NL8102585A - Meetkop met trillingskristal. - Google Patents

Meetkop met trillingskristal. Download PDF

Info

Publication number
NL8102585A
NL8102585A NL8102585A NL8102585A NL8102585A NL 8102585 A NL8102585 A NL 8102585A NL 8102585 A NL8102585 A NL 8102585A NL 8102585 A NL8102585 A NL 8102585A NL 8102585 A NL8102585 A NL 8102585A
Authority
NL
Netherlands
Prior art keywords
crystal
housing
plate
diaphragm
vibration
Prior art date
Application number
NL8102585A
Other languages
English (en)
Dutch (nl)
Original Assignee
Balzers Hochvakuum
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Hochvakuum filed Critical Balzers Hochvakuum
Publication of NL8102585A publication Critical patent/NL8102585A/nl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
    • G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
    • G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
    • G01B17/025—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness for measuring thickness of coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
NL8102585A 1980-07-21 1981-05-26 Meetkop met trillingskristal. NL8102585A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH555780A CH644722A5 (de) 1980-07-21 1980-07-21 Schwingquarzmesskopf.
CH555780 1980-07-21

Publications (1)

Publication Number Publication Date
NL8102585A true NL8102585A (nl) 1982-02-16

Family

ID=4295579

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8102585A NL8102585A (nl) 1980-07-21 1981-05-26 Meetkop met trillingskristal.

Country Status (6)

Country Link
US (1) US4362125A (fi)
CH (1) CH644722A5 (fi)
DE (1) DE3120443C2 (fi)
FR (1) FR2493508B1 (fi)
GB (1) GB2080532B (fi)
NL (1) NL8102585A (fi)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58217673A (ja) * 1982-06-11 1983-12-17 Anelva Corp 膜厚制御方法
CH662421A5 (de) * 1983-07-13 1987-09-30 Suisse Horlogerie Rech Lab Piezoelektrischer kontaminationsdetektor.
DE3401140C1 (de) * 1984-01-14 1985-08-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München Vorrichtung zur kontinuierlichen Messung der Dicke
DE3412724A1 (de) * 1984-04-04 1985-10-17 Siemens AG, 1000 Berlin und 8000 München Verfahren und anordnung zum messen der schichtdicke und/oder der konzentration von auf substraten abgeschiedenen duennen schichten waehrend ihrer herstellung
US4917499A (en) * 1986-10-03 1990-04-17 Hughes Aircraft Company Apparatus for analyzing contamination
WO1988009223A1 (en) * 1987-05-27 1988-12-01 Emkay Manufacturing Company High volume crystal plating apparatus and method
DE3732594A1 (de) * 1987-09-28 1989-04-06 Leybold Ag Einrichtung zum ermitteln der jeweiligen dicke von sich veraendernden material-schichten auf einem substrat
GB2215049B (en) * 1988-02-02 1991-08-21 Stc Plc Acoustic devices
US5025664A (en) * 1989-11-02 1991-06-25 Leybold Inficon, Inc. Multiple crystal head for deposition thickness monitor
DE4318423C2 (de) * 1993-06-03 1995-11-16 Theysohn Friedrich Fa Vorrichtung zum Vermessen von langgestreckten Kunsststoffprofilen, insbesondere Rohren
US5424097A (en) * 1993-09-30 1995-06-13 Specialty Coating Systems, Inc. Continuous vapor deposition apparatus
US5536317A (en) * 1995-10-27 1996-07-16 Specialty Coating Systems, Inc. Parylene deposition apparatus including a quartz crystal thickness/rate controller
US5879808A (en) * 1995-10-27 1999-03-09 Alpha Metals, Inc. Parylene polymer layers
US5806319A (en) * 1997-03-13 1998-09-15 Wary; John Method and apparatus for cryogenically cooling a deposition chamber
US5841005A (en) * 1997-03-14 1998-11-24 Dolbier, Jr.; William R. Parylene AF4 synthesis
US6051276A (en) * 1997-03-14 2000-04-18 Alpha Metals, Inc. Internally heated pyrolysis zone
US5948983A (en) * 1997-07-25 1999-09-07 Leybold Inficon, Inc. Wall deposition monitoring system
US6668618B2 (en) * 2001-04-23 2003-12-30 Agilent Technologies, Inc. Systems and methods of monitoring thin film deposition
DE10204075B4 (de) * 2002-02-01 2006-09-07 Leybold Optics Gmbh Vorrichtung für Einrichtungen zur Bestimmung von Eigenschaften aufgebrachter Schichten
CN101957297B (zh) * 2009-07-16 2012-04-18 河南科瑞科技有限公司 一种石英晶体传感器检测池
DE102010018748B4 (de) * 2010-04-29 2014-09-25 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur differenzierten Schichtratenmessung von Neutralteilchen und Ionen, Verfahren sowie Verwendung der Vorrichtung
US9856563B2 (en) * 2012-08-22 2018-01-02 Uchicago Argonne, Llc Micro-balance sensor integrated with atomic layer deposition chamber
US9182378B2 (en) 2013-03-15 2015-11-10 Inficon, Inc. High capacity monitor crystal exchanger utilizing an organized 3-D storage structure
KR101957467B1 (ko) * 2013-04-24 2019-03-12 주식회사 선익시스템 증착두께 측정장치
JP2016153757A (ja) * 2015-02-20 2016-08-25 ピエゾパーツ株式会社 成膜センサーユニット
CN105603379B (zh) * 2016-01-05 2019-04-02 京东方科技集团股份有限公司 一种检测真空蒸镀膜厚的检测装置和真空蒸镀装置
CN105675120A (zh) * 2016-04-26 2016-06-15 中国电子科技集团公司第二十六研究所 晶片频率测试装置
CN105910530A (zh) * 2016-04-26 2016-08-31 中国电子科技集团公司第二十六研究所 晶片平行度测试方法
CN110192081B (zh) * 2017-06-28 2021-01-08 株式会社爱发科 用于石英晶体振荡式薄膜厚度监视器的传感器头
US10763143B2 (en) * 2017-08-18 2020-09-01 Applied Materials, Inc. Processing tool having a monitoring device
EP4300029A1 (en) 2023-10-20 2024-01-03 Evatec AG Measuring device for measuring a thickness of a film of material deposited on a substrate and film deposition apparatus with at least one such measuring device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3383238A (en) * 1965-05-27 1968-05-14 Unzicker Arlyn Eugene Method and apparatus of controlling thin film deposition in a vacuum
US3667424A (en) * 1969-04-14 1972-06-06 Stanford Research Inst Multi-station vacuum apparatus
CH537987A (de) * 1971-02-10 1973-06-15 Balzers Patent Beteilig Ag Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten
CH573586A5 (fi) * 1973-11-22 1976-03-15 Balzers Patent Beteilig Ag
US4207863A (en) * 1977-01-06 1980-06-17 Les Industries Bfg Limitee Door for pyrolytic range
US4207836A (en) * 1977-07-01 1980-06-17 Hitachi, Ltd. Vacuum vapor-deposition apparatus

Also Published As

Publication number Publication date
GB2080532B (en) 1984-07-25
GB2080532A (en) 1982-02-03
US4362125A (en) 1982-12-07
FR2493508A1 (fr) 1982-05-07
DE3120443C2 (de) 1987-03-12
DE3120443A1 (de) 1982-05-06
FR2493508B1 (fr) 1985-10-25
CH644722A5 (de) 1984-08-15

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Legal Events

Date Code Title Description
A1A A request for search or an international-type search has been filed
BB A search report has been drawn up
A85 Still pending on 85-01-01
BV The patent application has lapsed