NL8615006A - Thermische detectorreeks. - Google Patents
Thermische detectorreeks. Download PDFInfo
- Publication number
- NL8615006A NL8615006A NL8615006A NL8615006A NL8615006A NL 8615006 A NL8615006 A NL 8615006A NL 8615006 A NL8615006 A NL 8615006A NL 8615006 A NL8615006 A NL 8615006A NL 8615006 A NL8615006 A NL 8615006A
- Authority
- NL
- Netherlands
- Prior art keywords
- thermal
- layer
- elements
- detector
- substrate
- Prior art date
Links
- 239000000463 material Substances 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 28
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 5
- 239000006100 radiation absorber Substances 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims description 3
- 239000013013 elastic material Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 description 39
- 239000010410 layer Substances 0.000 description 38
- 238000000034 method Methods 0.000 description 29
- 229910052751 metal Inorganic materials 0.000 description 22
- 239000002184 metal Substances 0.000 description 22
- 229910000679 solder Inorganic materials 0.000 description 19
- 229920000642 polymer Polymers 0.000 description 16
- 230000005855 radiation Effects 0.000 description 16
- 230000008569 process Effects 0.000 description 13
- 239000006096 absorbing agent Substances 0.000 description 12
- 238000003491 array Methods 0.000 description 11
- 239000013078 crystal Substances 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 10
- 230000004888 barrier function Effects 0.000 description 10
- 238000000576 coating method Methods 0.000 description 9
- 238000005530 etching Methods 0.000 description 9
- 238000009413 insulation Methods 0.000 description 9
- 238000000151 deposition Methods 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- 229920001721 polyimide Polymers 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 239000004642 Polyimide Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 239000013590 bulk material Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 239000011195 cermet Substances 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- -1 impedance adjusted Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910003480 inorganic solid Inorganic materials 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229920005597 polymer membrane Polymers 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 229910052454 barium strontium titanate Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910002110 ceramic alloy Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000011365 complex material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000010987 cubic zirconia Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000008098 formaldehyde solution Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- YLZGECKKLOSBPL-UHFFFAOYSA-N indium nickel Chemical compound [Ni].[In] YLZGECKKLOSBPL-UHFFFAOYSA-N 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910003471 inorganic composite material Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- ZBSCCQXBYNSKPV-UHFFFAOYSA-N oxolead;oxomagnesium;2,4,5-trioxa-1$l^{5},3$l^{5}-diniobabicyclo[1.1.1]pentane 1,3-dioxide Chemical compound [Mg]=O.[Pb]=O.[Pb]=O.[Pb]=O.O1[Nb]2(=O)O[Nb]1(=O)O2 ZBSCCQXBYNSKPV-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000007736 thin film deposition technique Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14875—Infrared CCD or CID imagers
- H01L27/14881—Infrared CCD or CID imagers of the hybrid type
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/34—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using capacitors, e.g. pyroelectric capacitors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N19/00—Integrated devices, or assemblies of multiple devices, comprising at least one thermoelectric or thermomagnetic element covered by groups H10N10/00 - H10N15/00
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
- G01J2005/202—Arrays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
- G01J2005/206—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices on foils
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Radiation Pyrometers (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8522638A GB2200246B (en) | 1985-09-12 | 1985-09-12 | Thermal detector array |
| GB8522638 | 1985-09-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8615006A true NL8615006A (nl) | 1988-08-01 |
Family
ID=10585093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8615006A NL8615006A (nl) | 1985-09-12 | 1986-09-12 | Thermische detectorreeks. |
Country Status (7)
| Country | Link |
|---|---|
| BE (1) | BE102T1 (sv) |
| DE (1) | DE3644882A1 (sv) |
| FR (2) | FR2620531B1 (sv) |
| GB (1) | GB2200246B (sv) |
| IT (1) | IT1235675B (sv) |
| NL (1) | NL8615006A (sv) |
| SE (1) | SE466571B (sv) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8621688D0 (en) * | 1986-09-09 | 1986-10-15 | Graviner Ltd | Radiation detection arrangements |
| GB2206997A (en) * | 1987-07-10 | 1989-01-18 | Philips Electronic Associated | Arrays of pyroelectric or ferroelectric infrared detector elements |
| US5047644A (en) * | 1989-07-31 | 1991-09-10 | Texas Instruments Incorporated | Polyimide thermal isolation mesa for a thermal imaging system |
| US5306912A (en) * | 1989-10-21 | 1994-04-26 | Thorn Emi Plc | Optically addressed thermal imaging device |
