NL8200907A - Bad voor de galvanische afscheiding van een palladium/nikkellegering. - Google Patents
Bad voor de galvanische afscheiding van een palladium/nikkellegering. Download PDFInfo
- Publication number
- NL8200907A NL8200907A NL8200907A NL8200907A NL8200907A NL 8200907 A NL8200907 A NL 8200907A NL 8200907 A NL8200907 A NL 8200907A NL 8200907 A NL8200907 A NL 8200907A NL 8200907 A NL8200907 A NL 8200907A
- Authority
- NL
- Netherlands
- Prior art keywords
- palladium
- nickel
- bath
- galvanic separation
- content
- Prior art date
Links
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title claims description 58
- 238000000926 separation method Methods 0.000 title claims description 7
- 229910000990 Ni alloy Inorganic materials 0.000 title claims description 5
- 229910001252 Pd alloy Inorganic materials 0.000 title description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 41
- 229910052763 palladium Inorganic materials 0.000 claims description 23
- 229910052759 nickel Inorganic materials 0.000 claims description 20
- -1 acetylene amine Chemical class 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 11
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 8
- 239000013078 crystal Substances 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 150000001414 amino alcohols Chemical class 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 2
- 239000003792 electrolyte Substances 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 8
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 6
- 229910017604 nitric acid Inorganic materials 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 229910001369 Brass Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000010951 brass Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 230000005764 inhibitory process Effects 0.000 description 3
- VXAWCKIQYKXJMD-UHFFFAOYSA-N ethynamine Chemical class NC#C VXAWCKIQYKXJMD-UHFFFAOYSA-N 0.000 description 2
- XTEGVFVZDVNBPF-UHFFFAOYSA-N naphthalene-1,5-disulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1S(O)(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-N 0.000 description 2
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- JHUFGBSGINLPOW-UHFFFAOYSA-N 3-chloro-4-(trifluoromethoxy)benzoyl cyanide Chemical compound FC(F)(F)OC1=CC=C(C(=O)C#N)C=C1Cl JHUFGBSGINLPOW-UHFFFAOYSA-N 0.000 description 1
- USCSRAJGJYMJFZ-UHFFFAOYSA-N 3-methyl-1-butyne Chemical compound CC(C)C#C USCSRAJGJYMJFZ-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910017917 NH4 Cl Inorganic materials 0.000 description 1
- 229910017974 NH40H Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- ZPBSAMLXSQCSOX-UHFFFAOYSA-N naphthalene-1,3,6-trisulfonic acid Chemical compound OS(=O)(=O)C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 ZPBSAMLXSQCSOX-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical class OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3108467A DE3108467C2 (de) | 1981-03-06 | 1981-03-06 | Verwendung eines Acetylenamins und/oder eines Aminoalkohols in einem Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung |
| DE3108467 | 1981-03-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8200907A true NL8200907A (nl) | 1982-10-01 |
Family
ID=6126474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8200907A NL8200907A (nl) | 1981-03-06 | 1982-03-05 | Bad voor de galvanische afscheiding van een palladium/nikkellegering. |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US4416740A (enExample) |
| JP (1) | JPS5816088A (enExample) |
| AT (1) | AT377014B (enExample) |
| AU (1) | AU535304B2 (enExample) |
| BE (1) | BE892343A (enExample) |
| BR (1) | BR8201173A (enExample) |
| DE (1) | DE3108467C2 (enExample) |
| FR (1) | FR2501242A1 (enExample) |
| GB (1) | GB2094348B (enExample) |
| IT (1) | IT1150625B (enExample) |
| NL (1) | NL8200907A (enExample) |
