NL8201093A - Inrichting voor het aanbrengen van dunne lagen. - Google Patents
Inrichting voor het aanbrengen van dunne lagen. Download PDFInfo
- Publication number
- NL8201093A NL8201093A NL8201093A NL8201093A NL8201093A NL 8201093 A NL8201093 A NL 8201093A NL 8201093 A NL8201093 A NL 8201093A NL 8201093 A NL8201093 A NL 8201093A NL 8201093 A NL8201093 A NL 8201093A
- Authority
- NL
- Netherlands
- Prior art keywords
- gas
- reaction vessel
- target
- nozzle
- applying
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims description 17
- 230000001133 acceleration Effects 0.000 claims description 7
- 238000007733 ion plating Methods 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 78
- 238000009792 diffusion process Methods 0.000 description 15
- 238000004544 sputter deposition Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 125000005234 alkyl aluminium group Chemical group 0.000 description 1
- -1 alkyl zinc Chemical compound 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0063—Reactive sputtering characterised by means for introducing or removing gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3641981U JPS5922116Y2 (ja) | 1981-03-17 | 1981-03-17 | 薄膜形成装置 |
| JP3641981 | 1981-03-17 | ||
| JP12164381 | 1981-08-17 | ||
| JP12164381U JPS5925884Y2 (ja) | 1981-08-17 | 1981-08-17 | スパツタ装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8201093A true NL8201093A (nl) | 1982-10-18 |
Family
ID=26375462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8201093A NL8201093A (nl) | 1981-03-17 | 1982-03-16 | Inrichting voor het aanbrengen van dunne lagen. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4466876A (de) |
| DE (1) | DE3209792A1 (de) |
| FR (1) | FR2502185B1 (de) |
| GB (1) | GB2098241B (de) |
| NL (1) | NL8201093A (de) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0173715B1 (de) * | 1984-02-13 | 1992-04-22 | SCHMITT, Jerome J. III | Verfahren und vorrichtung für gasstrahlniederschlag von leitfähigen und dielektrischen dünnen festfilmen und so hergestellte erzeugnisse |
| CA1232228A (en) * | 1984-03-13 | 1988-02-02 | Tatsuro Miyasato | Coating film and method and apparatus for producing the same |
| DE3662755D1 (en) * | 1985-01-29 | 1989-05-18 | Tibor Kenderi | Apparatus for powder spraying, operating with a flame jet |
| EP0595159B1 (de) * | 1992-10-26 | 1997-12-29 | Schott Glaswerke | Verfahren und Vorrichtung zur Beschichtung der Innenfläche stark gewölbter im wesentlichen kalottenförmiger Substrate mittels CVD |
| GB9323033D0 (en) * | 1993-11-09 | 1994-01-05 | Gen Vacuum Equip Ltd | Evaporator for vacuum web coating |
| US5591313A (en) * | 1995-06-30 | 1997-01-07 | Tabco Technologies, Inc. | Apparatus and method for localized ion sputtering |
| US7235160B2 (en) * | 2003-08-06 | 2007-06-26 | Energy Photovoltaics, Inc. | Hollow cathode sputtering apparatus and related method |
| US9175383B2 (en) * | 2008-01-16 | 2015-11-03 | Applied Materials, Inc. | Double-coating device with one process chamber |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1515312B1 (de) * | 1965-06-14 | 1972-04-27 | Siemens Ag | Vorrichtung zur Herstellung dünner Schichten durch Kathodenzerstäubung |
| US3408283A (en) * | 1966-09-15 | 1968-10-29 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode positioned in the low pressure region |
| US3409529A (en) * | 1967-07-07 | 1968-11-05 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability |
| US3600292A (en) * | 1969-03-11 | 1971-08-17 | Westinghouse Electric Corp | Localized machining and deposition for microelectronic components by sputtering |
| FR2088088A1 (de) * | 1970-05-15 | 1972-01-07 | Anvar | |
| US4062318A (en) * | 1976-11-19 | 1977-12-13 | Rca Corporation | Apparatus for chemical vapor deposition |
| DE2846160A1 (de) * | 1978-10-24 | 1980-05-08 | Kernforschungsanlage Juelich | Wirbelschichtreaktor mit offenem reaktionsgaszutritt und verfahren zur laminar-durchflussteigerung |
| DD150480A1 (de) * | 1979-04-02 | 1981-09-02 | Ullrich Heisig | Verfahren und einrichtung zum reaktiven zerstaeuben |
| SU863716A1 (ru) * | 1979-08-08 | 1981-09-15 | Московский авиационный технологический институт им.К.Э.Циолковского | Устройство дл нанесени покрытий |
| US4307283A (en) * | 1979-09-27 | 1981-12-22 | Eaton Corporation | Plasma etching apparatus II-conical-shaped projection |
| US4270999A (en) * | 1979-09-28 | 1981-06-02 | International Business Machines Corporation | Method and apparatus for gas feed control in a dry etching process |
| US4353777A (en) * | 1981-04-20 | 1982-10-12 | Lfe Corporation | Selective plasma polysilicon etching |
-
1982
- 1982-03-10 US US06/356,720 patent/US4466876A/en not_active Expired - Fee Related
- 1982-03-11 GB GB8207171A patent/GB2098241B/en not_active Expired
- 1982-03-16 FR FR8204433A patent/FR2502185B1/fr not_active Expired
- 1982-03-16 NL NL8201093A patent/NL8201093A/nl not_active Application Discontinuation
- 1982-03-17 DE DE19823209792 patent/DE3209792A1/de active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| GB2098241B (en) | 1985-10-30 |
| FR2502185B1 (fr) | 1987-02-20 |
| FR2502185A1 (fr) | 1982-09-24 |
| US4466876A (en) | 1984-08-21 |
| DE3209792A1 (de) | 1982-11-04 |
| GB2098241A (en) | 1982-11-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A85 | Still pending on 85-01-01 | ||
| BA | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| BV | The patent application has lapsed |