NL8002043A - Isolatie-halfgeleiderstructuur, alsmede werkwijze voor het vervaardigen daarvan. - Google Patents

Isolatie-halfgeleiderstructuur, alsmede werkwijze voor het vervaardigen daarvan. Download PDF

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Publication number
NL8002043A
NL8002043A NL8002043A NL8002043A NL8002043A NL 8002043 A NL8002043 A NL 8002043A NL 8002043 A NL8002043 A NL 8002043A NL 8002043 A NL8002043 A NL 8002043A NL 8002043 A NL8002043 A NL 8002043A
Authority
NL
Netherlands
Prior art keywords
substrate
ampoule
semiconductor
crystal orientation
manufacturing
Prior art date
Application number
NL8002043A
Other languages
English (en)
Dutch (nl)
Original Assignee
Chemla Daniel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chemla Daniel filed Critical Chemla Daniel
Publication of NL8002043A publication Critical patent/NL8002043A/nl

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/62—Capacitors having potential barriers
    • H10D1/66—Conductor-insulator-semiconductor capacitors, e.g. MOS capacitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/68—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
  • Semiconductor Lasers (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Recrystallisation Techniques (AREA)
NL8002043A 1979-04-10 1980-04-08 Isolatie-halfgeleiderstructuur, alsmede werkwijze voor het vervaardigen daarvan. NL8002043A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR7909044 1979-04-10
FR7909044A FR2454184A1 (fr) 1979-04-10 1979-04-10 Structure de type isolant-semi-conducteur dans laquelle le semi-conducteur est un compose iii-v et l'isolant un sulfure, et procedes de fabrication de cette structure

Publications (1)

Publication Number Publication Date
NL8002043A true NL8002043A (nl) 1980-10-14

Family

ID=9224170

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8002043A NL8002043A (nl) 1979-04-10 1980-04-08 Isolatie-halfgeleiderstructuur, alsmede werkwijze voor het vervaardigen daarvan.

Country Status (6)

Country Link
US (1) US4320178A (enExample)
JP (1) JPS55140235A (enExample)
DE (1) DE3013563A1 (enExample)
FR (1) FR2454184A1 (enExample)
GB (1) GB2046994B (enExample)
NL (1) NL8002043A (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4513057A (en) * 1982-06-10 1985-04-23 Hughes Aircraft Company Process for forming sulfide layers
US4447469A (en) * 1982-06-10 1984-05-08 Hughes Aircraft Company Process for forming sulfide layers by photochemical vapor deposition
AU559363B2 (en) * 1982-06-22 1987-03-05 Hughes Aircraft Co. Low temperature process for depositing epitaxial layers
GB2133928B (en) * 1982-12-04 1986-07-30 Plessey Co Plc Coatings for semiconductor devices
US4590130A (en) * 1984-03-26 1986-05-20 General Electric Company Solid state zone recrystallization of semiconductor material on an insulator
US4632886A (en) * 1984-09-28 1986-12-30 Texas Instruments Incorporated Sulfidization of compound semiconductor surfaces and passivated mercury cadmium telluride substrates
JPS61275191A (ja) * 1985-05-29 1986-12-05 Furukawa Electric Co Ltd:The ＧａＡｓ薄膜の気相成長法
FR2604826B1 (fr) * 1986-10-06 1989-01-20 France Etat Procede de formation d'une couche isolante comportant du sulfure, derives sulfures obtenus et appareillage pour la mise en oeuvre du procede
US4751200A (en) * 1987-03-04 1988-06-14 Bell Communications Research, Inc. Passivation of gallium arsenide surfaces with sodium sulfide
US4811077A (en) * 1987-06-18 1989-03-07 International Business Machines Corporation Compound semiconductor surface termination
US4843037A (en) * 1987-08-21 1989-06-27 Bell Communications Research, Inc. Passivation of indium gallium arsenide surfaces
JP2650769B2 (ja) * 1989-02-03 1997-09-03 シャープ株式会社 半導体レーザ装置の製造方法
JP2659830B2 (ja) * 1989-11-06 1997-09-30 シャープ株式会社 半導体レーザ素子及びその製造方法
US5393680A (en) * 1990-08-01 1995-02-28 Sumitomo Electric Industries, Ltd. MIS electrode forming process
WO1996021251A1 (en) * 1995-01-06 1996-07-11 President And Fellows Of Harvard College Minority carrier device
US5760462A (en) * 1995-01-06 1998-06-02 President And Fellows Of Harvard College Metal, passivating layer, semiconductor, field-effect transistor
US6793906B2 (en) 2002-04-04 2004-09-21 Robert W. Shelton Methods of making manganese sulfide

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1273484B (de) * 1963-08-01 1968-07-25 Siemens Ag Verfahren zum Herstellen von reinem, gegebenenfalls dotiertem Halbleitermaterial mittels Transportreaktionen
DE1589922A1 (de) * 1967-01-26 1970-04-09 Ibm Deutschland Verfahren zur Herstellung von Halbleiterbauelementen
US3519492A (en) * 1967-12-21 1970-07-07 Dow Chemical Co Process for the production of pure semiconductor materials
US3914784A (en) * 1973-12-10 1975-10-21 Hughes Aircraft Co Ion Implanted gallium arsenide semiconductor devices fabricated in semi-insulating gallium arsenide substrates
JPS5120154A (ja) * 1974-08-09 1976-02-18 Takeshi Kawai Jidoshikikansosochi

Also Published As

Publication number Publication date
GB2046994B (en) 1983-05-25
JPS6328339B2 (enExample) 1988-06-08
DE3013563C2 (enExample) 1989-04-13
US4320178A (en) 1982-03-16
DE3013563A1 (de) 1980-10-23
FR2454184B1 (enExample) 1982-09-24
FR2454184A1 (fr) 1980-11-07
GB2046994A (en) 1980-11-19
JPS55140235A (en) 1980-11-01

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Legal Events

Date Code Title Description
A85 Still pending on 85-01-01
BV The patent application has lapsed
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
BV The patent application has lapsed