢ニッケル又は半光沢ニッケル合金コーティングを析出するためのガルバニックニッケル又はニッケル合金電気めっき浴 | |
| TWI448590B (zh) | 用於鋅與鋅合金鑄模構件之新穎無氰化物電鍍方法 | |
| US3972788A (en) | Zinc anode benefaction |