| SE (1) | SE8201298L (enExample) |
| ZA (1) | ZA821368B (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4564426A (en) * | 1985-04-15 | 1986-01-14 | International Business Machines Corporation | Process for the deposition of palladium-nickel alloy |
| US4628165A (en) * | 1985-09-11 | 1986-12-09 | Learonal, Inc. | Electrical contacts and methods of making contacts by electrodeposition |
| US5034190A (en) * | 1986-01-31 | 1991-07-23 | Westinghouse Electric Corp. | Apparatus for conducting accelerated corrosion testing of nickel alloys |
| US4778574A (en) * | 1987-09-14 | 1988-10-18 | American Chemical & Refining Company, Inc. | Amine-containing bath for electroplating palladium |
| ES2185616T3 (es) * | 1990-06-22 | 2003-05-01 | Caschem Inc | Composicion grasa para cables y articulos que la incorporan. |
| WO2020129095A1 (en) * | 2018-12-20 | 2020-06-25 | Top Finish 2002 S.R.L. | Galvanic bath for making a corrosion- and oxidation-resistant palladium and nickel alloy-based plating, preparation and use thereof |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2781306A (en) * | 1956-04-27 | 1957-02-12 | Udylite Res Corp | Electrodeposition of nickel |
| US3002903A (en) * | 1958-09-26 | 1961-10-03 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3133006A (en) * | 1962-05-28 | 1964-05-12 | Barnet D Ostrow | Acid nickel plating bath |
| US3186926A (en) * | 1962-08-13 | 1965-06-01 | Hofmann Hans | Electroplating solution containing a diester of selenious acid |
| JPS4733176B1 (enExample) * | 1967-01-11 | 1972-08-23 | ||
| GB1485665A (en) * | 1975-03-27 | 1977-09-14 | Permalite Chem Ltd | Nickel electroplating |
| US4077855A (en) * | 1976-05-04 | 1978-03-07 | Francine Popescu | Bright nickel electroplating bath and process |
| DE2825966A1 (de) * | 1978-06-14 | 1980-01-03 | Basf Ag | Saures galvanisches nickelbad, das sulfobetaine als glanz- und einebnungsmittel enthaelt |
| DE2943028A1 (de) * | 1978-11-01 | 1980-05-08 | M & T Chemicals Inc | Galvanisches nickelbad |
-
1981
- 1981-03-06 DE DE3108467A patent/DE3108467C2/de not_active Expired
-
1982
- 1982-02-24 GB GB8205450A patent/GB2094348B/en not_active Expired
- 1982-03-02 ZA ZA821368A patent/ZA821368B/xx unknown
- 1982-03-02 AU AU81047/82A patent/AU535304B2/en not_active Ceased
- 1982-03-03 AT AT0082282A patent/AT377014B/de not_active IP Right Cessation
- 1982-03-03 SE SE8201298A patent/SE8201298L/ not_active Application Discontinuation
- 1982-03-03 BE BE2/59610A patent/BE892343A/fr not_active IP Right Cessation
- 1982-03-03 JP JP57032482A patent/JPS5816088A/ja active Pending
- 1982-03-04 FR FR8203612A patent/FR2501242A1/fr active Granted
- 1982-03-05 IT IT19990/82A patent/IT1150625B/it active
- 1982-03-05 US US06/355,246 patent/US4416740A/en not_active Expired - Fee Related
- 1982-03-05 NL NL8200907A patent/NL8200907A/nl not_active Application Discontinuation
- 1982-03-05 BR BR8201173A patent/BR8201173A/pt unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE3108467A1 (de) | 1982-09-16 |
| ATA82282A (de) | 1984-06-15 |
| AT377014B (de) | 1985-01-25 |
| DE3108467C2 (de) | 1983-05-26 |
| AU8104782A (en) | 1982-09-09 |
| AU535304B2 (en) | 1984-03-15 |
| JPS5816088A (ja) | 1983-01-29 |
| BR8201173A (pt) | 1982-11-23 |
| IT8219990A0 (it) | 1982-03-05 |
| IT1150625B (it) | 1986-12-17 |
| SE8201298L (sv) | 1982-09-07 |
| FR2501242B1 (enExample) | 1985-04-12 |
| FR2501242A1 (fr) | 1982-09-10 |
| GB2094348A (en) | 1982-09-15 |
| ZA821368B (en) | 1983-01-26 |
| GB2094348B (en) | 1985-08-07 |
| US4416740A (en) | 1983-11-22 |
| BE892343A (fr) | 1982-07-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A1A | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| BC | A request for examination has been filed | ||
| A85 | Still pending on 85-01-01 | ||
| BV | The patent application has lapsed |