| FR2670325B1 (fr) * | 1990-12-11 | 1993-01-22 | Thomson Composants Militaires | Detecteur infrarouge monolithique a materiau pyroelectrique. |
| US5288649A (en) * | 1991-09-30 | 1994-02-22 | Texas Instruments Incorporated | Method for forming uncooled infrared detector |
| EP0611443B1 (en) * | 1991-11-04 | 1996-05-29 | Honeywell Inc. | Thin film pyroelectric imaging array |
| GB2274543A (en) * | 1993-01-21 | 1994-07-27 | Central Research Lab Ltd | Infrared detector |
| US5942791A (en) * | 1996-03-06 | 1999-08-24 | Gec-Marconi Limited | Micromachined devices having microbridge structure |
| GB9604786D0 (en) * | 1996-03-06 | 1996-09-25 | Marconi Gec Ltd | Micromachined devices |
| EP0853237B1 (en) * | 1997-01-14 | 2000-06-21 | Infrared Integrated Systems Ltd. | Sensor using a detector array |
| GB2335077B (en) * | 1998-03-04 | 2003-05-28 | Marconi Gec Ltd | Radiation detectors |
| FR2788885B1 (fr) * | 1999-01-21 | 2003-07-18 | Commissariat Energie Atomique | Dispositif de detection thermique de rayonnements electromagnetiques et procede de fabrication de celui-ci |
| EP1178294A1 (fr) * | 2000-08-04 | 2002-02-06 | Ecole Polytechnique Federale De Lausanne | Capteur pyroélectrique ayant entre ses pixels un couplage thermique parasite réduit |
| WO2002101843A1 (fr) * | 2001-06-08 | 2002-12-19 | Ir Microsystems S.A. | Capteur infrarouge et procede de fabrication |
| FR2862160B1 (fr) * | 2003-11-10 | 2006-05-12 | Ulis | Dispositif de detection de rayonnements infrarouges a detecteurs bolometriques |
| FR2875606B1 (fr) | 2004-09-22 | 2006-11-10 | Commissariat Energie Atomique | Detecteur de rayonnement electromagnetique et de particules a nombre de connexions reduit |
| DE102005001966B4 (de) * | 2005-01-15 | 2009-08-20 | Infratec Gmbh Infrarotsensorik Und Messtechnik | Mikrophoniereduzierter pyroelektrischer Detektor |
| JP5644121B2 (ja) * | 2010-01-26 | 2014-12-24 | セイコーエプソン株式会社 | 熱型光検出器、熱型光検出装置、電子機器および熱型光検出器の製造方法 |
| WO2011111309A1 (ja) * | 2010-03-11 | 2011-09-15 | パナソニック株式会社 | 焦電型温度センサを用いて温度を測定する方法 |
| CN102437166B (zh) * | 2011-10-09 | 2013-05-01 | 中国科学院苏州纳米技术与纳米仿生研究所 | 一种非制冷红外探测系统像素阵列的制作方法 |
| FR3006438B1 (fr) * | 2013-06-04 | 2015-06-26 | Commissariat Energie Atomique | Capteur de temperature |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3801949A (en) * | 1973-03-08 | 1974-04-02 | Rca Corp | Thermal detector and method of making the same |
| US4039833A (en) * | 1976-08-17 | 1977-08-02 | The United States Of America As Represented By The Secretary Of The Navy | High density infrared detector array |
| GB1523347A (en) * | 1976-11-16 | 1978-08-31 | Secr Defence | Pyroelectric tragets |
| GB1532293A (en) * | 1977-06-14 | 1978-11-15 | Secr Defence | Pyroelectric vidicon targets and a method and machine for reticulating them |
| GB1592500A (en) * | 1977-12-01 | 1981-07-08 | Roundy C B | Pyroelectric infrared detection system |
| GB2030023B (en) * | 1977-12-19 | 1982-08-04 | Texas Instruments Inc | Ferroelectric imaging system |
| GB2028579B (en) * | 1978-08-22 | 1982-12-22 | English Electric Valve Co Ltd | Target for a pyroelectric camera |
| US4317063A (en) * | 1978-10-28 | 1982-02-23 | Plessey Handel Und Investments Ag | Pyroelectric detectors |
| GB2035685B (en) * | 1978-10-28 | 1983-05-05 | Plessey Co Ltd | Pyroelectric detectors |
| US4532434A (en) * | 1978-10-30 | 1985-07-30 | Phillips Petroleum Company | Waveform generator |
| US4354109A (en) * | 1979-12-31 | 1982-10-12 | Honeywell Inc. | Mounting for pyroelectric detecctor arrays |
| DE3045118C2 (de) * | 1980-11-29 | 1983-10-13 | Georg Dipl.-Ing. 7500 Karlsruhe Richter | Infrarotdetektor und Verfahren zur Herstellung |
| GB2095905B (en) * | 1981-03-27 | 1985-01-16 | Philips Electronic Associated | Infra-red radiation imaging devices and methods for their manufacture |
| GB2100058B (en) * | 1981-06-05 | 1985-03-20 | Philips Electronic Associated | Pyroelectric detector |
| US4532424A (en) * | 1983-04-25 | 1985-07-30 | Rockwell International Corporation | Pyroelectric thermal detector array |
| GB2163596B (en) * | 1984-08-24 | 1988-02-03 | Philips Electronic Associated | A thermal imaging device and a method of manufacturing a thermal imaging device |
-
1985
- 1985-09-12 GB GB8522638A patent/GB2200246B/en not_active Expired
-
1986
- 1986-09-12 DE DE19863644882 patent/DE3644882A1/de not_active Ceased
- 1986-09-12 NL NL8615006A patent/NL8615006A/nl not_active Application Discontinuation
-
1987
- 1987-04-07 FR FR8704869A patent/FR2620531B1/fr not_active Expired - Fee Related
- 1987-04-07 FR FR878704868A patent/FR2624603B1/fr not_active Expired - Fee Related
- 1987-06-17 SE SE8702531A patent/SE466571B/sv not_active IP Right Cessation
- 1987-07-16 IT IT8721315A patent/IT1235675B/it active
-
1988
- 1988-08-10 BE BEBTR0000102T patent/BE102T1/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| SE466571B (sv) | 1992-03-02 |
| GB2200246B (en) | 1989-11-01 |
| SE8702531D0 (sv) | 1987-06-17 |
| GB8522638D0 (en) | 1988-05-25 |
| FR2624603A1 (fr) | 1989-06-16 |
| SE8702531L (sv) | 1988-08-06 |
| GB2200246A (en) | 1988-07-27 |
| IT1235675B (it) | 1992-09-21 |
| FR2620531B1 (fr) | 1993-11-05 |
| DE3644882A1 (de) | 1988-11-17 |
| FR2620531A1 (fr) | 1989-03-17 |
| FR2624603B1 (fr) | 1993-04-30 |
| BE102T1 (fr) | 1988-08-10 |
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